表面蝕刻 的英文怎麼說

中文拼音 [biǎomiànshí]
表面蝕刻 英文
etching
  • : Ⅰ名詞1 (外面;外表) outside; surface; external 2 (中表親戚) the relationship between the child...
  • : Ⅰ名詞1 (頭的前部; 臉) face 2 (物體的表面) surface; top 3 (外露的一層或正面) outside; the ri...
  • : Ⅰ動詞1. (損失; 虧耗) lose 2. (腐蝕) erode; corrode Ⅱ名詞(天體現象) eclipse
  • 表面 : surface; superficies; boundary; face; rind; sheet; skin; outside; appearance
  • 蝕刻 : [電學] [冶金學] etch; etching
  1. Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching ( ecr - rie ) equipment to improve its property of weave

    摘要採用微波電子迴旋共振等離子體反應離子( ecr - rie )裝置對氂牛毛纖維進行改性,從而改善氂牛毛的可紡性。
  2. Standard test method for scaling resistance of concrete surfaces exposed to deicing chemicals

    暴露于防凍化學藥品的混凝土性的標準試驗方法
  3. Determining effective adhesion of photoresist to hard - surface photomask blanks and semiconductor wafers during etching

    測定在期間光致抗劑同硬光掩膜坯及半導體片的有效粘附性
  4. This in turn causes a more profound modification of the etched surface, e. g., due to roughening or amorphization

    這將導致對于的嚴重修正,譬如粗糙度和非晶化。
  5. Flowchart of " directly etching method of chemical forming veined and granular aluminum alloys surface

    鋁合金化學紋理直接的方法流程
  6. Provide a whole set technology solution of " directly etching method of chemically forming veined and granular

    化學紋理直接的方法"技術服務
  7. Provide unique solvent of " directly etching method of chemically forming veined and granular aluminum alloys surface " f

    提供"鋁合金化學紋理直接的方法"工作液
  8. In the section of fabricating technology, i first discuss the ion beam technology. through the analysis of the effects of each parameter on the surface smoothness, profile fidelity and linewidth resolution in the process of ion etching, the suitable angle of incident ion beam, ion energy, density of ion beam and time of etching are selected combining the actual status of the mask

    在製作工藝的研究方,首先研究了離子束技術,通過對離子束過程中各個參數對元件的光潔度、輪廓保真度和線寬分辨的影響分析,結合掩膜的實際情況選擇出了合適的離子束入射角、離子能量、束流密度和時間等參數。
  9. Directly etching method of chemically forming veined and granular aluminum alloys surface " which is the latest invention patent application number : 00117311. 1. the innovative and simple process is absolutely

    現在所提供的"鋁合金化學紋理直接的方法"發明專利申請: 00117311 . 1是最新發明專利技術,創新而簡易的工序在"鋁件處理"量產時對比于傳統的機械噴沙絕對是
  10. The company has cad design centre, precision etching and developing production line, chemical cleaning production line, scrubbing production line, high - power exposing machine, cnc drilling machine, suctioning silk screen machine, speedy press, vacuum multilayer press, chemistry sink copper and metal surface treating production line, punches, etc. import or domestic advanced equipment

    公司擁有cad設計中心,精密、顯影生產線,化學清洗生產線,磨板生產線,大功率曝光機,數控鉆床,吸氣絲印機,快壓機,真空層壓機,化學沉銅及金屬處理生產線,沖床等進口或國產先進設備。
  11. By increasing the h2 dilution ratio, it is found that atomic hydrogen can selectively etch amorphous phase and stabilize crystalline phase. from the study on the distance from substrate to catalyzer, choosing a proper distance can ensure the gas fully decomposed, while a relatively low substrate temperature can cause the nanocrystalline particles to lose mobility and keep their sizes. the pre - carbonization process can enhance the nucleation density and make the growth of high quality nanocrystalline p - sic films much easier

