electron beam evaporation 中文意思是什麼

electron beam evaporation 解釋
電子束蒸發
  • electron : n. 【物理學】電子。 the electron beam 電子束。 the electron theory 電子（學）說。
  • beam : n 1 梁，棟梁，桁條；（船的）橫梁。2 船幅；（動物、人的）體幅。3 （秤）桿，杠桿，（織機的）卷軸，...
  • evaporation : n. 1. 蒸發（作用），發散，升華沉澱作用。2. 脫水（法）。3. 蒸氣。4. （電子的）發射。5. 蒸發量。6. 消散。
  1. The diffusion welding behavior of single - crystalline cu to single - crystalline - aio with a nb film interlayer and the joint microstructure properties were studied by tem, sem / eds analyses and four - point bend testing. the nb film interlayer deposited by electron beam evaporation on the ceramic side prior to diffusion welding was found to be olycrytalline and fiber - textured after diffusion bonding, with the close - packed plane ( 110 ) being parallel to the ( 0001 ) basal plane of - aio

    擴散連接技術是一門邊緣科學，涉及材料、擴散、相變、界面反應、接頭應力應變等各種行為，工藝參數多，雖然已經進行了大量的試驗研究，但卻對各種材料的連接機理尚未有明確的認識，為此人們試圖藉助于計算技術，對接頭行為進行數值模擬，以便找到共同規律，對擴散連接過程及質量進行預測與實時控制。
  2. Study on the fabricating method the fe / al2o3 / fe mtj and co / al2o3 / feni mtj are prepared by ion - beam sputtering systems. the fexcu ( 1 - x ) granule films were evaporated directly using a high vacuum electron beam evaporation. some samples of granule films are annealed at 340c

    用高真空鍍膜機制備了fe _ xcu _ （ （ 1 - x ） ）系列顆粒膜，並對部分膜做了加熱退火處理，樣品被加熱到340並且保溫2小時。
  3. The main conclusions and original results are summarized as follows. the manganin ultra - high pressure sensors for gas gun were made by two - step thin film techniques, namely, manganin thin films were first deposited by magnetron sputtering on fused silica substrates, and then covered by a layer of sio2 thin films by electron beam evaporation. consequently, the manganin sensing elements were " cleanly " encapsulated in inorganic solid matrix and the high - pressure shunt effect was eliminated radically

    上述技術的主要優點在於可以採用高壓絕緣性能更好的無機物作為絕緣封裝材料，如本研究中所採用的sio2 ，而代替在箔式錳銅計中所使用的ptfe ；並可實現敏感元件「清潔」地無機固態封裝，即將整個敏感元件是包封在無機物中，而不與高壓力下絕緣性能相對較差的有機物，如粘接劑、樹脂等直接接觸，從而在根本上消除了高壓旁路效應。
  4. The ultra - thin er layers with the thicanesses in the range of 0. 5 ~ 3 monolayer ( ml ) are formed by electron beam evaporation on si ( 00l ) substrate at room temperature in an ultra - high vacuum system. after annealing at lower temperatures, ordered simcfores form on the surface. the trallsition of the surface reconsmiction pattem from ( 2 x l ) to ( 4 x 2 ) with the increase of er coverage up to l ml is observed by the reflective high energy electron diffraction ( rheed ) and low energy electron diffraction ( leed )

    本文是關于硅（ 001 ）襯底與電子束淀積的鉺、鉿原子反應形成的超薄膜的界面與表面性質的研究，以及在該襯底上出現的共振光電子發射現象，包括了以下四個方面的工作： 1鉺導致的硅（ 001 ）襯底上的（ 4 2 ）再構研究利用反射高能電子衍射和低能電子衍射，在室溫淀積了0
  5. 3. polycrystalline lif thin films were grown by thermal evaporation on amorphous substrates. properties of broad band photo - luminescence at room temperature of active channel ( f2 and fa + ) produced by electron beam irradiation were studied

    首次用熱蒸發法在玻璃襯底上制備了多晶lif薄膜平面波導，研究了由電子束照射產生的有源（ f _ 2和f _ 3 ~ +色心）溝道的室溫寬帶光致發光特性。
  6. In this dissertation, high quality ( 002 ) textured zno films were prepared on silicon substrate using electron beam evaporation method. in addition, zno nano - particle material embedded into mgo thin films was prepared by a co - evaporation ( thermal and electron beam evaporation, simultaneously ) method and a following post - annealing process in oxygen ambient

