蝕刻技術 的英文怎麼說
中文拼音 [shíkèjìshù]
蝕刻技術
英文
etching technique-
With the reform of the economical system developing, improvement of the capacity and people ' s living standard, our country is also facing a series of new situations and new problems. at the same time, our party has lead all people in our country to create the new conjuncture that is chinese characterical socialism and has acquired a great accomplishment. it has proved that our party ' s organization and the party member are good on the whole. it is capable, but there are some problems that can not be ignored, something that are depressed even deteriorated, have come i nto being and affected the party member ' s ideals. they corrode the party member, affect the party ' s cohesion, flie organization, the party ' s battle strength and the relation between the party and the people
當今世界國際風雲變幻莫測，世界多極化趨勢繼續發展，經濟全球化進程與科學技術發展不斷加快，而舊的不平等的國際政治經濟秩序並沒有根本改變，霸權主義與強權政治依舊盛行，西方對我國的和平演變戰略一刻也沒有停止，而隨著經濟體制改革的深入發展，在生產力和人民生活水平不斷提高的同時，國內也面臨著一系列新情況新問題；與此同時，在社會主義市場經濟大潮中，我們黨帶領全國各族人民開創了建設有中國特色的社會主義的新局面，取得了世人矚目的偉大成就，事實證明我們黨的組織和黨員幹部總體上是好的，是有戰鬥力的，但是，黨內也產生了一些不容忽視的問題，一些消極的甚至是腐朽的東西逐漸滋生起來，從思想上、組織上和作風上侵蝕著黨員、幹部隊伍，影響著黨的凝聚力、戰鬥力的增強和黨同人民群眾的關系。Three potentials pertinent to various etching techniques are labeled in fig. 10.
與各種蝕刻技術有關的三個電勢標出在圖10中。" the hksar e - passports and e - d is will contain digital data including the holder s personal data and facial image which will be stored in the contactless chip embedded in the back cover of the travel documents, " mr peh said, " the holder s personal particulars and photograph will be inscribed onto the polycarbonate bio - data page of an e - passport or e - d i by laser engraving technology.
白韞六先生續稱：特區電子護照及電子簽證身份書的封底內，皆藏有非接觸式晶片。晶片內儲存了數碼資料，包括證件持有人的個人資料及容貌影像。而這些個人資料及相片，將會以激光刻蝕技術刻印在特區電子護照及電子簽證身份書上。Various technical improvements have made it possible to push the limits of photolithography
各種技術若能改進，便可推進光蝕刻法的極限。Ibm says its researchers optimized the sram cell design and circuit layout to improve stability and developed several novel fabrication processes in order to make the new sram cell possible
為了在減小內存單元的同時確保產品的安全性，該公司研究人員開發出了將電子束與光學刻蝕技術相結合的製造技術。Provide a whole set technology solution of " directly etching method of chemically forming veined and granular
表面化學紋理直接蝕刻的方法"技術服務In the section of fabricating technology, i first discuss the ion beam technology. through the analysis of the effects of each parameter on the surface smoothness, profile fidelity and linewidth resolution in the process of ion etching, the suitable angle of incident ion beam, ion energy, density of ion beam and time of etching are selected combining the actual status of the mask
在製作工藝的研究方面，首先研究了離子束刻蝕技術，通過對離子束刻蝕過程中各個參數對刻蝕元件的表面光潔度、輪廓保真度和線寬分辨的影響分析，結合掩膜的實際情況選擇出了合適的離子束入射角、離子能量、束流密度和刻蝕時間等參數。Directly etching method of chemically forming veined and granular aluminum alloys surface " which is the latest invention patent application number : 00117311. 1. the innovative and simple process is absolutely
現在所提供的"鋁合金表面化學紋理直接蝕刻的方法"發明專利申請: 00117311 . 1是最新發明專利技術，創新而簡易的蝕刻工序在"鋁件表面處理"量產時對比于傳統的機械噴沙絕對是Generic specification of ion beam etching system
