electron plasma 中文意思是什麼
electron plasma
解釋
電子等離子體-
Nitridation of large silicon surfaces at low temperatures by electron cyclotron resonance plasma
等離子體對硅表面的低溫大面積氮化 -
To overcome the bottle - neck, electron cyclotron resonance - plasma enhanced metalorganic chemical vapor deposition was developed
為了解決這一問題，電子迴旋共振ecr等離子體增強有機金屬氣相沉積（ ecr - pemocvd ）應運而生。 -
Microwave electron cyclotron resonance ( mwecr ) cvd is a newly developed technique for plasma processing and materials fabrication, such as plasma etching and films deposition
本論文介紹了我們對ecr等離子體cvd系統的測試、 bn薄膜的制備和薄膜光學特性研究。 -
Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching ( ecr - rie ) equipment to improve its property of weave
摘要採用微波電子迴旋共振等離子體反應離子刻蝕（ ecr - rie ）裝置對氂牛毛纖維進行表面改性，從而改善氂牛毛的可紡性。 -
Plasma technique was introduced in the research of high power microwave ( hpm ) sources in recent decade. the performance of hpm sources is improved much by filling plasma which is promising in this field. filled - plasma travelling - wave tubes ( fptwt ) is a part of them. it is the main task of this paper to research and design fptwt ' s electron optics system and simulate it
近十年來，在高功率微波的研究熱潮中，引入了等離子體技術。引入等離子體能顯著改善高功率微波源各方面的工作性能，已經成為高功率微波源發展一個頗有前景的新方向，等離子體行波管即是其一個典型代表。 -
( 2 ) the emission spectra of laser ablation metal copper plasma were measured. the detailed mechanism of plume emission of cu plasma was qualitatively explained using a simple model based on excitation of atom and ion in plume arising from inelastic collision between the elemental species and electron with high kinetic energy. under the local thermal equilibrium model, the electronic temperature of copper plasma was deduced to be in the 104 scale by its emission lines
（ 2 ） cu等離子體光譜：在420 570nm波長范圍內觀測了激光燒蝕cu等離子體的光譜和各發射譜線在等離子體中的空間分佈；比較了激光能量對cu等離子體發射光譜、電子溫度的影響；用局部熱力學平衡（ lte ）近似，測得cu等離子體的電子溫度為104k數量級；在不同背景氣壓下，觀測了激光燒蝕cu等離子體光譜的空間分佈。 -
The ultra - relativistic electron acceleration by langmuir plasmons in laser plasma
激光等離子體中極端相對論性電子的朗繆爾湍動加速 -
In this paper, we focus on the following three topics : ( i ) density distribution of dusty plasma in the low - pressure collisionless positive column the radial density distributions of electron, ion and dust particle in the low - pressure collisionless positive column are investigated with a fluid theory and a self - consistent dust - charging model
本文著重以下三個方面的研究： （ ）低氣壓無碰撞輝光放電正柱區塵埃等離子體密度徑向分佈本文採用流體模型和自洽的塵埃充電模型，研究了低氣壓無碰撞輝光放電正柱區的電子密度、離子密度和塵埃粒子密度的徑向分佈。 -
Study on electron temperature of pulsed discharge plasma
大氣脈沖放電等離子體電子溫度的研究 -
Time - resolved diagnosing of the electron temperature of laser - produced aluminum plasma
激光等離子體電子溫度的時間分辨診斷 -
It was show in this thesis that the po activity existed histochemically in haemo - cyte and its peripheral zone. most po were electron - dense and homogenous. prophenoloxidase is found in both plasma and haemocytes. propenoloxidase is most abundant in large granule haemocytes, a small abount is present in some small granule haemocytes and hyaline cells, or absent
