氣相沉積 的英文怎麼說

中文拼音 [qìxiāngchénjī]
氣相沉積 英文
vapor deposition
  • 氣 : Ⅰ名詞1 （氣體） gas 2 （空氣） air 3 （氣息） breath 4 （自然界冷熱陰晴等現象） weather 5 （氣味...
  • 相 : 相Ⅰ名詞1 （相貌; 外貌） looks; appearance 2 （坐、立等的姿態） bearing; posture 3 [物理學] （相位...
  • 沉 : Ⅰ動詞1 （沉沒; 墜落） sink 2 （沉下 多指抽象事物） keep down; lower 3 [方言] （停止） rest Ⅱ形容...
  • 積 : Ⅰ動詞（積累） amass; store up; accumulate Ⅱ形容詞（長時間積累下來的） long standing; long pending...
  • 氣相 : gas phase
  • 沉積 : [地] deposit; sedimentation; deposition; precipitation
  1. To overcome the bottle - neck, electron cyclotron resonance - plasma enhanced metalorganic chemical vapor deposition was developed

    為了解決這一問題，電子迴旋共振ecr等離子體增強有機金屬氣相沉積（ ecr - pemocvd ）應運而生。
  2. The desensitized explosive petn film was prepared by physical vapour deposition ( pvd ) technology, and sem was used to analyze the microstructure and grain size of petn film

    摘要採用物理氣相沉積（ pvd ）技術研製了鈍化太安炸藥薄膜，對薄膜的微觀結構和顆粒粒度進行了分析，對顆粒粒度與薄膜爆轟波穩定傳播臨界尺寸的關系進行了探索。
  3. The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc

    干鍍是一種在真空下在聚合物表面沉積金屬的方法，包括濺射、氣相沉積、真空沉積等。
  4. Hydrogenated amorphous silicon nitride ( a - sinx : h ) films have been deposited by helicon wave plasma enhanced chemical vapor deposition ( hwp - cvd ), the effect of sih4 / n2 rate on the properties of the samples is systematically studied, and the critical experiment condition is obtained under which a - sinx : h films with different compositions are deposited

    本工作採用螺旋波等離子體化學氣相沉積（ hwp - cvd ）方法制備了氫化非晶氮化硅（ a - sin _ x ： h ）薄膜，系統地研究了不同反應氣體配比對薄膜特性的影響，得到了沉積不同組分a - sin _ x ： h的典型實驗條件。
  5. Then, by annealing, the si / sic / sich nano - composite films are prepared. the influence of the post - heating on the microstructure of the films has systematically been studied by the means of the measurements of hrem. the nano - crystals are found embedded in the amorphous matrix in the unannealed sample and the crystallinity is not high

    以硅烷和乙烯為原料氣採用常壓化學氣相沉積制備得到si / sic復合薄膜，並使用退火處理方法對該薄膜進行后處理，最終得到si / sic / slo ：納米鑲嵌復合薄膜。
  6. Chemical vaporous depositon

    化學氣相沉積法
  7. Physical vaporous deosition

    物理氣相沉積法
  8. In this investigation, gas barrier property of pet has been improved by plasma enhanced chemical vapor deposition ( pecvd ) and plasma immersion ion implantation ( piii ) technologies

    本文通過等離子體化學氣相沉積（ pecvd ）和等離體浸沒離子注入（ piii ）技術在聚酯材料表面制備了阻隔碳膜來提高氣體阻隔性能。
  9. Application and progress of cvd hard film deposited ontool surface

    金剛石氣相沉積硬膜在工具表面的應用與發展
  10. Were invited to share their research results ion plating technologies and recent industrial developments and pvd hard film research conducted by the advanced coatings applied research laboratory ( acarl ) that was funded by itc and sponsored by the industry

    ，與我們分享有關的研究成果，包括離子電鍍技術和業界的最新發展，以及由先進塗層應用研究實驗室進行的物理氣相沉積硬膜。
  11. Zhang x d, zhao y, zhu f, et al. fabrication of high growth rate solar - cell - quality c - si : h thin films by vhf - pecvd [ j ]. chinese physics, 2004, 13 ( 8 ) : 1370

