膠蝕刻 的英文怎麼說

中文拼音 [jiāoshíkè]
膠蝕刻 英文
glue etching
  • 膠 : Ⅰ名詞1 （某些具有黏性的物質） glue; gum 2 （橡膠） rubber 3 （姓氏） a surname Ⅱ動詞（用膠粘） st...
  • 蝕 : Ⅰ動詞1. （損失; 虧耗） lose 2. （腐蝕） erode; corrode Ⅱ名詞（天體現象） eclipse
  • 蝕刻 : [電學] [冶金學] etch; etching
  1. In allusion to some types of the functional fibre s performances and characters the paper mainly has this fibres microstructure scanned by electron microscrope. in addition we also discuss their differences of microstructure eroded by the plasm. meanwhile by performing mechanics analysis we get theoretical analysis of their space - conglomerating structure. finally we perform analysis of the ultraviolet radiation and analysis of the caloricr weightlessness. as a result these types of fibre not only keep their own fine traits, but also own good conglomerating structure, crystal limit, calorifics performance and mechanics performance. compared with the ordinary fiber, the neatness of high - contracted polyester fiber increases and it s diameter also increases. there are bubbles in the burning - resisting viscose fiber and it has smooth vertical structure

    對應子高收縮的滌綸纖維的平整度有所提高，有較普通纖維變粗的趨勢；在難燃粘膠纖維裏面有氣泡，其具有較明顯的光滑平整縱向結構；滌綸系列棉纖維，在其耐刻蝕方面是比較強的，僅有均勻的小部分刻蝕現象；抗菌衛生級粘膠纖維的刻蝕效果是較差的：難燃的粘膠纖維，刻蝕的效果最好；而抗紫外粘膠纖維刻蝕的效果略有遜色。
  2. Lin h, li l and zeng l., " in - situ end - point detection during ion - beam etching of multilayer dielectric gratings ", chin. opt. lett., 3 ( 2 ), 63 ( 2005 )

    林華， "介質膜光柵:光刻膠掩模占寬比和離子束刻蝕槽深的監控" ，博士論文，導師:李立峰（ 2006 ）
  3. Therefore, the imaging characteristics of thick resist photolithograph are investigated in this paper based on the exposing and developing theories of thin film resists. firstly, the influences of nonlinearities in imaging process of thick resist lithography are studied

    本論文以抗蝕劑的曝光顯影理論為基礎，深入開展了厚層抗蝕劑的成像特性的研究，可為厚膠光刻實驗提供指導依據。
  4. Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to develop a yield - driven layout design tool, the engineers could use it to automate the tasks of advanced mask design, verification and inspection in deep sub - micron semiconductor manufacturing

    建立準確描述由於掩模製造工藝、光刻膠曝光、顯影、蝕刻所引起的光學鄰近效應和畸變所導致的關鍵尺寸變化的光刻工藝模型，有助於開發由成品率驅動的版圖設計工具，自動地實現深亞微米下半導體製造中先進的掩模設計、驗證和檢查等任務。
  5. The feasibility that kaufman ion source is applied in reactive ion beam etching is discussed. etching characteristics of materials, including pr, cr, quartz, are investigated. the etch rate and mechanisms of such materials are measured and analyzed as a function of ion energy, ion beam density and ion incidence angle in pure ar and chf3, respectively. the etch rate has shown a square root dependence on variation versus

    深入研究了光刻膠、鉻薄膜、石英等光學材料離子束刻蝕特性，分別以ar氣和chf3為工作氣體，研究光刻膠、鉻薄膜、石英等的刻蝕速率隨離子能量，束流密度和離子入射角度的變化關系，得到刻蝕速率與影響因素的擬合方程，為掩模的製作工藝路線提供了實驗依據和理論指導。
  6. One company selling hydrochloric acid for etching cement floors reckoned that, because it was in gel form and could legally be washed down the drain, the product was environmentally friendly

    一家銷售蝕刻水泥地鹽酸的公司以為鹽酸為膠液產品，可以被合法地沖進下水道，因此是環保產品。
  7. In the third section, i. e. chapter five, the normal raman spectra of nil2, cul2, pdl2 powder are studied under the excitation of laser with the wavelength of 632. 8nm and aqueous silver colloid is prepared by pulsed laser ablation, from which the surface enhanced raman spectra of the three compounds are obtained. after preliminary assignment, the identical and different features of vibration of the compounds due to the different central metal atoms are analyzed

    第三部分，即論文的第五章，我們以632 . 8nln為激發波長研究了nilz 、 culz和pdl :三種新型金屬有機化合物粉末的正常拉曼光譜，並且以脈沖激光刻蝕法制備了水銀膠，以其為襯底研究了三種化合物溶液在其上的表面增強拉曼光譜，通過對其拉曼光譜進行了初步指認，了解由於中心原子的不同，三種金屬有機化合物分子振動的相同和區別。
  8. Although the rigidity is 45hrc, toolox44 is easy to process, especially suitable for manufacturing plastic moulds with the help of its good polishing and etching performance. the other applications include rubber mould, forming mould, machine parts, and wearable parts

    盡管硬度? 45hrc toolox44很容易加工，特別適合製造塑料模具，因?它的拋光和蝕刻效果很好。其他應用領域包括：橡膠模具成型工具機器部件耐磨部件。
  9. The studies expressed that the tensile - strength declined with the growth of dose rate after the radiation treatment, and at the same time, the gel content had extreme value with the change of the dose rate. the surface of uhmwpe fibers showed some irregular micro - pits and dents after radiation treatment, narnely rough degree increasing. their number and deepness increased with increase of dose. and this phenomenon is the most obvious when the dose rate was 8. 5kgy / s and the dose was 400kgy. at the same time some containing oxygen groups, including hydroxyl group, carbonyl group and carboxyl group, were introduced into the fiber surface which was exposed to the air

    研究表明， uhmwpe纖維經電子束輻照處理后，纖維的拉伸斷裂強度隨劑量率的增加呈下降趨勢，凝膠含量隨著劑量率的變化存在極值。纖維表面出現了不規則的微裂紋和凹痕，隨著劑量的增大，電子束對纖維表面的刻蝕程度增加，在本研究中以劑量為400kgy劑量率為8 . 5kgy s時刻蝕效應最為明顯。同時，在空氣中進行輻照時，纖維表面被引入了一些含氧基團，包括羥基、羰基和羧基。
  10. Our main business line including lapel pins, badges, key chains, cufflinks, bookmarks, coins, medals, nameplates, tie bars, lights, cigarette cases, etc

    我們的生產工藝齊全：琺瑯、仿（軟）琺瑯、烤漆滴膠、蝕刻（咬板）滴膠、印刷、合金填色、鐳射等。
  11. Abstract : based on ash chamber of metal etch, this paper describes the full process of dry clean development and evaluation

    摘要：本文以金屬刻蝕去膠腔為背景，簡述干刻清洗工藝開發和評價過程。
  12. The diffraction efficiency of phase mask is discussed by using rigorous coupled - wave theory. the results are useful for fabrication of phase mask. and the diffraction efficiency of linearly chirped phase mask is discussed, it presents require of ion - beam etching

    利用嚴格耦合波理論對光纖光柵相位掩模的衍射效率問題進行了深入研究，以達到指導光纖光柵相位掩模實際製作的目的，並且研究了啁啾掩模的衍射效率問題，為線性啁啾光刻膠掩模的離子束刻蝕提出了要求。
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