fluorescence x-ray analysis 中文意思是什麼

fluorescence x-ray analysis 解釋
x射線熒光分析
  • fluorescence : n. 熒光（性）。
  • x : X2＝ （羅馬數字）10 XX ＝ 20 IX ＝ 9 XV ＝ 15 XL ＝ 40 LX ＝ 60 XC ＝ 90 DXL ＝ 540 MX ＝ 1010 ＝...
  • ray : n 雷〈姓氏，男子名， Raymond 的昵稱〉。n 1 光線，射線，熱線；〈詩〉光輝，閃爍，曙光，一線光明。2 ...
  • analysis : n. （pl. -ses ）1. 分解，分析；【數學】解析。2. 梗概，要略。3. 〈美國〉用精神分析法治療（＝ psychoanalysis）。
  1. Development of wavelength dispersive x - ray fluorescence analysis

    射線熒光分析的新發展
  2. Analysis of manganese and other elements in manganin by x ray fluorescence spectrology method

    射線熒光光譜法分析錳礦中的錳及其他元素
  3. Iron ores - x - ray fluorescence spectrometric analysis

    鐵礦石. x射線熒光光譜儀分析
  4. General rules for x - ray fluorescence spectrometric analysis

    X射線熒光光譜測定法總則
  5. Technologic rules for x - ray fluorescence analysis of cements

    水泥x射線熒光分析通則
  6. Study of x - ray fluorescence analysis of trace elements in paddy unpolished rice and polished rice

    熒光分析方法對大米加工過程中微量元素流失規律的研究
  7. This demonstrates the feasibility of using grazing emission x - ray fluorescence spectroscopy as a method of studying the thin layer ' s characteristics, such as composition and thickiness etc. with the intimately combining of theoretical, set - up and experimental research, the study on the analysis techniques of grazing emission x - ray fluorescence is developed, and the first set of grazing emission x - ray fluorescence setup is established. at the same time, the angular dependence of the fluorescence intensity with different thickness layer is measured. all the work in this thesis provides the basis for the further researches

    本論文採用理論、裝置和實驗研究密切結合的方式，開展了掠射x射線熒光分析技術研究工作，在國內建立了首臺掠出射x射線熒光光譜分析裝置，並對不同厚度單層和雙層薄膜樣品在掠出射條件下產生的熒光光強與掠射角的對應博士學位論文:掠射x射線熒光分析技術研究關系進行了實驗測定。
  8. Standard test method for preparation and elemental analysis of liquid hazardous waste by energy - dispersive x - ray fluorescence

    通過能量分散x -射線熒光性對液體有害廢物制備和元素分析的標準試驗方法
  9. As a nuclear instrument, multi - channel analyzer ( mca ) is mainly applied to nuclear logging, y - ray spectrum measurement and x - ray fluorescence measurement, which are based on nuclear spectrum analysis

    作為一種核儀器? ?多道分析儀，主要應用在基於能譜分析的核測井，射線譜測量和x射線熒光測量。
  10. X - ray has been widely used in industry and medicine since it was found in 1895, such as nondestructive detection of cavities in objects using x - ray " s property of penetration, trace element analysis using x - ray fluorescence, radiation therapy using x - ray " s ability to damage protein, and so on

    X射線源在生產和醫療上一直以來具有廣泛的應用。利用x射線的穿透性可進行無損探傷；利用x射線的熒光效應可對物質進行痕量分析；利用x射線使蛋白質變性可對腫瘤進行放療。
  11. Methods of testing refractory materials - chemical analysis by instrumental methods - analysis of alumino - silicate refractories by x - ray fluorescence

    耐火材料試驗方法.第9部分:化學分析儀法.第1節:硅酸鋁耐火材料x射線熒光分析法
  12. It is used in solar cells and semiconductor detectors for astrophysical research, for x - ray fluorescence ( xrf ) analysis, industrial gauging, nuclear proliferation treaty verifaction et. al, and also in laser window and infrared array technology as subtriate for hg1 - xcdxte

