蝕刻材料 的英文怎麼說

中文拼音 [shíkècáiliào]
蝕刻材料 英文
etching material
  • 蝕 : Ⅰ動詞1. （損失; 虧耗） lose 2. （腐蝕） erode; corrode Ⅱ名詞（天體現象） eclipse
  • 材 : 名詞1 （木料） timber 2 （泛指可以直接製成成品的東西; 材料） material 3 （供寫作或參考的資料） ma...
  • 料 : 名詞1 （材料; 原料） material; stuff 2 （喂牲口用的穀物） feed; fodder 3 （料器） glassware 4 （...
  • 蝕刻 : [電學] [冶金學] etch; etching
  • 材料 : 1. （原料） material 2. （資料） data; material 3. （適于做某種事的人才） makings; stuff
  1. More often, all of the materials exposed to the etchant have a finite etch rate.

    通常，所有暴露在刻蝕劑中的材料都具有一定的刻蝕速率。
  2. Testing of materials for semiconductor technology ; determination of etch rates of etching mixtures ; silicium - dioxid coating ; optical method

    半導體工藝材料的檢驗.蝕刻混合劑浸蝕率的測定.第2部
  3. Testing of materials for semiconductor technology ; determination of etch rates of etching mixtures ; silicium monocrystals ; gravimetric method

    半導體工藝材料的檢驗.蝕刻混合劑浸蝕率的測定.第1部
  4. The feasibility that kaufman ion source is applied in reactive ion beam etching is discussed. etching characteristics of materials, including pr, cr, quartz, are investigated. the etch rate and mechanisms of such materials are measured and analyzed as a function of ion energy, ion beam density and ion incidence angle in pure ar and chf3, respectively. the etch rate has shown a square root dependence on variation versus

    深入研究了光刻膠、鉻薄膜、石英等光學材料離子束刻蝕特性，分別以ar氣和chf3為工作氣體，研究光刻膠、鉻薄膜、石英等的刻蝕速率隨離子能量，束流密度和離子入射角度的變化關系，得到刻蝕速率與影響因素的擬合方程，為掩模的製作工藝路線提供了實驗依據和理論指導。
  5. On the basic of theory, experimental studies on laser cutting and polishing diamond film were carried out

    並且在實驗研究的基礎上，分析了激光刻蝕金剛石材料的基本規律。
  6. With metal fatigue in material mechanics, this paper deduces the limestone fatigue curve of longmen grottoes by means of marble s one within the error permission. by the experiment elects the crucial factors of current vibration environment in longmen grottoes, the author contrasts the result of the experiment with its fatigue curve referred above and analyses the fatigue effect of longmen grottoes. finally, it is pointed out that after longmen grottoes have being suffered weathering and water - erosion more than 1500 years, the vibration environment is becoming an crucial factor leads to fatigue effect, especially in those weak surface carvings just like the crossings of several rifts, serious weathering places, etc

    借鑒材料力學中金屬疲勞破壞的研究手段，在誤差允許范圍內用大理巖疲勞曲線推導出門石窟石灰巖疲勞曲線。通過對石窟實際振動環境中典型要素的抽取和振動試驗，將試驗結果與疲勞曲線進行對比，分析了門石窟的疲勞破壞效應。文章指出，在經歷了1500多年的風化和流水溶蝕后，振動環境已成為導致門石窟某些薄弱點如多條裂隙交叉點嚴重風化酥解的壁面雕刻品等產生疲勞破壞的重要誘發因素。
  7. This thesis work has researched the fabrication technics of photonic crystal defect waveguide with air - bridge structure and collecting waveguide ; suggested using uv - lithography and wet etching to fabricate traditional waveguide, after that, using eb - lithography and dry etching to fabricate photonic crystal holes, so can reduce the fabrication cost by a big range ; designed the moulding board, which can fabricate the air - bridge structure and is convenient for recognizing position in eb - lithography ; the structure consisted of traditional waveguides and etching grooves are fabricated on soi successfully, then an successful eb - lithography is realized on the structure, the defect waveguide collected with the traditional waveguide quite well ; used the etching grooves to do the sacrificial layer etching experiment, which grounded etching sacrificial layer by photonic crystal holes in next step

    提出採用紫外光刻工藝製作傳統波導結構之後，通過電子束曝光和干法刻蝕製作光子晶體小孔的工藝方案，大幅度減低了製作成本；設計出可形成空氣橋結構、並且適用於電子束曝光位置識別的光刻模板，在soi材料上成功製作出帶有空氣橋刻蝕預留槽以及接續光波導的結構，在該結構上成功實現了光子晶體帶隙波導的電子束曝光，帶隙波導與接續光波導位置接續良好；最後利用預留槽進行了刻蝕犧牲層的實驗，為下一步利用光子晶體小孔刻蝕犧牲層形成空氣橋結構打下了基礎。
  8. Furthermore, the etching rate, roughness versus incident laser fluences and pulse number are investigated theoretically and experimentally in detail by 3d surface analyzer. then a new priciple of pmma etched by excimer laser is given : the process is the interaction result of photodecomposition,

    隨后應用總結出的優化加工參數在該材料上刻蝕出了寬104 m ，深56 m ，矩形度高達80 % ，底面光滑的20個循環的pcr微流控晶元。
  9. The species has a long lifetime in the absence of etchable material.

    當能刻蝕的材料不存在時，這些物種就具有較長的壽命。
  10. Rf plasma system 9200 is a barrel - type batch stripping system with optional high temperature capabilities for photoresist removal, nitride etch, and other cleaning applications in semiconductor and mems fabs

    射頻等離子體9200是桶式爐脫模體，擁有可控制的高溫系統可去除光阻材料、氮化物蝕刻和半導體與微型機電系統等方面的清洗功能
  11. Process of etched - grating demultiplexer based on silicon - on - insulator

    材料的刻蝕光柵分波器的製作工藝
  12. It is praised as permanent heat insulating material with no need of renewal because it is not only safe but also durable in rigor condition of low and cryogenic temperature, underground, open air, flammability, moisture sensitivity and even chemical erosion

    它在低溫深冷地下露天易燃易潮以及化學侵蝕等苛刻環境下使用時，不但安全可靠，而且經久耐用，被譽為「不需更換的永久隔熱材料」 。
  13. Device processing : etching. surface passivation ; dielectric films

    元件製程：蝕刻，表面鈍化，介電材料薄膜。
分享友人
分享到 Line

分享到臉書