膜厚測量 的英文怎麼說

中文拼音 [móhòucèliáng]
膜厚測量 英文
film thickness measuring
  • 膜 : 名詞1. [生物學] （像薄皮的組織） membrane 2. （像膜的薄皮） film; thin coating
  • 測 : 動詞1. （測量） survey; fathom; measure 2. （測度; 推測） conjecture; infer
  • 量 : 量動1. （度量） measure 2. （估量） estimate; size up
  • 測量 : measure; survey; gauge; meter; measurement; measuring; surveying; mensuration; metering; gauging;...
  1. We prospectively investigated whether measurements of carotid intima - media thickness in the presence or absence of albuminuria in patients with stable chest pain syndromes can be used as a noninvasive test algorithm for prediction of significant coronary artery disease

    前瞻性研究穩定性胸痛綜合征患者在有/無蛋白尿時的頸動脈內膜中層厚度測量能否作為預測重要冠狀動脈疾病的一種無創性檢查方法。
  2. Thickness measurement of thin film for holographic plate by michelson interferometer

    用邁克爾遜干涉儀測量全息干板膜厚度
  3. In this thesis, mainly by fmr, combined with moke and magnetic measurement, systematical studies have been made on the magnetic properties, especially magnetic anisotropy in epitaxial single crystalline fe ultathin films on gaas and inas substrates in polycrystalline thin films and in polycrystalline nife and nifeco patterned films of micron and submicron rectangular elements arrays

    本論文以鐵磁共振為主要研究手段，輔助以磁性和磁光測量，對外延于gaas及inas上的不同厚度的單晶fe超薄膜、不同厚度的nife多晶薄膜和電子束光刻的多晶nife和nifeco單層利三明治結構的微米及亞微米矩形單元陣列圖形薄膜的磁性，特別是磁各向異性進行了較為系統的研究。
  4. Standard test method for nondestructive measurement of dry film thickness of nonconductive coatings applied to a nonferrous metal base

    非鐵金屬基表面非傳導塗層干膜厚度無損測量的標準試驗方法
  5. Standard practice for nondestructive measurement of dry film thickness of nonmagnetic coatings applied to ferrous metals and nonmagnetic, nonconductive coatings applied to non - ferrous metals

    應用於黑色金屬的無磁塗層和應用於有色金屬的無磁和不導電塗層的干膜厚度的無損測量的標準實施規程
  6. Quantitative measurement of retinal nerve fiber layer thickness by scanning laser polarimetry in normal eyes

    激光偏振光掃描儀測量正常人視網膜神經纖維層厚度的初步研究
  7. The company main product includes : the vacuum electron gun, opticsmembrane level thickness measuring instrument, the electron gunscanning control meter, the high efficiency crystal thyratron pressureregulator, the precise optics with the power source, the electricitycontrol the cabinet, the data acquisition module and so on

    公司主要產品有：真空電子槍、光學膜層厚度測量儀、電子槍掃描控制儀、大功率晶閘管調壓器、精密光學用電源、電氣控制櫃、數據採集模塊等。
  8. For xrd, ellipsometry examinations, single - side - polished si ( lll ) wafers were used as substrates and for resistance measurement, glass was used and for infrared examination, double - side - polished si ( lll ) wafers were used and for ultraviolet - visible spectrophotometry, double - side - polished quartz wafers were used and for tem micrograph and electron diffraction pattern observation, cu nets deposited by formvar film were used. the cu - mgf2 cermet films were from 50 to 600nm thick

    用於xrd分析、橢偏測量的單拋si （ 111 ）晶片和電阻測試的載玻片上淀積膜厚約為600nm ；用於ir測試的雙拋si （ 111 ）晶片和uv測試的石英玻璃片上淀積膜厚約為250nm ；用於透射電鏡分析的樣品則淀積在400目銅網上的支撐formvar膜上，膜厚約為50 100nm 。
  9. Being master control part, user controller stores, manages, display and query user information ; as slave control part, sub - user controller calculates and temporarily stores power sent from measuring module ; measuring module measures electric energy by using power meter ' s special circuit which simplifies circuit design and connects or breaks up power supply circuit by relay ; in order to transmitting data fast and exactly, rs - 485 communication standard is adopts between user controller and sub - user controller