Po大部分均質且電子密度很高。在細胞外有異物處的po密度最大。其中大顆粒細胞周圍的po陽性產物最多，小顆粒細胞和透明細胞則很少或沒有。 -
We obtained holographic interferogram, from which we got the space distribution of plasma electron density by abel inversion
由全息干涉條紋圖樣求解等離子體電子密度空間分佈要用到abel變換。 -
Electron density is one of basic parameters of laser - produced plasma, so it has a important role in diagnosis of laser - produced plasma
電子密度是激光等離子體最重要的基本參數之一，因此在激光等離子體診斷中佔有重要位置。 -
Investigation of plasma drift velocity vs time in intense electron beam diode
強流脈沖電子束二極體等離子體漂移速度的研究 -
Realization of explosion electron emission boundary in a plasma simulation code
爆炸電子發射邊界的粒子模擬實現 -
This paper studies the application of inductively coupled plasma ( icp ) technology to the etching compound semiconductor insb - in film. by means of single probe and double probe, the ion density and electron temperature of chamber ( 30mm and 50mm in height respectively ) under varied process condition were diagnosed. the spatial distribution of the axial position of the two parameters and the varied curve that the two parameters varies with the power and air pressure are obtained
利用單探針和雙探針診斷30mm高反應室和50mm高反應室在各種工藝條件下的離子密度和電子溫度，得到這兩個參數在反應室軸向位置的空間分佈、隨功率和氣壓的變化曲線、頂蓋接地和反應室體積對它們的影響，結果表明離子密度為10 ~ 8 10 ~ （ 10 ） cm ~ （ - 3 ） ，電子溫度在4 10ev之間；當頂蓋接地時，該處的等離子體密度明顯大於不接地；在同樣條件下， 50mm高反應室內的離子密度明顯大於30mm高反應室。 -
For simplicity, let the plasma have only two species: ions and electron; extension to more species is trivial.
為簡單起見，假定等離子體只有兩種：離子和電子，推廣到更多種是不難的。 -
According to the fringe shift of the interferograms, electron density and implosion velocity can be obtained. in the early period of plasma imploding ， the averaged electron density is,
在箍縮早期平均電子密度為，運動速度為；聚焦附近，等離子體的平均電子密度約為，運動速度，最小箍縮半徑0 . 49mm ；崩潰階段，等離子體的崩潰速度為。 -
Immunohistochemistry method was used to observe the temporal and spatial expression of nmdar2, signal molecules, skeleton proteins and connexins in son neurons and glias ( astrocytes and microglias ). radioimmunoassay was used to detect vasopressin ( vp ) content in plasma before and after hyperosmotic stimulation. ultrastructure between activated son astrocytes and neurons was observed by double immune - electron - microscopic staining method
應用免疫組織化學方法光鏡下觀察高滲刺激后，大鼠視上核膠質細胞（星形膠質細胞和小膠質細胞）受體（ nmdar2 ） 、信號分子、骨架蛋白及縫隙連接蛋白的表達的時空變化；應用放免測定檢測高滲刺激前後血漿中vp含量。 -
In this thesis, we have mainly studied the characteristics of chf3, c6h6 and cf4 electron cyclotron resonance ( ecr ) plasma using langmuir probe and optical emission spectroscopy ( oes ). the relative concentration of different radicals in chf3 plasma and the effect of chf3 / c6h6 ratio on bond configuration of a - c : f films were discussed. it was showed that h, f, c2 were the main radicals among radicals of h, f, c2, ch and f2 in chf3 ecr plasma
重點研究了chf _ 3 、 cf _ 4和chf _ 3 c _ 6h _ 6放電等離子體中基團的分佈；分析了不同基團的相對密度隨宏觀放電條件（微波輸入功率、放電氣壓、源氣體流量比）的變化規律；探討了等離子體中各種基團的生成途徑；在不同源氣體流量比的條件下沉積了a - c ： f薄膜並通過傅立葉變化紅外吸收光譜（ ftir ）的測量得到了薄膜中鍵結構的信息；分析了a - c ： f薄膜的沉積速率及其鍵結構與等離子體空間基團分佈狀態之間的關聯。
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