    同時它還可作為紅外探測器材料碲鎘汞（ hgcdte ）和外延襯底，以及激光窗口和太陽電池等。
  13. The new method of direct determination of micro amounts of elements in electrician silicon - steel chips is based on the high performance of pw 2400 x - ray fluorescence spectrometer system and its software. it can correct both the matrix effect and the influence of sample physical status. specimens of steel chips can be determined directly without any pretreatment. the method has high accuracy and precision, the operation is easy and the analysis is fast

    報道了x射線熒光光譜法直接測定電工硅鋼鋼屑樣品微量元素的新方法，校正了樣品中元素間的基體效應影響和校正了鋼屑樣品的不同顆粒結構，不同幾何形態及不同表面狀態的影響，使鋼屑樣品可不經處理直接測定，操作簡便。
  14. Trouble analysis and services of arl 9400 x - ray fluorescence spectrometer

    熒光光譜儀探測器高壓部分故障分析與維修
  15. In this work, according to the feature of soft x - ray fluorescence, a setup has been established for the measurement of soft x - ray fluorescence in laboratory, which is calibrated by 55fe. the setup is made of x - ray tube, fine tuning table, vacuum system, gas - flow proportional counter and multiple channel analysis

    本文工作中依據軟x射線熒光的特點，在實驗室建立了一套軟x射線熒光測量裝置，該裝置由x射線管、精密微調樣品臺、真空系統和流氣正比計數管探測系統以及多道分析儀組成，並採用~ （ 55 ） fe標準光源對系統進行實際標定。
  16. Surface chemical analysis - chemical methods for the collection of elements from the surface of silicon - wafer working reference materials and their determination by total - reflection x - ray fluorescence spectroscopy

    表面化學分析.從矽片工作標準物質表面採集元素的化學方法及其全反射x射線熒光光譜法的測定
  17. Standard test methods for chemical analysis of ceramic whiteware materials using wavelength dispersive x - ray fluorescence spectrometry

    使用波長色散x射線熒光光譜法進行白色陶瓷材料化學分析的標準試驗方法
  18. Analysis of aluminium ores - method for multi - element analysis by wavelength dispersive x - ray fluorescence

    鋁礦石分析.第3部分:採用波長色散式x射線熒光法對多元素分析的方法
  19. Radiation protection standards for x - ray diffraction and fluorescence analysis equipment

    射線衍射儀和熒光分析儀放射衛生防護標準
  20. The phase structure of different cu - fe thin films were studied by using grazing incidence x - ray analysis ( gixa ). the texture and residual stress of different cu - fe thin films were measured by scan of x - ray diffraction ( xrd ) and 2 scan with different. the thicknesses of different thin films were characterized by means of small angle x - ray scattering ( saxs ) technique. by using atomic force microscope ( afm ) measured surface roughness of thin films. the component of different thin film was characterized by energy disperse spectrum ( eds ) and x - ray fluorescence ( xrf ). the magnetic properties of cu - fe thin films were measured by means of vibrating sample magnetometer ( vsm ). in addition, the giant magnetoresistance ( gmr ) effects of different films were also measured. the original resistance of the film fabricated by a direction - current magnetron sputtering system is directly affected by bias voltage

    利用掠入射x射線分析（ gixa ）技術對不同cu - fe薄膜的相結構進行了研究;利用xrd掃描及不同角度的2掃描對薄膜進行了結晶織構及殘余應力分析;運用小角x射線散射（ saxs ）技術測量了薄膜的厚度;採用原子力顯微鏡（ afm ）觀察了薄膜的表面形貌;運用能量損失譜（ eds ）及x射線熒光光譜（ xrf ）對薄膜進行了成分標定;使用振動樣品磁強計測量了不同cu - fe過飽和固溶體薄膜的磁性能;最後利用自製的磁阻性能測試設備測量了真空磁場熱處理前後不同薄膜的巨磁阻值。
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