    主控部分用戶控制模塊可存儲、管理、顯示和查詢用戶電能信息；從控部分子用戶控制模塊計算並暫存電能測量模塊輸出功率數據；電能計量模塊採用電度表專用厚膜電路hdb6進行電能計量，簡化了電路設計，同時還利用繼電器控制連接或斷開用戶的供電迴路；在主從部分間採用rs - 485通信標準實現數據快速、準確的傳輸。
  10. The transmittance and reflectance spectra of bn films were obtained as a function of incident photon wavelengths, and the thickness of films was measured by alpha - step meter

    用紫外-可見分光光度計測量了沉積在石英片上的bn薄膜的透射光譜和反射光譜，用臺階儀測量薄膜的厚度。
  11. Either the boron nitride ( bn ) thin films with different cubic phase content were deposited on n - type si ( 111 ) and fused silica substrates by radio frequency ( rf ) sputtering using two - stage deposition process. the films were characterized by fourier transform infrared ( ftir ) spectroscopy. the transmittance te ( ) and reflectance re ( ) were obtained as a function of incident photo wavelengths and the thickness of films was measured by alpha - step. the absorption coefficient was calculated from te ( ) and re ( ). the optical band gap ( eg ) of the films was determined by effective medium form of formula containing eg

    本文還研究了立方相含量與光學帶隙的關系，在n型si （ 111 ）片和熔融石英片上沉積出不同體積分數的立方氮化硼薄膜，薄膜的成分由傅立葉紅外吸收譜標識；用紫外-可見分光光度計測量了沉積在石英片上的bn薄膜的透射光譜te （ ）和反射光譜re （ ） ，薄膜的厚度用臺階儀測得。
  12. Tianwei wood industry company has competely adopted advanced equipment and machinery of china and estalished strict quality control and management systeml. the " rose " brand series products of birch board. veneer and construction laminated board produced by this company with its advancd and precise equipment and testing devices are excellent in quality and wide in application. along wide in application, along with its continuous development, the company has put larger investments in quality control and technologies of producion so that its all kinds of products have won huge potentials to occupy the markets an have been well received by all the customers

    天威木業公司全部採用國內先進的機器設備，建立嚴格的質量管理體系；應用精密的儀器檢測生產的「玫瑰」牌系列楊、樺木，膠合板及高檔建築覆膜板，質量上承，用途廣泛，隨著公司的不斷發展，對板材質量，科技加大了投入，為各類產品贏得市場，搶占商機創造了巨大的潛力，得到了廣大消費者的厚愛，產品原暢銷于廣州、重慶、北京、上海、及全國個大城市，自2002年以來已經全部實現出口日本、韓國、中東及歐美等國家和地區，取得了世界各國廣泛的贊譽和認可。
  13. Finite difference time - domain method is used to calculate the reflection for these probes and absorbing boundary condition is used to deal with the singularity in the axis of the coaxial - line in the simulation. by comparing the reflection of different probes, the best probe has been selected according to sensitive requirement. the influence of parameters : such as thickness of protective film, length of protruding inner conductor of the coaxial - line probe to the measurement has been studied

    通過時域有限差分法進行數值模擬分析，並採用吸收邊界處理同軸線軸心奇異點，計算出各種探頭測量相同溶液的反射系數，根據其測量的靈敏度，選出最優設計；並通過分析所選探頭的各種設計參數，如薄膜厚度、內導體伸出長度等的變化對測量結果的影響，找出該探頭各參數的最佳范圍，使其具有高度靈敏性，以適用於測量化學反應溶液的介電常數。
  14. The films have a smooth and glossy surface. the result of xrd shows that the film demonstrates good properties of integrity, epitaxial - like grown and no other impure phase

    所得薄膜表面平整、光滑且厚度均勻，經xrd測量，結構完整，無其它雜相，基本為外延生長。
  15. It can measure shell speed and crusting of film laminating by adopting fks - 1 tester of film laminating capacity ; the principle of this instrument is that it makes film laminate on heating plate and turns 90or 180 of heating plate for moving un - shell sand. and then it measures shell thickness and observes cocking condition of surface sand

