氮化硅工藝 的英文怎麼說
中文拼音 [dànhuàguīgōngyì]
氮化硅工藝
英文
silicon nitride process-
The direct - nitridation of silicon wafer in nitrogen is very important because it involves in silicon wafer ' s heat treatment, ic technics and pulling monocrystal in nitrogen
在矽片的熱處理、集成電路工藝和氮氣保護的拉晶過程中，都涉及到硅的氮化問題，因此矽片氮氣直接氮化的研究意義重大。The objective of the paper is to get nano sisn ^ co composite powder of high quality by electroless plating at normal temperature. the rules were researched that the composition of electroless plating solution and reaction condition had an influence on the reaction of electroless plating of nano - si3n4 with ultrasonic wave. the best composition of electroless plating solution was obtained
本文以常溫化學鍍法制備高質量的納米氮化硅?鈷磷復合粉末為目標，研究鍍液組分及其工藝參數對納米氮化硅超聲波化學鍍鈷的影響規律，得到了納米氮化硅超聲波化學鍍的優化配方，制得了鍍層均勻，分散性好的納米復合粉末。Through parallel experiments, the rules were studied more that the composition of electroless plating solution and reaction condition affected on the reaction of electroless cobalt plating of nano - sian4 with ultrasonic wave, such as " induction period ", the speed of reaction, appearance and morphology of composite powder, the component and phases of the plating et al
通過對比實驗，分別就鍍液組分及其工藝參數對納米氮化硅化學鍍鈷反應孕育期、反應速度、復合粉末外觀、形貌，鍍層成份及相結構的影響規律進行了深入研究。孕育期是反映化學鍍液質量，影響化學鍍效率的重要參數。In this thesis adding the pre - process carbon nanotubes into the powder of silicon nitride, with ball milling, drying and sieving, fabricate the silicon nitride ceramics applying the hp sintering method, which in order to improve the toughness of the silicon nitride
本文就是利用碳納米管優良的力學性能，在對其預處理后，將其添加到氮化硅陶瓷粉末中，經球磨、乾燥、過篩后，採用熱壓燒結工藝，制備氮化硅陶瓷，以期改善氮化硅陶瓷的韌性。Taking in - situ toughened silicon nitride as a design object, principle component analysis ( pca ) is applied to study the microstructure and mechanical properties, to find out the main microstructure controlling factors, and to simplify the characterization variables and criterions ; fuzzy neural networks ( fnns ) is also applied to develop a design expert system for this material, which can realize the forward prediction from processing, microstructure to mechanical properties, and backward design from mechanical properties or microstructure to processing ; monte - carlo method is applied to simulate the grain growth of this material, and then crack propagation is simulated, which is another way based on physics and chemistry to developing prediction models from processing until to mechanical properties
本文以自增韌氮化硅陶瓷為設計對象，運用主成分分析法（ principlecomponentanalysis ： pca ）對自增韌si _ 3n _ 4陶瓷的顯微結構和力學性能進行數據空間降維，獲得自增韌si _ 3n _ 4陶瓷顯微結構控制的主要因素，進而簡化了表徵參量變量和準則；運用模糊神經網路（ fuzzyneuralnetworks ： fnn ）建立了自增韌si _ 3n _ 4陶瓷設計專家系統，能實現工藝?微結構?性能的正向預測及反向設計；運用monte - carlo方法（ mc ）進行自增韌si _ 3n _ 4陶瓷的晶體生長模擬，然後進行裂紋擴展模擬，探索建立工藝?微結構?力學性能預測模型的思路。Finally the method of preparation of p - si tft and some useful dates were given. the dissertation includes seven chapters. the first chapter introduces the development of tft ; the second chapter introduces the principle of tft and its structure ; the third chapter provides the reason of superposition capacitance between s, d and gate ; the fourth chapter introduce the deposition and test method of sinx ; the fifth chapter introduces the fabrication of p - si ; the sixth chapter studies the fabrication techniques of p - si tft and some parameters ; the seventh chapter is a conclusion of the research
本文一共分為七章:第一章介紹了本論文的研究背景、研究意義、主要工作以及國內外的研究進展;第二章介紹了tft的結構和工作原理;第三章介紹了柵極與源、漏極之間疊加電容產生的原因和自對準工藝;第四章介紹了氮化硅的制備方法和測試方法;第五章介紹了多晶硅tft有源層的制備方法並對各種晶化機理做了介紹;第六章主要對利用自對準工藝制備tft的工藝進行研究，並對制備出來的樣品進行了測試;第七章對全文進行總結。Secondly, a novel technology is proposed which includes several key steps such as lpcvd ( low pressure chemical vapor deposition ) nitride silicon and cmp ( chemical mechanical polishing )
其次，設計包含低壓淀積氮化硅和化學機械拋光（ cmp ）等關鍵步驟的新的soi介質隔離工藝流程。分享友人