照相縮小 的英文怎麼說

中文拼音 [zhàoxiāngsuōxiǎo]
照相縮小 英文
photoreduce
  • 照 : Ⅰ動詞1 （照射） illuminate; light up; shine 2 （反映） reflect; mirror 3 （拍攝） take a picture ...
  • 相 : 相Ⅰ名詞1 （相貌; 外貌） looks; appearance 2 （坐、立等的姿態） bearing; posture 3 [物理學] （相位...
  • 縮 : 縮構詞成分。
  • 小 : Ⅰ形容詞1 （體積、面積、數量、強度等不大） small; little; petty; minor 2 （年紀小的; 年幼的） youn...
  • 照相 : 1 （拍照） take a picture; take pictures; take photographs; take photos; photographing base; phot...
  • 縮小 : reduce; lessen; narrow; shrink; reduction; contraction; minification; diminution
  1. A camera takes a tiny microfilm photograph of each page of the form.

    照相機把表格的每一頁拍成極小的縮微（照）片。
  2. Photolithography then reduces the size of the pattern in a process analogous to that used in a photographic darkroom [ see illustration on opposite page ]

    接著，光蝕刻法用一種類似照相暗房中進行的過程（見右頁圖） ，把圖案的尺寸縮小。
  3. Therefore, in order to narrow regional gap, boost minority regions development, china, whose market growth is in a premature stage, market mechanism is not perfect, and is in a transitional period of new and old system, must refer to developed countries " successful experiences according to the principle of scientific and reasonable, standard, fair and open, combination of unified system and inclined pol

    因此，對於市場發育程度比較低、市場機制不健全，尤其是處于新舊體制轉換時期的中國來說，為縮小地區間的差距，加快民族地區的發展，必須借鑒發達國家的成功經驗，按照科學合理、規范公正透明、統一體制與傾斜照顧相結合以及扶持與激勵相兼容的原則，進行詳細的制度設計，建立規范的對民族地區財政轉移支付制度的基本框架和保障措施，以保證宏觀經濟政策的有效性。
  4. Conclusions as following have got through test study : ( 1 ) when impact compaction technology is applied to treat collapsible loess subgrade, the effect depth may be treated generally can not override 80 cm and impact compaction pass is optimum at 30 times. ( 2 ) for stratified impact compaction of subgrade, when compactness of each level reaches codeslstandards loose laying depth of 80 cm fits 40 impact compaction pass is the optimum combination of subgrade construction. when average compactness in each level reaches codeslstandards loose laying depth of 80 cm fits 30 impact compaction pass is the optimum combination o ( 3 ) the quality control method may request impact compaction pass as the main control index and at the same time the final division settlement is less than 10 % of total settlement as large area subgrade is constructed

    通過試驗研究主要得出如下認識：沖擊壓實技術處理濕陷性黃土地基時，其有效處理深度一般不超過80cm ，沖壓遍數以30遍左右為宜；對路基分層沖壓，在要求土體中各點壓實度均達到規范要求時，路基沖壓最佳組合為虛鋪厚度80cm 、沖壓40遍；在只要求土體平均壓實度達到規范要求時，路基沖壓最佳組合為虛鋪厚度80cm 、沖壓30遍；大面積施工時，質量控制方法可按照在以沖壓遍數作為主要控制指標的同時，要求最後10遍分計沉降量小於累計沉降量10 ；在施工單位自己購置沖擊壓實機情況下，與傳統施工相比較，沖擊壓實技術是一種既能節約資金又能大量縮短工期的施工方法。
  5. ( 2 ) effects on mouse spleen of so2 challenge : we found significant apoptotic changes of mouse spleen through tem observation and dna electrophoresis analysis and flow cytometric analysis. we found condensed, marginating, half - moon like apoptotic lymphocytes both in white pulp and red pulp ; we found significant dna degradation with dna ladders from the dna electrophoresis analysis in the 168 mg / m3 so2 treated group ; we also found marked increase of apoptotic rate between 168 mg / m3 so2 treated group and control group from the flow cytometric analysis

    （ 2 ）二氧化硫吸入可引起小鼠脾臟細胞出現明顯的凋亡改變，紅髓區和白髓區淋巴細胞出現核固縮，染色質凝聚、邊集； dna凝膠電泳分析發現168mg m ~ 3二氧化硫染毒組出現典型的dna梯形條帶；流式細胞分析也發現高劑量染毒組的小鼠脾細胞凋亡率增加，並且與對照組相比有顯著性差異， p 0 . 05 。
  6. In the manufacture of semiconductor devices, a photographically reduced representation of a circuit or element as used to establish an etching pattern

    在半導體器件製造中，以縮小的照相方式表示的電路或元件，用於建立刻蝕圖案。
  7. Since metal - oxide - semiconductor ( mos ) device appeared, integration of integrated circuit ( ic ) expands as moore law. meanwhile the dimension of device scales down, the thickness of sio2 gate dielectric shrinks as the same law. but as the thickness of sio2 gate dielectric reaches at isa, the gate current rises very quickly and reaches at 1 10a / cm2

    自從金屬-氧化物-半導體（ mos ）器件出現以來，集成電路的集成度按照摩爾定律增加，相應地，器件的物理尺寸按照等比縮小的原則不斷縮小， sio _ 2作為柵介質的厚度不斷縮小，特徵尺寸在0 . 1 m以下的集成電路要求sio _ 2柵介質的厚度小於1 . 7nm 。
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