    採用fks - 1型覆膜砂結殼性能測試儀可以觀測覆膜砂的結殼速度和起皮狀況，其原理是將覆膜砂撒在加熱板上，經過某一時間之後，將加熱板旋轉90或180移去未結殼的鬆散砂，然後測量結殼厚度，並觀察表層砂的翹起情況。
  16. The combining measurement of the retinal nerve fiber layer thickness with elcetrophysiological test to detect primary open angle glaucoma

    定量測量視網膜神經纖維層厚度聯合視覺電生理檢查開角型青光眼
  17. On the design of the system, the thickness measure system of mems chip is built based on lbu and pump - probe technology. on the analysis of data, the reflectivity curve is analyzed using the law of reflectivity change induced by ultrasound, and the thickness is calculated using the system designed by the article, to aluminum film the size of about 20nm can be measured, when the film be measured is single layer, the relative error of the system is less than 2 %, when the film be measured is double layer, the relative error of the system is less than 10 %

    在基礎理論方面研究了激光（特別是超短脈沖激光）超聲的激勵機理，探討了激光調制技術以提高系統信噪比，闡述了泵束探針束技術及相關實驗設置；在系統設計上，以激光超聲為基本原理，以泵束探針束技術為系統設計方案完成了mems基片厚度測量系統的設計；在數據分析方法上，利用聲致光反射率變化的一般規律對測得的光反射率曲線進行分析，確定超聲回波在薄膜兩界面間來回傳播的時間，以計算薄膜的厚度。
  18. A fitting curve between the decay time constant and the film thickness of ybco was obtained, and the film thickness can be obtained from the fitting

    另外還作出了ybco薄膜的薄膜厚度與衰減時間常量之間的關系曲線，提出了測量ybco薄膜厚度的一種新方法。
  19. The phase structure of different cu - fe thin films were studied by using grazing incidence x - ray analysis ( gixa ). the texture and residual stress of different cu - fe thin films were measured by scan of x - ray diffraction ( xrd ) and 2 scan with different. the thicknesses of different thin films were characterized by means of small angle x - ray scattering ( saxs ) technique. by using atomic force microscope ( afm ) measured surface roughness of thin films. the component of different thin film was characterized by energy disperse spectrum ( eds ) and x - ray fluorescence ( xrf ). the magnetic properties of cu - fe thin films were measured by means of vibrating sample magnetometer ( vsm ). in addition, the giant magnetoresistance ( gmr ) effects of different films were also measured. the original resistance of the film fabricated by a direction - current magnetron sputtering system is directly affected by bias voltage

    利用掠入射x射線分析（ gixa ）技術對不同cu - fe薄膜的相結構進行了研究;利用xrd掃描及不同角度的2掃描對薄膜進行了結晶織構及殘余應力分析;運用小角x射線散射（ saxs ）技術測量了薄膜的厚度;採用原子力顯微鏡（ afm ）觀察了薄膜的表面形貌;運用能量損失譜（ eds ）及x射線熒光光譜（ xrf ）對薄膜進行了成分標定;使用振動樣品磁強計測量了不同cu - fe過飽和固溶體薄膜的磁性能;最後利用自製的磁阻性能測試設備測量了真空磁場熱處理前後不同薄膜的巨磁阻值。
  20. Samples are prepared at 1100 and 1200 for different time from 5 minutes to 4 hours to study direct - nitridation kinetics. the thickness of the silicon nitride films is measured by single - spot thickness system produced by filmetrics co. ltd. the direct - nitridation kinetics curve is attained and the maximum thickness of the silicon nitride film is about 50nm

    為研究矽片氮化動力學，在1100和1200的溫度下制備了從5分鐘到4小時的各個氮化時間的樣品，並採用了不同晶面取向的矽片和不同的矽片放置位置，用filmetrics公司生產的f20型膜厚測量儀測得各個樣品的厚度，得到了實際的氮化動力學曲線和氮化薄膜的最終膜厚約為50納米，氮氣曲線較好地符合了氣固反應類型的動力學曲線。
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