集成電光學 的英文怎麼說

中文拼音 [jíchéngdiànguāngxué]
集成電光學 英文
integrated electrooptics
  • 集 : gatherassemblecollect
  • 成 : Ⅰ動詞1 （完成; 成功） accomplish; succeed 2 （成為; 變為） become; turn into 3 （成全） help comp...
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 光 : Ⅰ名詞1 （照耀在物體上、使人能看見物體的一種物質） light; ray 2 （景物） scenery 3 （光彩; 榮譽） ...
  • 學 : Ⅰ動詞1 （學習） study; learn 2 （模仿） imitate; mimic Ⅱ名詞1 （學問） learning; knowledge 2 （學...
  • 集成 : integration集成晶體管 integrated transistor; 集成元件 integrated component
  1. Lc apparatus almost meet all the needs of space optical communication such as weight, size, power consume, life, cost, driving voltage, intergration of optics and electricity, programe, optically take ? over aperture, beam scanning, deflexional range and so on. switches, deflexional facilities and scanning equipments which made with lc have been used in the system of labor in space communication. the only bug of lc apparatus is that their answer speed only get microsecond rate or submicrosecond rate. but it is practical for them to be used in special beam capture, scan, deflexion controling which don ’ t concerned with code rate and code type

    液晶器件幾乎滿足空間光通信的所有大的指標要求如重量、尺寸、功耗、壽命、成本、驅動電壓、光電集成、可編程性、光學接收孔徑、光束掃描和偏轉范圍等等。液晶光開關、光偏轉器、光掃描器已經開始應用於光纖通信的實驗系統中。液晶類器件應用於光通信的唯一重大缺陷，是其響應速度目前只能達到微秒級或亞微秒級，不過，在不涉及到碼型碼率的空間光束捕獲、掃描、偏轉、控制方面，液晶器件完全可能進入實用化。
  2. The important trend of spectrometer is microminiaturization 、 integration and intelligence. the development of micro optics electronics mechanics system ( moems ) creates condition for microminiaturization and integration of spectrometer, the development of computer 、 artificial intelligence 、 chemometrics offers opportunity for intelligence of spectrometer

    以微機械、微電子和微光學為基礎的微光機電系統為光譜儀的微型化、集成化創造了條件，而計算機、人工智慧和化學計量學的發展則為光譜儀的智能化提供了契機。
  3. As the ic manufacturing process develops from sub - micron to very deep submicron ( vdsm ) technologies, with current lithography tools ( 248nm and 193nm ), foundries can not manufacture products that designs want because of so - called optical proximity effect ( ope )

    當集成電路生產工藝發展到納米級時，利用現有的曝光設備（ 248nm和193nm ） ，由於所謂的光學鄰近效應，集成電路製造廠商已經無法製造出滿足電路功能要求的產品。
  4. Among various fabrication techniques of thin film, the sol - gel process has gained much interest for the preparation of pzt thin film, due to ihe advantages of good homogeneity, easy control of composition, low in - ill i reaving temperature, easy formation of large area thin films pb ( zrxti : - k ) 0 :, ( pzt ) films were prepared on the ito coated glass plates and low resistor silicon wafer in sol - gel dip - coating process associated wi di heat treatment : at different temperatures and characterized by x - ray diffraction ( xrd ) and transmission electron microscopy ( tem ). lt is shown that the pzt ferroelectric thin films with ( 110 ) preferred orientation and well - crystallized perovskite structure can be obtained after annealing at 680 ? for 30 minutes on ito substrate and at 800 " c for lornin on silicon substrate

    Pzt的制備方法有很多，其中溶膠?凝膠（ sol - gel ）方法可以和集成電路（ ic ）光刻工藝相互兼容，處理溫度低，有大面積塗敷性能，能精確地控制組分，無需復雜的真空設備，成本低廉，所以對于集成鐵電薄膜電容的應用這種方法有很廣闊的前景。本文利用sol - gel技術在摻錫的in _ 2o _ 3透明導電薄膜（ ito ）襯底和低阻硅襯底上成功地制備了pzt鐵電薄膜。運用了x射線衍射， sawyer - tower電路和lcr電橋分別對薄膜的晶化溫度，結構和電學性能進行了測試。
  5. Chemical - mechanical - polishing ( cmp ) has been rapidly developing and finding extensive applications in the integrated circuit ( ic ) manufacturing industry for processing hard disk of computer and silicon wafer with super - smooth and flawless surface

    集成電路（ ic ）製造工業中，化學機械拋光（ chemicalmechanicalpolishing ， cmp ）廣泛應用於計算機硬盤片、硅晶片超光滑無損傷表面的加工。
  6. Porous silicon ( ps ) is a new type silicon - based material developed in recent years, which has different properties compared with the crystalline materials. porous silicon can luminescence efficiently across the whole range from the near infrared, through the visible region, to the near uv region. this characteristic makes it possible to fabricate light - emitting devices and solve the key problem of the optoelectronic integrated circuit ( qeic ), opening up the bright future for the vlic

