衍射勢 的英文怎麼說

中文拼音 [yǎnshèshì]
衍射勢 英文
diffraction potential
  • : [書面語]Ⅰ動詞(開展; 發揮) spread out; develop; amplifyⅡ形容詞(多餘) redundant; superfluousⅢ名...
  • : Ⅰ動詞1 (用推力或彈力送出) shoot; fire 2 (液體受到壓力迅速擠出) discharge in a jet 3 (放出) ...
  • : 名詞1 (勢力) power; force; influence 2 (一切事物力量表現出來的趨向) momentum; tendency 3 (自...
  1. Our study shows that the optical potential of the diffracted light of the semi - gaussian beam is far higher than that of the evanescent - light wave, and its maximum normal velocity of the incident atoms can be far grater than that of the evanescent - light wave under the same parameters, so the blue - detuned semi - gaussian beam, as a novel atomic mirror, can be used to efficiently reflect atoms with a normal velocity of greater than 1 m / s

    研究表明,半束蘭失諧高斯光束光場的光學遠大於消逝波光場的光學,在同樣的參數條件下,入原子的最大速度也比消逝波光場的大,所以作為一種新穎的原子反鏡,半束蘭失諧高斯光束可以被用來有效的法向速度大於1m s的入原子。
  2. The corrosion behavior of nanocrystalline ( nc ) copper bulks with various grain sizes prepared from igc ( inert gas condemsation ) and vacuum annealing in comparison with conventional microcrystalline ( mc ) copper ( as - rolled and electrolytic ) in acid copper sulphate solution and neutral solution containing chlorides under free corrosion conditions and anodic polarizations has been studied using potentiodynamic polarization, potentiometric analysis, cyclic voltammetry and electrochemical impedance spectroscopy. x - ray diffraction was used to estimate the grain size of the annealed nc copper. field emission gun scanning electron microscopy and x - ray energy - dispersive spectroscopy was used to characterize the surface morphology and analyze the surface composition after the polarization and potentiometric test of both nc and mc copper

    本文研究了用igc (惰性氣體蒸發凝聚原位溫壓法)制備並真空退火到不同晶粒尺寸的納米晶銅和微米晶銅(冷軋紫銅、電解銅)在酸性硫酸銅溶液和中性含氯溶液中,在自腐蝕狀態和陽極極化狀態下的腐蝕性能。使用了動電極化、電位測定、循環伏安法( cv )和電化學阻抗譜( eis )等方法。 x -( xrd )的方法用來估算納米晶銅晶粒尺寸。
  3. Based on light interference, diffraction and optical holography theory, the paper comprehensively describes the basic principle, main types, development trend as well as the objective and significance for carrying out the research of laser maskless interferometric lithography and holographic lithography

    本論文基於光的干涉和及光學全息照相理論,綜合評述了光學光刻的基本原理、主要類型、發展趨及開展激光無掩模干涉光刻和全息光刻研究的目的和意義。
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