蝕刻光柵 的英文怎麼說

中文拼音 [shíkèguāngzhà]
蝕刻光柵 英文
ethced grating
  • 蝕 : Ⅰ動詞1. （損失; 虧耗） lose 2. （腐蝕） erode; corrode Ⅱ名詞（天體現象） eclipse
  • 光 : Ⅰ名詞1 （照耀在物體上、使人能看見物體的一種物質） light; ray 2 （景物） scenery 3 （光彩; 榮譽） ...
  • 柵 : 柵名詞（柵欄） railings; paling; palisade; bars
  • 蝕刻 : [電學] [冶金學] etch; etching
  1. Lin h, li l and zeng l., " in - situ end - point detection during ion - beam etching of multilayer dielectric gratings ", chin. opt. lett., 3 ( 2 ), 63 ( 2005 )

    林華， "介質膜光柵:光刻膠掩模占寬比和離子束刻蝕槽深的監控" ，博士論文，導師:李立峰（ 2006 ）
  2. Then, the kirchhoff scalar diffraction theory is used to derive the scatter field of the edo grating and the simulation model is presented

    並利用基爾霍夫標量衍射理論導出了edg光柵散射場的公式，建立了對蝕刻衍射光柵的模擬模型。
  3. By studying and using conventional 1c process in combination with electron beam lithography ( ebl ), reactive ion etching ( rie ) and lift - off process, several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires, si quantum dots, double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes

    研究利用常規的硅集成電路工藝技術結合電子束光刻，反應離子刻蝕和剝離等技術制備半導體和金屬納米結構，很好地解決了普通光刻與電子束光刻的匹配問題，提高了加工效率，經過多次的工藝實驗，摸索出一套制備納米結構的工藝方法，首次用電子束光刻，反應離子刻蝕和剝離等技術制備出了多種納米結構（硅量子線、量子點，雙量子點和三叉指狀的金屬柵結構） 。
  4. Polarization dispersion analysis for etched diffraction grating demultiplexer

    刻蝕衍射光柵解復用器的偏振色散分析
  5. It has broad application prospect in the following fields such as microelectronics, photoelectronic devices, large screen flat panel display, field emitter array, acoustic surface wave device, photon crystal, light waveguide array, holographic honeycomb lens and micro - optical element array, micro - structure manufacture, fabrication of large area grating and grid of high resolution, photoresist performance testing, profile measurement and metrology, etc. the paper only involves the primary research of interferometric lithography

    在微電子、光電子器件、大屏幕平板顯示器、場發射器陣列、表面聲波器件、光子晶體、光波導陣列、全息透鏡和微光學元件陣列、微結構製造，高分辨、大面積光柵和網格製造，在抗蝕劑性能測試、面形測量和計量等領域，干涉光刻技術都具有廣闊的應用前景。
  6. We give some useful analyses and the computer simulations for the ion etching process. compared with the atomic force microscope ( afm ) scanning photograph of the etching surface, the theoretical results prove that these simulation analyses assure the precision required by this problem, so these mathematical models are reasonable and correct. the analysis method in this paper is useful to analyze etching process, and it can also afford some valuable reference to etching technology

    在本論文我們主要利用這個數學模型，對使用離子束刻蝕製作單臺階光柵的臺階與溝槽部分的表面面形隨時間的演變過程分別進行了計算機模擬分析，並通過把理論結果與在實驗中得到的刻蝕表面在原子力顯微鏡（ afm ）下拍攝的照片進行比較，結果說明這種模擬分析能夠保證對該問題分析所要求的精度，從而也證明了理論模型的合理性和正確性。
  7. Process of etched - grating demultiplexer based on silicon - on - insulator

    材料的刻蝕光柵分波器的製作工藝
  8. Through the analysis, it is shown that : 1, while fabricating the grating, the principle of selecting the parameters is : the period should be as large as possible, the etching depth should be small and filling factor should approach to 0. 25. 2, if selecting the parameter combine the selecting principle and the requirement of concrete application, the space of selecting the parameter should be larger than before. 3, while the period to. 4a, the surface profile has no effect on the reflectivity

    通過分析發現： 1 、在製作有一定特性的光柵時，光柵參數的選擇原則為：周期的取值應盡量的大，刻蝕深度的取值應盡量的小，占空比的取值應盡量靠近f = 0 . 25 ； 2 、以參數的選擇原則結合製作的具體應用要求宋選擇光柵的參數，則各個參數的優化空間更大； 3 、當光柵的周期t 0 . 4時，表面面形對反射率沒有影響； 4 、運用臨界周期點隨折射率的變化規律，可以避免由於選擇光柵周期過大而出現一級衍射，從而導致製作失敗。
  9. Based on this simulation method, the following novel designs are developed : 1, the two - stigma design, which can reduce the aberrations and improve the imaging of the grating ; 2, the flat - field design, which can omit the output waveguides and make an edg easier tc fabricate ; 3, the passband flattening design, which can relax the requirements on wavelength control for lasers and filters in a wdm system ; 4, the reduced back - reflection design, which guarantees very little reflection light back into the input channel and improves the feature of the return loss

    本論文以用於光通信中的平面集成蝕刻衍射光柵為研究對象，具體的分析了的它的工作原理和設計思想，並給出了設計中的經驗和方法。器件設計后需要進行性能計算和模擬以減小復雜的集成光器件製作試驗，本論文描述了計算蝕刻衍射光柵比較準確的模擬方法，其結果能夠很好的接近實際情況。基於這樣的模擬計算方法，本論文提出了改進蝕刻衍射光柵設計的幾種方法： 1
  10. As the key device of a dwdm system, etching diffraction grating ( edo ) is one of the most potential types of planar waveguide dwdm devices

    作為波分復用中最關鍵的器件，蝕刻衍射光柵（ edg ）是平面波導密集波分復用器件中很有發展潛力的一種。
  11. Among all kinds of demultiplexers, etched diffraction gratings ( edgs ) are regarded as one of the most potential types of planar waveguide wdm devices. this phd thesis focuses on the design, simulation and fabrication of edgs for optical communications

    蝕刻衍射光柵是採用平面波導技術製成的集成密集波分復用器件，它具有通道損耗低、串擾小、器件尺寸小、容易擴展通道、製作和封裝工藝相對簡單等優點。
  12. Silicon grating is a period construction fabricated on the silicon wafer by micro fabrication techniques as ultraviolet lithography and anisotropic etching

    硅光柵是利用紫外光刻、各向異性腐蝕等硅微加工技術在矽片上製作的周期結構。
  13. The testing results shows that the grating has a very well antireflective characteristic, and the values of testing parameters approximately equals to the designed parameters ". it indicates that the plasma - assisted etching method is very valid to fabricate deep grating

    測量結果發現該光柵具有良好的增透特性，測得的光柵參數和理論設計的參數基本一致，說明等離子體輔助刻蝕是製作深光柵的有效方法。
  14. Etching a surface - relief grating into fused silica with inductively coupled plasma technology

    感應耦合等離子體技術用於熔融石英錶面凹凸光柵的刻蝕
  15. The diffraction efficiency of phase mask is discussed by using rigorous coupled - wave theory. the results are useful for fabrication of phase mask. and the diffraction efficiency of linearly chirped phase mask is discussed, it presents require of ion - beam etching

    利用嚴格耦合波理論對光纖光柵相位掩模的衍射效率問題進行了深入研究，以達到指導光纖光柵相位掩模實際製作的目的，並且研究了啁啾掩模的衍射效率問題，為線性啁啾光刻膠掩模的離子束刻蝕提出了要求。
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