晶片光刻 的英文怎麼說
中文拼音 [jīngpiānguāngkè]
晶片光刻
英文
wafer lithography-
" the hksar e - passports and e - d is will contain digital data including the holder s personal data and facial image which will be stored in the contactless chip embedded in the back cover of the travel documents, " mr peh said, " the holder s personal particulars and photograph will be inscribed onto the polycarbonate bio - data page of an e - passport or e - d i by laser engraving technology.
白韞六先生續稱:特區電子護照及電子簽證身份書的封底內,皆藏有非接觸式晶片。晶片內儲存了數碼資料,包括證件持有人的個人資料及容貌影像。而這些個人資料及相片,將會以激光刻蝕技術刻印在特區電子護照及電子簽證身份書上。The book is tinier than two cited in the guinness book of world records as the world ' s smallest, a copy of the new testament of the king james bible, made in 2001, and a 2002 production of anton chekhov ' s " chameleon ", the researchers said
周三,加拿大研究人員製作出世界上最小的圖書蘿卜城的teeny ted 。這本書大小僅有0 . 07 0 . 10毫米,文字是用鎵離子光束刻在小片結晶硅上的,看得時候需要動用電子顯微鏡。P - type silicon crystal plates have been adopted in the text, which are formed mask sio2 by heat - oxygenation. and figures are diverted by normal light etching technology
本文採用p型單晶矽片,由熱氧化形成sio _ 2掩膜層,標準光刻工藝進行圖形轉移,用koh溶液濕法刻蝕製作倒四棱錐腐蝕坑列陣。Compared with the conventional chemical etching, laser assisted wet chemical etching can eliminate the effect of crystal orientation efficiently and fabricate more diversified etched pattern ; compared with the laser assisted gas chemical etching, the required condition for laser wet etching can be realized more easily and the operation can be simplified ; compared with the ion etching, it has advantages of no ion damage to substrate, avoiding over - etching and cost - effective
半導體的激光誘導液相腐蝕與普通化學腐蝕相比,可以有效地消除晶體取向影響,製作出更加多樣化的腐蝕圖形;與激光誘導氣相腐蝕相比,其工藝條件更加容易實現,操作更加簡單;與干法離子刻蝕相比,對基片無離子損傷,過度腐蝕容易控制,成本低。Some of the techniques ( for example, advanced ultraviolet lithography for chip production ) will probably become commercial realities
某些技術,例如拿來生產晶片的高階紫外光蝕刻法,很可能會受到業者廣泛使用。But because conventional photolithography becomes more difficult as the dimensions of the structures become smaller, manufacturers are exploring alternative technologies for making future nanochips
但由於結構變得更小后,傳統的光蝕刻法變得更難做,因此業者正在找尋其他技術,以做出未來的奈米晶片。The photolithographic tools that will be used to make chips with features well below 100 nanometers will each cost tens to hundreds of millions of dollars
要在晶片上做出小於100奈米的圖案細節,所需的光蝕刻工具每件要花上幾千萬到幾億美元。Back then, chip designers considered it risky to add two or three layers of metal on top of the silicon wafer because each new layer added hills and valleys that made it difficult to keep photolithographic patterns in focus
當時的晶片設計者認為在矽晶圓上加上兩三層金屬有點冒險,會使晶圓表面凹凸不平,增加光刻過程中聚焦的困難。On the 128 degrees rotated, y - cut and x - propagation substrate of linbo3, the interdigital saw transducer of 400um in electrode pitch and 100um in electrode strip is designed and fabricated by the technique of photolithography
在128度旋轉, y向切割, x向傳播的linbo _ 3晶片上,設計、並用光刻技術製作了電極周期為400 m ,電極線寬為100 m的叉指型表面彈性波換能器。Micro - channel electrophoresis chip ( mce chip ) system is a newly developed research field. the micro - channel network on the chip is manufactured by the technology of micro opto electro mechanical system ( moems ) on the substrate of glass, fused silica, pdms etc. sample separation is performed in the micro - channel and detected by opticcal or chemical methods
微通道電泳晶元( micro - channelelectrophoresischip , mcechip )系統是利用微光機電系統( moems )技術在玻璃、石英、有機聚合物等基片上刻蝕出預設計好的微通道網路,並在其中進行樣品的電泳分離,利用光學或化學等方法進行檢測。分享友人