等沉積條件線 的英文怎麼說

中文拼音 [děngchénjītiáojiànxiàn]
等沉積條件線 英文
isodietic
  • 等 : Ⅰ量詞1 （等級） class; grade; rank 2 （種; 類） kind; sort; type Ⅱ形容詞（程度或數量上相同） equa...
  • 沉 : Ⅰ動詞1 （沉沒; 墜落） sink 2 （沉下 多指抽象事物） keep down; lower 3 [方言] （停止） rest Ⅱ形容...
  • 積 : Ⅰ動詞（積累） amass; store up; accumulate Ⅱ形容詞（長時間積累下來的） long standing; long pending...
  • 條 : Ⅰ名詞1 （細長的樹枝） twig 2 （條子） slip; strip 3 （分項目的） item; article 4 （層次; 秩序; 條...
  • 件 : Ⅰ量詞（用於個體事物） piece; article; item Ⅱ名詞1. （指可以一一計算的事物） 2. （文件） letter; correspondence; paper; document
  • 線 : 名詞1 （用絲、棉、金屬等製成的細長的東西） thread; string; wire 2 [數學] （一個點任意移動所構成的...
  • 沉積 : [地] deposit; sedimentation; deposition; precipitation
  • 條件 : 1. （客觀的因素） condition; term; factor 2. （提出的要求） requirement; prerequisite; qualification
  1. Study achievement appears as following aspects : ( 1 ) yellow river estuary gate river flow and tide flow mixed area is not keep standing deposition status, on special income water and sediment conditions, boundary conditions and oceanic power conditions, this area may on the scour status ; ( 2 ) observed from estuary sediment deposition distributing process : delta and sea offing area sediment deposition vary trend is similar, each part sediment deposition scale varies as wave shape ; ( 3 ) on estuary gate, affect the sediment deposition factors, primary factors are tide prop, the gate widens gradually, estuary gate have branches, brine induced flocculation. this paper study the estuary gate widen, estuary gate have branches to affect the river channel deposition in quantity ; ( 4 ) based on field measured data, for the first time, deduce the estuary sediment deposition and distributing regress formula which can estimate estuary different areas sediment deposition volume ; ( 5 ) this subject demonstrate the estuary delta coastline dynamic balance conception, build the relationship between the estuary income sediment with deposition land area, draw the following important conclusion : when estuary years - averaged income sediment keeps at 345 million tons, the delta coastline may on the dynamic balance status. ( 6 ) this subject firstly brings up estuary sediment optimized control conception, and has the primary study on the macroscopically optimized control conception method

    研究認為： （ 1 ）黃河河口口門逕流潮汐區域並非持續保持淤積狀態，在特定的來水來沙、邊界條件和海洋動力條件下，該區域可以處于沖刷狀態； （ 2 ）從河口泥沙沉積分配的過程來看：三角洲與濱海區泥沙的沉積變化趨勢是基本一致的，各部位的泥沙沉積比例變化基本呈波動狀態，且三角洲與濱海區泥沙的沉積比例與來沙量密切相關，基本成正比關系； （ 3 ）在口門處，影響泥沙沉淤的因素主要集中在潮汐頂托、口門逐漸加寬、河口門分汊、鹽水造成絮凝等，本報告主要對口門加寬，口門西妥理工大學工程碩士專業學位論文分漢對河道淤積的影響進行了定量分析: （一扣根據實測資料首次建立了河贖流路泥沙沉積分配的回歸計算式，據此可以預估計算河口不同區域泥沙的沉淤量; 、 5 ）本項研究首次論證了河口三角洲岸線動態平衡的概念，並建立了黃河河口來沙量與造陸面積的相關關系，得出了當河口多年平均來沙量維持在3 . 45億t時其河口三角洲岸線則可能處于動態平衡狀態的重要結論; 『 6 ）本項研究首次提出了河口泥沙優化調控的概念，並對其宏觀優化調控模式進行了初步探討。
  2. In the third chapter of this thesis, the nickel electrodeposition process in leaching solution containing ammonia and chloride was summarized, and the electrochemical behaviour of nickel electrodeposition in ammonia complex bath was investigated by measuring polarization curves. the effects of total nickel, ammonia, ammonium chloride concentrations in the electrolyte as well as its anion species and temperature were studied systematically

    在第三章中首先對氨絡合物體系電積金屬鎳的工藝進行了總結，並通過極化曲線測量，對氨絡合物體系中鎳陰極電沉積電化學行為進行了研究，系統探討了溶液中總鎳離子濃度、氨水濃度、氯化銨濃度、陰離子及溫度等工藝條件對鎳陰極還原的影響，而後著重對電積鎳的反應機理進行了研究。
  3. The relationship between sputtering conditions and the depositional speed shows : with working pressure 1. 2 pa, sputtering power 180w, the depositional speed of tio2 thin film is 40nm / h, and increases with the increasing of sputtering power. it can be also founded that the depositional speed is nearly proportional to the working pressure : within the range of 0. 3pa to 1. 6pa, the depositional speed increases linearly with the increase of ar pressure. with the enhancement of the substrate ' s temperature of sputtering or annealing, the resulted thin films show a tendency of decreasing in thickness, and increasing in refractivity

    本實驗是採用磁控濺射方法，在不同的溫度下制備了tio _ 2薄膜，並對薄膜進行了不同溫度和時間的退火處理，通過原子力顯微鏡（ afm ） 、 x射線衍射（ xrd ） 、掃描電鏡（ sem ）等檢測手段對薄膜的表面形貌和組成結構進行了分析，結果如下： （ 1 ）濺射工藝條件與薄膜沉積速度的關系表明：採用1 . 2pa工作氣壓， 180w的射頻功率tio _ 2薄膜的沉積速率為40nm h ，並隨射頻功率的增加而提高，呈近似的線性關系，在0 . 3pa 1 . 6pa氣壓范圍中，氬氣壓強升高沉積速率迅速增加，濺射溫度提高和退火處理能使薄膜的厚度減小和折射率提高。
  4. Based on the experiment and analysis, the optimum conditions for preparation of si02 films have been studied. furthermore, using the inverse designing idea of fgms, fe / mo and mo / sio2 fgms have been successfully prepared. finally, the composition and microstructure of the materials have been measured by x - ray debey powder diffraction ( xrd ), x - ray photoelectron spectroscopy ( xps ), scanning electon microscope ( sem ), step instrument and metallgical microscope

    在系統實驗的基礎上探討sio _ 2薄膜沉積工藝條件及其影響因素，獲取了sio _ 2薄膜的最佳工藝條件；採用功能梯度材料（ fgm ）的逆設計思想，在最佳沉積條件的基礎上成功制備出fe mo和mo sio _ 2功能梯度材料，並以x射線衍射， x射線光電子能譜，電鏡掃描，膜臺階儀，金相顯微鏡等手段對材料進行成分測定和表面形態結構分析。
  5. In order to study these questions, we researched three topics in this paper mainly : 1. we prepared zno nanowires using chemical vapor deposition ( cvd ) method based vapor - liquid - solid ( vls ) mechanism. our object was getting arrayed and controllable growth of zno nanowires through integrating the controllable ability of vls mechanism and merits of cvd and controlling the technique conditions of preparation

    針對以上存在的問題，本文主要在以下三個方面進行了初步的探索: 1 .採用基於氣-液-固（ vls ）生長機理的化學氣相沉積（ cvd ）法制備zno納米線，結合vls機理對生長過程的控製作用以及cvd方法的優點，通過對催化劑、源溫度、生長溫度和反應氣氛等工藝條件的控制，得到納米線的陣列化生長。
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