    本文介紹了採用電子束蒸發方法在si襯底表面上制備出了具有c軸擇優取向的高質量氧化鋅薄膜材料，另外，還採用共蒸發（通過電子束蒸發與熱蒸發同時進行）及後退火的簡單方法制備出包埋到介電物質mgo薄膜中的zno量子點材料。
  7. Tungsten oxide and nickel oxide films were prepared by electron beam evaporation method, and the effect of annealing techniques of the electrochromic properties of these films was discussed

    本論文利用電子束蒸發方法制備氧化鎢、氧化鎳薄膜的基礎上，研究了熱處理工藝對于薄膜電致變色性能的影響。
  8. The new sensitive materials deposited on laps with electron beam thermal evaporation meet the requirements for fabricating miniaturised sensor devices and can be employed in environmental control such as detection of heavy metal ions

    在最後，我們提出了基於硫屬玻璃薄膜laps的新結構和新的測量方法，並進而提出我們對laps在海水重金屬檢測應用中可能的發展方向。
  9. The application and features of vaccum strip coating processes such a thermal jet evaporation, magnetron sputtering, electron - beam evaporation and plasma enhanced eb evaporation process were reviewed

    摘要介紹了新一代連續帶鋼鍍膜技術真空鍍膜的工藝特點及應用現狀。
  10. The chemical composition, micro - structure and optical properties and its application of tio2 thin films deposited on k9 glass by using reactive electron - beam evaporation ( reb ) are studied through sem, tem, xps, xrd, spectroscopic ellipsometry ( se ) and uv - vis spectrophotometer in the dissertation, and the progresses of nucleation and growth of thin film are discussed from the point of view of dynamics and thermodynamics so that a structure model of tio _ ( 2 ) thin film is brought forward

    本文採用sem 、 tem 、 xps 、 xrd 、橢圓偏振儀（ se ） 、 uv - vis分光光度計等分析手段系統地研究了電子束反應蒸發方法在k9玻璃上制備tio _ 2薄膜的成分、結構和光學性能以及tio _ 2薄膜在光學多層膜中應用，並開發了膜系設計軟體。文中還從動力學和熱力學角度分析了tio _ 2超薄膜的形核生長過程，得出了tio _ 2薄膜的組織結構模型。
  11. In this paper, high quality transparent and conductive al - doped zno thin films on quartz substrates are prepared by electron beam evaporation technique

    本文採用電子束蒸發方法在石英襯底上制備出質量較好的al摻雜的zno薄膜材料。
  12. Abstract : in the paper, the operation technology of electron beam evaporation plating aluminium - chromium alloy coating is studied the optimum technology is obtained by discussing the influence of votage, current on auter appearance, adhesion inner stress. the ingredients of coation and evaporation materials are analyzed, the results show that the chromium contents of coating are very different from that of evaporation materials, in the end, the corrosion - resistance of the coating consisting of different chromium contents is investigated

    文摘:本文研究了電子束蒸發鍍鋁-鉻合金塗層的制備工藝，通過討論不同的電壓、束流對膜層外觀、結合力、內應力的影響，確定了合適的陳鍍工藝，對塗層和膜料的成分進行了分析，表明塗層中鉻含量與膜料中鉻含量有較大差異，最後探討了不同含鉻量的塗層的耐蝕性。
  13. The experimental results show that the quality of zno films prepared by electron beam evaporation can be greatly improved by means of two - step annealing of metallic zn films in oxygen ambient, and it is feasible to fabricate high quality mgxzn1 - xo alloy films with mgo buffer layers by using thermal evaporation technique following by two - step annealing process. this method gives a new path to prepare mgxzn1 - xo alloy films

    實驗結果表明利用電子束蒸發技術制備的zno薄膜材料，在經過氧氣氣氛下的二次退火處理后，能夠表現出較好的發光和結構特性；以mgo薄膜作為緩沖層制備出了高質量的mgzno合金薄膜材料，這為開展mgzno合金薄膜材料的研究開辟了新的途徑。
  14. The best annealing condition of the zno films grown by electron beam evaporation technique was achieved

    採用電子束蒸發的方法在si襯底上生長zno薄膜，通過退火實驗，得到了最佳的退火條件。
  15. 1. the manganin ultra - high pressure sensors for gas gun were made by two - step thin film techniques, namely, manganin thin films were first deposited by magnetron sputtering on a12o3 substrates, and then covered by a layer of a12o3 thin films by electron beam evaporation

    首次採用全薄膜化工藝製作氣炮用錳銅超高壓力傳感器，即首先在絕緣基板上沉積錳銅敏感薄膜，然後再在敏感膜的上面沉積絕緣封裝薄膜。
分享友人
分享到 Line

分享到臉書