束流 的英文怎麼說

中文拼音 [shùliú]
束流 英文
beam current
  • 束 : Ⅰ動詞1 （捆; 系） bind; tie 2 （控制; 約束）control; restrain Ⅱ量詞（用於捆在一起的東西） bundle;...
  • 流 : Ⅰ動1 （液體移動; 流動） flow 2 （移動不定） drift; move; wander 3 （流傳; 傳播） spread 4 （向壞...
  1. The concept, characteristics and application of high energy beam machining, electrical discharge machining, electrochemical machining and material abscission machining separately discuss

    分別論述了高能束流加工、電火花加工、電解加工，以及物料切蝕加工的概念、特徵與應用狀況。
  2. Multichannel hodoscope of electron beam energy spectrum

    多道電子束流能譜描跡儀
  3. A method of beam control for nfz - 10 industrial irradiation linac

    10工業輻照電子直線加速器束流控制方法
  4. Signal processing system for beam position monitor at hls 200 mev linac

    直線加速器束流位置測量的信號處理系統
  5. Studies on the optimum beam orbit correction for high energy electron linacs

    高能電子直線加速器束流軌道校正的優化研究
  6. To attain the high - power, well - proportioned and steady high - energy particle beam is the base of analyzing beam loss. the factors that influence the emission performance of the filament are analyzed, and the parameters are calculated. the experiment results proved the correctness of analyses

    獲得大功率、均勻、穩定的高能粒子束是進行束流損失分析的基礎，本文分析了影響燈絲發射特性因素，對燈絲各參數進行了設計計算，實驗證明了分析的正確性。
  7. Using the particle - in - cell ( pic ) model, a 8 millimeter relativistic backward wave oscillator underlying superradiance mechanism was gotten, the influence on both operation frequency and radiation efficiency of the guiding magnetic field, the diode voltage, the beam current and the beam radius as well as the corrugation structure were also presented

    採用pic方法，通過數值模擬優化設計了超輻射狀態下的8毫米相對論返波振蕩器，分析了引導磁場、二極體電壓、電子束流、電子束半徑、周期慢波結構等對器件的輻射功率及輻射效率的影響。
  8. Abstract : new ideas, new structures and new technologies have been used for the design, manufacture and installment of wiggler in order to achieve the coincidence of the central level planes of magnets and beam vacuum tube

    文摘:採用新思想、新結構、新工藝設計和加工超導扭擺磁鐵，並在安裝過程中確保磁體的準直，實現了磁體的磁中心水平面與束流真空管的中心水平面的重合。
  9. The button electrode bpm experiments and calibrations have been done on the experimental facilities. the results of the experiment show that the button electrode has an accuracy of 0. 5mm with a resolution of 0. 13mm

    在模擬束流平臺上對鈕扣電極進行束位置測量的實驗標定，並根據實驗結果對鈕扣電極束位置探測器裝置進行改進和優化。
  10. ( 4 ) chapter vi. the theory of ion curren extraction of rf ion source is investigated, the reason of emission surface formation and its effect on ion curren extraction are reasearched emphatically

    （ 4 ）對高頻離子源的束流引出原理作了理論推導和分析，著重研究了發射面的形成及其對引出束流特性的影響。
  11. Finally, the characteristics of ion curren extraction in different conditions are simulationed with magic software, and the parameter of best emission surface is obtained

    最後，採用magic程序對高頻離子源不同引出參數下的束流引出特性進行了數值模擬，得到了獲得最佳的引出離子束所要求的等離子體發射面參數。
  12. Beam emittance measurement with modified three gradient method

    用修正三梯度法測量束流發射度
  13. The feasibility that kaufman ion source is applied in reactive ion beam etching is discussed. etching characteristics of materials, including pr, cr, quartz, are investigated. the etch rate and mechanisms of such materials are measured and analyzed as a function of ion energy, ion beam density and ion incidence angle in pure ar and chf3, respectively. the etch rate has shown a square root dependence on variation versus

    深入研究了光刻膠、鉻薄膜、石英等光學材料離子束刻蝕特性，分別以ar氣和chf3為工作氣體，研究光刻膠、鉻薄膜、石英等的刻蝕速率隨離子能量，束流密度和離子入射角度的變化關系，得到刻蝕速率與影響因素的擬合方程，為掩模的製作工藝路線提供了實驗依據和理論指導。
  14. Because of the resonant interaction between the reb electrons and the wave excitated by the embp instability, the reb electrons cannot transport continuously, but in form of current clumps. the transport velocity is close to the phase velocity of the wave

    因為embp不穩定性所激發的波和束流電子之間的共振相互作用，束流電子不是連續地傳播，而是以電流團的形式傳播，傳國防科技大學研究生院學位論文播速度接近於波的相速度。
  15. Simulation calculation for the energy deposition profile and the transmission fraction of intense pulsed electron beam at various incident angles

    不同入射角度下強流脈沖電子束能量沉積剖面和束流傳輸系數模擬計算
  16. In the section of fabricating technology, i first discuss the ion beam technology. through the analysis of the effects of each parameter on the surface smoothness, profile fidelity and linewidth resolution in the process of ion etching, the suitable angle of incident ion beam, ion energy, density of ion beam and time of etching are selected combining the actual status of the mask

    在製作工藝的研究方面，首先研究了離子束刻蝕技術，通過對離子束刻蝕過程中各個參數對刻蝕元件的表面光潔度、輪廓保真度和線寬分辨的影響分析，結合掩膜的實際情況選擇出了合適的離子束入射角、離子能量、束流密度和刻蝕時間等參數。
  17. Investigations on beam - current - pulse - shortening in a long pulse relativistic klystron amplifier

    長脈沖相對論速調管中束流脈沖縮短的研究
  18. From 1994 to the end of 1996, sps accelerated lead ion bunch to 158 a gev

    1994年到1996年底， sps又成功地加速了158agev的鉛離子束流。
  19. Application of digital beam position processor libera on tune measurement

    數字束流位置處理器在工作點測量中的應用
  20. Some correlative designs and experiments are finished before the microwave test experiment. the property of a finite long magnetic coil is studied and the coil magnetic field circuit is constructed for the experiment of microwave. a digital two - channel trigger device is designed and successfully applied in the experiment

    為了微波實驗的順利進行，我們設計並加工了磁場線圈，研製了控制磁場線圈迴路觸發和強流電子束加速器觸發同步的兩路數字同步觸發器，研製了測量電子束流的法拉第筒，並成功地將這些設備應用於微波實驗研究。
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