離子束蝕刻機通用技術條件Heidelberg instruments mikrotechnik gmbh offers you pertinent information by telephone for the ranges micro technology, laser lithography and lithography in addition to semiconductor technology. contact heidelberg instruments mikrotechnik gmbh
Heidelberg instruments mikrotechnik gmbh是一家誠信的、高效能的生產商和服務商，該公司提供新型的、專門的產品，例如顯微鏡檢查技術、顯微鏡標本製作技術，激光平版印刷、激光光刻技術，平版印刷、蝕刻技術、光刻技術，半導體技術。Nuclear particle track - etched anti - counterfeit marking is a new weapon against fake products. the mark is manufactured by intricate high technology in state - controlled sensitive nuclear facilities which ensures that the mark can not be copied. the pattern of the mark is characterized by its permeability, and can be distinguished from fakes by using a transparent liquid ( e. g. water ), colored pen or chemical reagent. the technique has passed the official health safety examination and poses no danger of nuclear irradiation
用核粒子照射塑料薄膜形成徑跡，再經化學試劑蝕刻和成像技術，得到由微米級微孔組成的圖案.這種圖案具有物質透過特性.用這種方法生產的核徑跡防偽標志，具備核尖端技術不易擴散，製作設備不易得到，產品用其他方法難以偽造，防偽識別簡單、快速、可靠等特點.此種標志已經通過放射性安全檢測，可以用於各種商品（包括食品）的包裝By studying and using conventional 1c process in combination with electron beam lithography ( ebl ), reactive ion etching ( rie ) and lift - off process, several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires, si quantum dots, double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes
研究利用常規的硅集成電路工藝技術結合電子束光刻，反應離子刻蝕和剝離等技術制備半導體和金屬納米結構，很好地解決了普通光刻與電子束光刻的匹配問題，提高了加工效率，經過多次的工藝實驗，摸索出一套制備納米結構的工藝方法，首次用電子束光刻，反應離子刻蝕和剝離等技術制備出了多種納米結構（硅量子線、量子點，雙量子點和三叉指狀的金屬柵結構） 。The theory of ion - beam etching and ion sources are reviewed. the classification of ion - beam etching are introduced. according to the mechanism that ion sputtering leads to faceting, trenching, reflection and redeposition, some relative solutions are put forward
綜合敘述了離子束刻蝕技術和離子源的工作原理，簡單介紹了離子束刻蝕的分類，闡述了離子束刻蝕的物理濺射效應導致的刻面，開槽，再沉積等現象的產生機理及解決辦法，分析了kaufman離子源進行ribe的可行性及出現的問題。Basically, etching technology and sand blasting
蝕刻技術的加工效果取決于Problems can be solved easily when they apply our etching technology
蝕刻技術即可迎刁而解New etching technology simplifies the existing aluminum surfacing processes into
鋁紋理蝕刻技術將On the trend of thinner and more shape - complicated aluminum sheet, etching technology can
在鋁片越來越簿形狀多變的趨勢下，蝕刻技術將可Cost and defectiveness is unavoidable increased due to parts handling through physical process to chemical process
蝕刻技術屬前處理的工序，但其優勢是與Aluminum can be surfaced with multi - granular, high class and soft result that can satisfy consumers high request
在現今消費者對產品外觀要求越來越高的市場，蝕刻技術能以低的成本It has broad application prospect in the following fields such as microelectronics, photoelectronic devices, large screen flat panel display, field emitter array, acoustic surface wave device, photon crystal, light waveguide array, holographic honeycomb lens and micro - optical element array, micro - structure manufacture, fabrication of large area grating and grid of high resolution, photoresist performance testing, profile measurement and metrology, etc. the paper only involves the primary research of interferometric lithography
在微電子、光電子器件、大屏幕平板顯示器、場發射器陣列、表面聲波器件、光子晶體、光波導陣列、全息透鏡和微光學元件陣列、微結構製造，高分辨、大面積光柵和網格製造，在抗蝕劑性能測試、面形測量和計量等領域，干涉光刻技術都具有廣闊的應用前景。分享友人