驅體反射 的英文怎麼說
中文拼音 [qūtǐfǎnshè]
驅體反射
英文
somatic reflex-
The last part of the thsis presents a novel fast response digital variable optical attenuator. this device is driven by two electromagnetic driving units rather not stepper motors. a wide attenuation ( 40db ) was fully digitized and can be set by a certain number of driving pulses
論文最後針對現有數字可調光衰減器均由步進電機驅動，體積龐大，造價高昂且速度緩慢的缺點，利用微反射單元設計了一種高速數字式可調光衰減器。Abstract : based on the electronic focus technology development of state - of - the - art, the paper suggested a complete apparatus s cheme ofauto - focus based on sspd ( self - scanned photodiode array ) and 8098 singl e chipprocessor, giving out a focus criterion algorithm based on image high freq uencystatistics. the function of auto - focus of both reflected and transparent o pticalmicroscope was realized. meanwhile some corresponding problems such as sta bility of lightsource, step motor driving etc. were also discussed, which greatly improved the accuracy andreliability of the system
文摘:在介紹與分析了國內外電子調焦系統的技術發展與現狀的基礎上，提出了一種基於sspd （自掃描光電二極體列陣）與8098單片微處理器自動調焦的整體技術方案，給出了基於圖像高頻成分統計的聚焦判識演算法，在此基礎上實現了反射式與透射式光學顯微鏡的自動調焦，同時對系統的可靠性有關的其它相關問題如光源穩定性、步進電機驅動等問題也進行了討論。The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate
採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。Max michl gmbh nl is a society, which offers service units, hydraulic components and milled pieces, in addition is also concered with measuring devices, hose lines as well as with regulator
不僅在以電桿吊裝器、調節閥和磁閥門以及電磁閥、執行元件和動作器、放射體，兩極反應物，執行元件領域內著稱，而且以其它產品馳名，如調節配件、調節閥和維修機、伺服驅動以及維修單位。Tlv euro engineering gmbh is well - known not only in waibstadt with order, product and set - up as well as with computer - controlled, electronic computers and armatures, fittings, but also with further offers, like measuring instruments, rule and / or probe, service units and rule armature
不僅在以電桿吊裝器、調節閥和磁閥門以及電磁閥、執行元件和動作器、放射體，兩極反應物，執行元件領域內著稱，而且以其它產品馳名，如調節配件、調節閥和維修機、伺服驅動以及維修單位。分享友人