excimer laser etching 中文意思是什麼

excimer laser etching 解釋
準分子激光腐蝕
  • excimer : 激基締合物
  • laser : n 鐳射激光，受激發射光，激光；萊塞；激光器，光激射器 （ ＝ light amplification by stimulated emis...
  • etching : n. 1. 蝕刻法；蝕刻（銅）版畫；蝕鏤術。2. 蝕刻畫，蝕刻版，蝕刻版印刷品。
  1. Micromachining of monocrystal silicon by excimer laser direct etching

    準分子激光直接刻蝕單晶硅研究
  2. Due to great advantage of the excimer laser in photoelectron material, photoelectron technology research, so in this thesis, a xecl excimer laser is designed in order to solve some problem in semiconductor film, cmr film, quartz film and other kind of film application, optical etching field, interaction between laser and material, material plasma study. the parameters of the excimer laser is e also measured and analyzed

    因此本文以氣相沉積、外延生長、巨磁薄膜、金剛石及其它薄膜制備及后續的光刻，激光與物質的相互作用，等離子體研究為目的，研製獲得了激光脈寬18ns ，單脈沖能量150mj ，矩形光斑大小2cm 1cm ，束散角3mrad ，最高重復頻率5hz的xecl準分子激光器。
  3. Furthermore, the etching rate, roughness versus incident laser fluences and pulse number are investigated theoretically and experimentally in detail by 3d surface analyzer. then a new priciple of pmma etched by excimer laser is given : the process is the interaction result of photodecomposition,

    隨后應用總結出的優化加工參數在該材料上刻蝕出了寬104 m ，深56 m ，矩形度高達80 % ，底面光滑的20個循環的pcr微流控晶元。
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