熱離子陰極 的英文怎麼說

中文拼音 [ziyīn]
熱離子陰極 英文
hot cathode
  • : Ⅰ動詞1 (離開) leave; part from; be away from; separate 2 (背離) go against 3 (缺少) dispens...
  • : 子Ⅰ名詞1 (兒子) son 2 (人的通稱) person 3 (古代特指有學問的男人) ancient title of respect f...
  • : Ⅰ名詞1 (中國古代哲學認為宇宙中通貫物質和人事的兩大對立面之一) (in chinese philosophy medicine ...
  • : i 名詞1 (頂點; 盡頭) the utmost point; extreme 2 (地球的南北兩端; 磁體的兩端; 電源或電器上電流...
  • 離子 : [物理學] ion
  1. The hydrogen in the gauge is ionized by electron emission from a heated cathode.

    計內的氫氣是用一個加放射電來電的。
  2. The voltage of lithium - intercalation reaction, impedance and structural stability of intercalation - type cathode material were analysed and calculated. theoritical results show that the reaction voltage depends on the content of lithium and the bond energy, and that the key ways to lower the electrode impedance are to increase the electronic conductivity of the electrode and the diffusion coefficient of lithium ion in the host and to decrease the size of powder. in addition, the thermal stability of lithium - insertion structure can be improved by using crystallographic co - lattice theory and doping treatment

    本文從嵌入式材料的嵌鋰反應的電壓、阻抗及結構穩定性的分析和理論計算著手,得到了電壓取決于基體中各種間的鍵能及鋰含量、降低電阻抗的關鍵是提高電型導電性和li ~ +在基體中的擴散系數及減小粉末粒度的理論依據及其利用晶體的共格原理和摻雜改性的方式來提高材料嵌鋰結構的穩定性的設計思路。
  3. In this paper , first, the author drew some important conclusions by analyzing several technical factors and experimental conditions which would have great influence on the quality of diamond thin films during mpcvd process , including gas proportion , the power of microwave , the plasma ' s location, the nucleation technique, etc. finally , the author has successfully deposited nanocrystalline diamond thin films with 300nm crystal particles on the slick surface of silicon by using ch4 / h2 gases in the mpcvd system , and the nanocrystalline diamond thin films was proved to have good field emission performance. all these researches will make the foundation for the field emission cathode of diamond films

    本論文中,作者分析了mpcvd方法中氣源成分比、微波功率、等體球的位置、成核技術等各種工藝條件對金剛石薄膜質量的影響,並總結得到了一些有意義的結論;同時,在自行研製的mpcvd沉積系統上,於4 - 7kpa 、 1000左右的力學條件下,採用ch4 / h2氣源氣氛在光滑的硅襯底上制備出了晶粒尺寸在300納米以下的納米晶金剛石薄膜,測試得到了較好的薄膜場致電發射性能,為金剛石薄膜場致發射冷的研究工作打下了實驗基礎。
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