laser lithography 中文意思是什麼

laser lithography 解釋
激光蝕刻
  • laser : n 鐳射激光，受激發射光，激光；萊塞；激光器，光激射器 （ ＝ light amplification by stimulated emis...
  • lithography : n. 石印〈平版印刷〉術；平版印刷品。
  1. With the third harmonic 355nm nd : yag laser as the exposal source, the lithography of su - 8 photoresist is studied

    本文採用波長為355nm的三倍頻nd : yag激光作為曝光光源，對su - 8光刻膠進行光刻研究。
  2. The laser - liga technology provided by this research is the first technology to use ultraviolet laser as the exposal source for su - 8 photoresist lithography. it is a technology with lower cost and big potential to increase the aspect ratio as well as wider application

    本文首次提出採用紫外激光作為曝光光源的laser - liga技術，對su - 8膠進行曝光光刻不僅成本低、易推廣，而且具有大幅度提高光刻深寬比的潛力。
  3. Referencing the existing laser lithography tools and according the structure principle of maglev - bearing and maglev - vehicle, two structure patterns of precision stage based on maglev technology and driven non - contactly by linear motor are designed and researched. the two maglev precision stages will be of freedom information property and adapt to develop and manufacture laser lithography tools by ourselves

    在參考國內外光刻機現有定位平臺結構形式的基礎上，根據磁懸浮軸承和列車的結構原理，以磁懸浮技術為基礎、以直線電機無接觸驅動為動力，研究並設計了具有自主知識產權的兩種結構模式磁懸浮精密定位平臺，以適應我國自主研製開發新一代光刻機的需要。
  4. The theoretical research, computer simulation and experimental results analysis show that maskless laser interferometric lithography and holographic lithography have the characteristics of large field of view, high resolution, distortionless, relatively simple system structure, low costs and convenient realization way. they have a broad application prospect

    激光干涉光刻技術研究四川大學博士學位論文理論研究、計算模擬和實驗結果分析表明，無掩模激光干涉光刻和全息光刻具有大視場、高解析度、無畸變、系統相對簡單、成本較低，實現方便等特點，具有廣闊的應用前景。
  5. Heidelberg instruments mikrotechnik gmbh offers you pertinent information by telephone for the ranges micro technology, laser lithography and lithography in addition to semiconductor technology. contact heidelberg instruments mikrotechnik gmbh

    Heidelberg instruments mikrotechnik gmbh是一家誠信的、高效能的生產商和服務商，該公司提供新型的、專門的產品，例如顯微鏡檢查技術、顯微鏡標本製作技術，激光平版印刷、激光光刻技術，平版印刷、蝕刻技術、光刻技術，半導體技術。
  6. Extreme ultraviolet lithography is being developed as one of the most important candidates to fabricate a sub - o. lum - pattern. in recent years, several key technologies have been developed rapidly such as laser producing plasma source, extreme ultraviolet multilayer, optical fabrication and metrology, projection - camara alignment, low - defect mask and control technology of stage

    極紫外投影光刻（ extremeultravioletlithography簡稱euvl ）最有可能成為下一世紀生產線寬小於0 . 1 m集成電路的技術，近年來在激光等離子體光源、極紫外多層膜、光學加工和檢測、光學精密裝調、低缺陷掩模、光刻膠技術以及高穩定工作臺系統控制等關鍵技術方面得到了飛速發展。
  7. This is a single step process and comparatively cheaper and faster than lithography. the laser direct writing system with polar coordinate and cartesian coordinate is described in this paper

    激光直寫系統要求的器件的精度非常高，我們目前的工作目標是首先實現激光直寫系統的基本功能，在此基礎上，再進行高性能系統的研製。
  8. Based on light interference, diffraction and optical holography theory, the paper comprehensively describes the basic principle, main types, development trend as well as the objective and significance for carrying out the research of laser maskless interferometric lithography and holographic lithography

    本論文基於光的干涉和衍射及光學全息照相理論，綜合評述了光學光刻的基本原理、主要類型、發展趨勢及開展激光無掩模干涉光刻和全息光刻研究的目的和意義。
  9. Interferometirc lithographic technology incorporates laser, interference optics, diffraction optics and optical lithography and it is a frontier research subject in microfabrication technology and microelectronic field sponserd by national natural science foundation of china. the research for this technology in theory, simulation and experiments has important scientific meanings and broad application prospect for promoting lithographic limit, developing nanometer electronic and photoelectron devices, novel large screen panel display and novel lithographic equipment of our country

    干涉光刻技術集激光、干涉和衍射光學及光學光刻於一體，是國家自然科學基金資助的微細加工技術和微電子領域的前沿研究課題，對其進行理論、模擬和實驗研究，對推進光學光刻極限，發展我國納米微電子和光電子器件、新型大屏幕平板顯示器和新型光刻機具有重要的科學意義和廣闊的應用前景。
  10. The development status and trend of micro - electronics in china and others countries and the important influence of micro - electronics in the increase of world economy are discussed generally in this paper, and the research and development of laser lithography technology and equipment are summarized. the realistic significance, importance and feasibility of researching a new style of magnetic levitation ( maglev ) precision stage are narrated

    論文系統地綜述了國內外微電子技術的發展概況、發展趨勢以及微電子產業在世界經濟增長中具有的重大影響，概述了光刻技術和光刻設備的研究與發展狀況，敘述了當前磁懸浮技術的研究及應用水平，闡明了研製新型磁懸浮精密定位平臺的現實意義、重要性和可行性。
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