    汪六九，朱美芳，劉豐珍，等.熱絲化學氣相沉積技術低溫制備多晶硅薄膜的結構與光電特性[ j ] .物理學報， 2003 ， 52 （ 11 ） : 2934 - 2937
  12. Due to great advantage of the excimer laser in photoelectron material, photoelectron technology research, so in this thesis, a xecl excimer laser is designed in order to solve some problem in semiconductor film, cmr film, quartz film and other kind of film application, optical etching field, interaction between laser and material, material plasma study. the parameters of the excimer laser is e also measured and analyzed

    因此本文以氣相沉積、外延生長、巨磁薄膜、金剛石及其它薄膜制備及后續的光刻，激光與物質的相互作用，等離子體研究為目的，研製獲得了激光脈寬18ns ，單脈沖能量150mj ，矩形光斑大小2cm 1cm ，束散角3mrad ，最高重復頻率5hz的xecl準分子激光器。
  13. We analyzed the nucleation act of diamond in chemical vapor deposition ( cvd ) from the view of thermodynamics in the paper. a new nanothermodynamic approach was proposed, based on the established carbon thermodynamic equilibrium phase diagram

    本文從熱力學角度分析了化學氣相沉積（ cvd ）金剛石過程中，金剛石的成核行為，提出了一種新的金剛石的納米成核熱力學觀點。
  14. In this paper, the gas phase dissociation process during the diamond film growth from electron - assisted chemical vapor deposition ( eacvd ) by considering ch4 / h2 mixture gas as source gas had been studied by using monte - carlo computer simulation method. the eacvd gas phase dynamics model was built firstly and the low temperature deposition process was also discussed

    本工作採用蒙特卡羅（ monte - carlo ）計算機模擬的方法，對以ch _ 4 h _ 2為源氣體的電子助進化學氣相沉積（ eacvd ）金剛石薄膜中的氣相分解過程進行了研究，初步建立了eacvd氣相動力學模型，並討論了eacvd中的低溫沉積過程。
  15. Oriented growth of diamond film on si via plasma enhanced hot filament chemical vapor deposition

    等離子體增強熱絲化學氣相沉積法生長取向金剛石薄膜
  16. The study on low temperature pvd deposited sic film was carried out - m - employing bias assisted magnetron sputtering. furthermore, pvd deposited sic film mainly containing cubic phase was achieved at room temperature for. the first time

    採用偏壓輔助rf濺射法，對低溫物理氣相沉積sic薄膜進行了研究，並首次在室溫下制備出含有? sic構相併以其為主的sic薄膜。
  17. A ) si thin film with sub - micro thickness was epitaxial grown on heavy - doped si substrate by ultra high vacuum chemical vapor deposition ( uhv - cvd )

    A ）利用超高真空化學氣相沉積（ uhv - cvd ）技術在重摻si襯底上生長高晶體質量的亞微米級薄硅外延片。
  18. Tonellini m. on the work of adhesion of film - substrate solid junctions [ j ]. thin solid films, 1991, 202 : 227 - 234

    氣相沉積薄膜-基體界面附著力的劃痕試驗法編制說明
  19. In situ diagnosis of plasma environment for synthesizing diamond film was conducted by langmuir single probe and optical emission spectroscopy. the mechanism of diamond growth was investigated and the n - type diamond was deposited by glow plasma assisted chemical vapor deposition ( cvd )

    本文通過langmuir單探針和光發射譜對合成金剛石薄膜的等離子體環境進行了原位診斷；初步探討了金剛石薄膜生長的動力學過程；並採用輝光等離子體輔助化學氣相沉積（ cvd ）技術制備得到了n型金剛石薄膜。
  20. By the design of microwave electric field mode and microwave mode converter ( mmc ), the thesis participated in equipping an domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and water - cooled stainless steel resonant chamber in 2450mhz / 5 kw, introduced the basic machineries and functions of the sub - systems, including microwave system, gas - route system, vacuum system, detecting system and safeguard system

    論文通過微波場型和模式轉換器的設計，參與建立了一套2 . 45ghz 5kw帶有石英玻璃窗、水冷卻不銹鋼諧振腔的微波等離子體化學氣相沉積（ mpcvd ）系統（ mpcvd - 4型） 。論述了包括微波系統、氣路系統、真空系統、檢測系統和保障系統等結構的組成及基本功能。
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