    實驗結果明:隨著工作氣壓的減小,薄膜的晶粒尺寸有所減小;通過提高氫氣稀釋度,利用原子氫在成膜過程中起的作用,可以穩定結晶相併去除雜相;選擇適當的熱絲距離能保證反應氣體充分分解,又使襯底具有較高的過冷度,是形成納米薄膜的重要條件;採用分步碳化法可以提高形核密度,有利於獲得高質量的納米- sic薄膜;襯底施加負偏壓可以明顯提高襯底的基團的活性,因負偏壓產生的離子轟擊還能造成高的缺陷密度,形成更多的形核位置。
  12. In the third section, i. e. chapter five, the normal raman spectra of nil2, cul2, pdl2 powder are studied under the excitation of laser with the wavelength of 632. 8nm and aqueous silver colloid is prepared by pulsed laser ablation, from which the surface enhanced raman spectra of the three compounds are obtained. after preliminary assignment, the identical and different features of vibration of the compounds due to the different central metal atoms are analyzed

    第三部分,即論文的第五章,我們以632 . 8nln為激發波長研究了nilz 、 culz和pdl :三種新型金屬有機化合物粉末的正常拉曼光譜,並且以脈沖激光法制備了水銀膠,以其為襯底研究了三種化合物溶液在其上的增強拉曼光譜,通過對其拉曼光譜進行了初步指認,了解由於中心原子的不同,三種金屬有機化合物分子振動的相同和區別。
  13. Analyzing the treated yak hairs with sem, xps and et al, it showed under the same conditions, the effect of etching is enhanced with the increasing of power of wave, and the hydrophilicity and dyeing rate enhanced obviously

    通過sem 、 xps及吸附性能等的分析,結果明,在相同參數的等離子體條件下,隨著產生等離子體的微波功率的增大,對氂牛毛纖維效果增強;經過等離子體處理過的氂牛毛纖維的親水性,上染率等都有明顯的提高,說明該方法是一條切實可行的路線。
  14. This paper discusses the surface etching of polyester thread through application of plasma and alkali deweighting to enhance the size adhesion to polyester thread and improve the abrasion - resistance of the sized polyester thread

    摘要探索了應用堿減量、低溫等離子體處理方法對滌綸股線進行處理,以改善上漿前滌綸,增強漿液對滌綸股線的黏附性,提高上漿后滌綸股線的耐磨性的研究。
  15. The studies expressed that the tensile - strength declined with the growth of dose rate after the radiation treatment, and at the same time, the gel content had extreme value with the change of the dose rate. the surface of uhmwpe fibers showed some irregular micro - pits and dents after radiation treatment, narnely rough degree increasing. their number and deepness increased with increase of dose. and this phenomenon is the most obvious when the dose rate was 8. 5kgy / s and the dose was 400kgy. at the same time some containing oxygen groups, including hydroxyl group, carbonyl group and carboxyl group, were introduced into the fiber surface which was exposed to the air

    研究明, uhmwpe纖維經電子束輻照處理后,纖維的拉伸斷裂強度隨劑量率的增加呈下降趨勢,凝膠含量隨著劑量率的變化存在極值。纖維出現了不規則的微裂紋和凹痕,隨著劑量的增大,電子束對纖維程度增加,在本研究中以劑量為400kgy劑量率為8 . 5kgy s時效應最為明顯。同時,在空氣中進行輻照時,纖維被引入了一些含氧基團,包括羥基、羰基和羧基。
  16. The mechanism of the surface change has beenstudied by the xps, sem, contract anglemeasurements. we discuss the roles of the tree main fators playing in the fiber - resin adhesion, and their relation to plasma parameters. the three main factors ars the key mechanical effects, the chemical bonding effcts and nonpolar dispersion force

    粘接性能改善的原因是:由引入的多種含氧基團引起的化學鍵力和界非極性分子色散力,由坑引起的界機械鉸鏈力。它們對界的粘接強度的貢獻隨參數而改變。
  17. Fast rough etching can increase surface area of aluminum alloys parts ; as a result, there is an

    快速粗化既無應力影,而且令鋁件積大增,能
  18. In the plasma - etching mode the passivation layer that is formed on the surface is likely to be thicker than in the case of rie

    在等離子模式下,形成了比使用rie情況下更厚的鈍化層。
  19. Standard methods of analysis of sulfochromate etch solution used in surface preparation of aluminum

    準備用硫代鉻酸鹽溶液分析的標準試驗方法
  20. Dec direct etching coatings

    表面蝕刻塗層
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