    多孔硅（ ps ）是近年來發展起來的一種新型硅基材料，具有與單晶硅材料大不相同的特性，例如，多孔硅可在近紅外和可見，甚至近紫外區輻射強烈的熒光，使得它可用來製造發光器件，並可望在解決光電子集成電子學的關鍵問題，為製造帶有光源的大規模集成電路等方面開辟新的途徑。
  7. The primary aim of the single chip microcomputer circuit of this project is data collecting, it applied the invention monopoly of professor zhang guanghui and professor peng donglin of chongqing university, make use of the high frequency inserted pulse, and join together the software to constitute subsidiary calibration distributed on equal time, complete the task of on - line subdivision in the dynamic measure process, finally up pass the data to pc, pc handle it and get examination result

    下位機是硬體集成電路，利用重慶大學張光輝教授、彭東林教授的發明專利「計算機對脈沖信號的細分與辨向新方法」 ，附加頻率極高的外部插入脈沖，結合軟體構成按時間均勻分度的輔助標尺，實現動態測量過程中采樣點的實時細分，最終完成數據採集任務；上位機主要是軟體部分，利用pc機接收下位機的採集數據並進行分析處理，得出檢測結果。
  8. In 6. 635, topics covered include : special relativity, electrodynamics of moving media, waves in dispersive media, microstrip integrated circuits, quantum optics, remote sensing, radiative transfer theory, scattering by rough surfaces, effective permittivities, random media, green ' s functions for planarly layered media, integral equations in electromagnetics, method of moments, time domain method of moments, em waves in periodic structures : photonic crystals and negative refraction

    本課程所覆蓋的論題包括：狹義相對論、運動媒質的電動力學、色散媒質中的波、微帶集成電路、量子光學、遙感、輻射傳輸理論、粗糙表面上的散射、有效介電系數、隨機媒質、平面層狀媒質的格林函數、電磁學中的積分方程、矩量法、時域矩量法、周期結構中的電磁波：光子晶體和負折射率。
  9. Before more advanced lithography tool is produced, in order to use current tools to manufacture vdsm ic, reticle correction methods such as perturbing the shape ( via optical proximity correction ( opc ) ) or the phase ( via phase - shifting masks ( psm ) ) of transmitting aperture in the reticle are proposed by the industry

    在波長更小的光刻系統出現前，為了能利用現有設備解決集成電路的可製造性問題，工業界提出了對掩模作預失真（光學鄰近校正）和在掩模上加相位轉移模（移相掩模）等的掩模校正方法。
  10. However, in current design flow, designers do not consider whether designs are friendly to opc before they are sent to foundries. in fact, a lot of features in such designs can not be corrected enough because of many factors such as the constraints of environments. so even though such designs are corrected, many lithographic errors still exist

    然而，由於在當前的集成電路設計流中，在設計出的版圖送到製造廠商前，電路的設計者並沒有考慮版圖對光學鄰近校正和交替移相掩模的友好性問題，這使得版圖中的一些圖形由於周圍條件的限制，如無法充分進行光學鄰近校正，無法進行交替移相掩模的處理等，從而使得版圖設計即使進行了校正處理，還存在大量光刻故障的可能性。
  11. Silicon - on - insulator ( soi ), boasting good optical and electronic properties, is the common material of integrated circuits ( ics ), micro - optical - electronic - mechanical - systems ( moems ) and planar - lightwave - circuits ( plcs ), which makes the monolithic integrations of optical, electronic and mechanical components possible. the mature technologies and superior equipments out of ics can be borrowed to investigate soi plcs. some electro - optical effects of kerr effect, franz - kedysh effect and plasma dispersion effect in silicon can be used in optical modulator and electronic - optical switch

    絕緣層上的硅（ soi ）材料具有良好的光學和電學特性，成熟的集成電路（ ic ）製作工藝和設備可以應用或借鑒于soi平面波導器件的製作中；硅的克爾（ kerr ）效應、弗朗茲-凱爾迪什（ franz - kedysh ）效應和等離子色散（ plasmadispersion ）效應等電光效應可以應用於電光調制器和電光開關的製作中。
  12. Extreme ultraviolet lithography is being developed as one of the most important candidates to fabricate a sub - o. lum - pattern. in recent years, several key technologies have been developed rapidly such as laser producing plasma source, extreme ultraviolet multilayer, optical fabrication and metrology, projection - camara alignment, low - defect mask and control technology of stage

    極紫外投影光刻（ extremeultravioletlithography簡稱euvl ）最有可能成為下一世紀生產線寬小於0 . 1 m集成電路的技術，近年來在激光等離子體光源、極紫外多層膜、光學加工和檢測、光學精密裝調、低缺陷掩模、光刻膠技術以及高穩定工作臺系統控制等關鍵技術方面得到了飛速發展。
  13. Optical proximity correction ( opc ) is emerging as an important tool in design and manufacturing of next generation integrated circuits

    光學鄰近效應校正（ opc ）是下一代集成電路設計和生產的重要工具。
  14. The advent of vlsi technology and fiber optics material science has enabled us to design massively parallel processing computer systems and fast and complicated communications networks

    超大規模集成電路技術和光纖材料科學的發展使我們有能力設計大型并行處理計算機系統和快速、復雜的通信網路。
  15. Coplanar waveguides ( cpw ' s ) offer several advantages over conventional microstrips, these include the simplification of the circuit fabrication process, ease of parallel and series insertion of both active and passive components ( without the need for via holes ), and high circuit density. therefore cpw ' s are widely used in microwave and millimeter - wave integrated circuits, optical and high temperature superconductor microwave devices

    與常規的微帶傳輸線相比，共面波導具有容易製作，容易實現無源、有源器件在微波電路中的串聯和並聯（不需要在基片上穿孔） ，容易提高電路密度等優點，因此共面波導被廣泛應用於微波、毫米波、光學和高溫超導等集成電路中。
  16. Jpeg2000 based on wavelet transform is a new image compress standard of many excellent characters. iamge compress algorithmic can run more efficiently on dsp. the success of techinique research, including entire digital camera product and the key technique, and the industrialization of digital camera industry can give our own knowledge property right in digital camera technique, and then enhance the function of digital camera, upgrade its ability to compete

    國內數碼相機相關技術的研發起步較晚，其主要原因是數碼相機涉及到眾多尖端的傳感器技術、微電子技術、精密光學技術、微機械控制技術、數字信號處理器技術和電腦多媒體技術，而且跟這些技術相關聯的光學、集成電路、微機械控制的加工工藝更是國內的薄弱環節，從而制約了國內數碼相機產業的形成和發展。
  17. In this dissertation, a boa - type waveguide optic switch with double - heterostructure gaas / gaalas has been researched. gaas - based integrated optical devices have good temperature, good anti - radiation and optical - transmission characteristics, and also have wide transparent range of wavelength. they can also be integrated on a chip with optical active devices and electronic devices, such as semiconductor laser, optical modulation, optical amplifier, pin, and so on

    基於gaas材料的集成光學器件不僅具有良好的光傳輸特性、溫度特性、抗輻射能力和其較寬的透明波長范圍，還有望進一步實現晶元與光源、光調制器、光探測器和半導體光放大器等其它光電器件以及集成電路的單片集成；採用gaas gaalas雙異質結材料製作的光開關可以得到較低的開關電壓，而且採用gaas gaalas異質結材料的光傳輸損耗很小。
  18. The cause of the sale ( microelectronics, optical, semiconductor, integrated circuits, precision instruments, aerospace technology, medicine, food and other high - tech industries ) purification equipment, air - conditioning accessories, anti - electrostatic agency ; not room systems engineering design, installation debugging specialized business model for the integration

    本事業部銷售（微電子、光學、半導體、集成電路、精密儀器、航天科技、醫藥、食品等高科技行業）凈化設備、空調配件，防靜電產品代理；無塵室系統工程設計，安裝調試為一體的專業化經營模式。
  19. Extreme ultraviolet lithography ( euvl ) represents one of the promising technologies for supporting integrated circuit ( 1c ) industry ' s lithography needs during the first decade of the 21st century. this technology builds on conventional optical lithography experience and infrastructure, uses 11 - to 14 - nm photon illumination, and is expected to support multiple technology generation from 65 nm to 35 nm

    極紫外投影光刻（ euvl ， extremeultravioletlithography ）技術作為下一代光刻技術中最佳候選技術，建立於可見/紫外光學光刻的諸多關鍵單元技術基礎之上，工作波長為11 14nm ，適用於製造特徵尺寸為65 35nm的數代超大規模集成電路，預計在2006年將成為主流光刻技術。
  20. Coplanar waveguide （ cpw ） which is originated from microstrip is an important planar transmission of microwave. with the development of the microwave and millimeter - wave integrated circuit, especially monolithic microwave integrated circuit ( mmic ) and optical integrated circuit, there is a great interest in cpw in recent years

    共面波導（ cpw ）結構在微波集成電路以及光學集成電路中有著重要的應用，尤其是近年來隨著毫米波與亞毫米波技術的發展，共面波導受到了越來越多的重視。
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