濺射膜層 的英文怎麼說

中文拼音 [jiànshèmócéng]
濺射膜層 英文
sputtered layer
  • 濺 : 動詞（液體受沖擊向四外射出） splash; spatter
  • 射 : Ⅰ動詞1 （用推力或彈力送出） shoot; fire 2 （液體受到壓力迅速擠出） discharge in a jet 3 （放出） ...
  • 膜 : 名詞1. [生物學] （像薄皮的組織） membrane 2. （像膜的薄皮） film; thin coating
  • 層 : i 量詞1 （用於重疊、積累的東西 如樓層、階層、地層） storey; tier; stratum 2 （用於可以分項分步的...
  1. Copper has been deposited on surface of the al mmcs as interlayer by magnetron sputtering, tlp bonding of al mmcs with these interlays, the joints shear strength of tlp bonding using deposited film was as much as the joint shear strength of tlp bonding using cu foil. removing the oxidation on the surface before deposition, copper was coated by magnetron sputtering as tlp bonding interlayer

    待連接表面通過磁控濺射法沉積銅膜作為中間層進行瞬間液相連接，得到的接頭強度與銅箔中間層進行瞬間液相連接得到的接頭強度相當，而使用磁控濺射法去除待連接表面氧化膜后沉積銅膜作為中間層進行瞬間液相連接的接頭強度提高7 . 6左右。
  2. The bilayer manganite film la2 - 2xsr1 + 2xmn207 ( x = 0. 32 ) were successfully prepared by pulsed laser deposition ( pld ) method

    我們採用脈沖激光濺射沉積（ pld ）方法來制備雙層薄膜。
  3. In this study we focused on the pinning structure, and prepared [ pt / mn ] n multilayer by dc magnetron sputtering system instead of using co - sputtering, by which we wish to find a way to reduce the critical annealing temperature and shorten the annealing time

    在我們的課題研究中，我們著重對釘扎層進行了研究，工藝上採用了pt / mn多層膜而不是傳統的共濺射的方法。我們希望通過這種方式能夠發現一條降低臨界退火溫度的途徑，並且能夠縮短退火時間。
  4. The zircondri filin wtut rirconia wa prepared and the removing technology of the zirconia on the zirconium sdrices was obtalned. the methods of chemistry and magnetron sputtring plating were used in order to platc a palladium film, which is characteristic of self catalysis for hydrogen and the sole h - permselectivity on the clean rirconium sdrices prepared by the methods of electrochemitw and ( or ) high temperatur vacuum hydrgenization, which was firstly studied. the plating tedrilogy was obained and the surface modified zirconium membran was prepared

    在利用電化學法和真空高溫除氧加氫法去除了鋯表面氧化膜的基礎上，分別採用化學法、磁控濺射法兩種鍍膜技術在其表面上鍍上了一層對氫具有自催化分解、唯一選擇滲透性的金屬鈀膜，首次獲得了鋯基材膜表面上鍍鈀的制備工藝，成功制備了鋯表面改性選擇滲氫膜。
  5. The results show that proper control the motion mode of the particle in plating results in many strengths of the nickel films, such as good uniformity, high compactness, and strong interfacial adhesion

    濺射鍍膜時，通過控制空心微珠的運動方式，在空心微珠表面沉積了一層均勻性好、附著力強和緻密性好的金屬鎳膜。
  6. It was found that an uniform and compact tio2 nanoparticulate film can be deposited on pet substrates in a short time, and it ' s thickness increases with the treating time. when the thickness comes to a critical value, there grows a greater size cluster on the nano - sized film. this is an interesting film growing pattern, which has never been reported

    與以往報道的生長模式不同，發現在很短的時間內即可在基底上濺射生成緻密均勻的納米膜層，其膜厚隨著時間的延長而增加，且當達到一定厚度時，又在原有納米膜層上生長出更大尺寸的團蔟結構。
  7. In this thesis, we research the characters on the ion beam sputtering system, and prepare tiny films and cnx / tiny multilayers by ion beam sputtering. the best parameters of preparing cnx films are explored. we use the tiny films as template to promote the growth of cnx films

    本文對離子源的濺射特性進行了研究，採用離子束濺射法制備了tin _ y單層薄膜和cn _ x tin _ y多層薄膜，探索該法制備cn _ x薄膜的最佳工藝參數，並利用tin _ y薄膜為襯底以促進cn _ x薄膜的生長。
  8. Dlc and a - sic : h films were prepared by the rf glow discharge and the reactive sputtering method respectively. there were two reasons that we chose y rays, ultraviolet ( uv ) photons, and neutrons as radiation sources. one is that y rays, uv photons and neutrons irradiation are serious at outer space and / or nucleus irradiation enviromentthe other is that the study on y rays irradiation on the films is a new and an important directioaotherwisejirnited reports have been made of the investigation on the uv photonsjieutrons irradiation influences on these films

    本文分別採用射頻（ 13 . 56mhz ）等離子體cvd及射頻反應濺射方法制得了dlc及a - sic ： h薄膜。文中主要選擇y射線、紫外光及中子作為輻照源有兩方面的原因：一方面，在外層空間， y射線及紫外光輻射十分嚴重，而在核輻射環境下y射線及中子輻射也不可忽視；另一方面， y射線輻照這兩種薄膜完全是一項開創性的工作，同時國內外對紫外光子、中子與這兩種薄膜作用的研究也很少。
  9. It adopts the intermediate frequency power ; it not only can plate single films or multilayer membrane, such as titanium nitrides, titanium carbide, zirconium nitrides, chromium nitride, titanium, nickel, chromium and copper etc. but also can plate the ito, al2o3, sio2, tio2 and zro etc. furthermore, it can plate multilayer membrane after being equipped with multi - targets with top grade quality and fast speed, as well as advantages of other plating methods ; therefore it is one super - hard membrane equipment with excellent performance

    採用先進的中頻電源，濺射速度快，不但可以鍍制氮化鈦碳化鈦氮化鋯氮化鉻及鈦鎳鉻銅金銀等等單一膜層或復合膜層，而且可以鍍制銦錫合金ito氧化鋁al2o3二氧化硅sio2氧化鈦tio2氧化鋯zro等等膜層，另外其配置多靶可以鍍制多層膜，不但鍍制膜層細膩而且鍍制速度非常快，兼有其他鍍法的優點，所以是一種性能非常優良的鍍制超硬膜設備。
  10. In this paper, tio2 films as ecological self - clean glass material prepared by magnetron sputtering method were discussed in the following aspects : the preparation technology of tio2 films by magnetron sputtering method, the control of the surface microstructure, the effect of the surface microstructure on the photocatalytic activity and the optical performance of tio2 films. sem was used to observe the surface topography. xrd was used to explore the crystal form, and crystal size

    為了解決以往溶膠?凝膠法制備的tio _ 2薄膜膜層質量不好的缺點，本論文對磁控濺射法在玻璃表面制備tio _ 2薄膜作為生態自潔凈玻璃材料進行了一系列探索與應用基礎研究，包括tio _ 2薄膜的磁控濺射法制備工藝、表面微觀結構的控制、表面微觀結構對tio _ 2薄膜光催化性能、透光性影響等。
  11. Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering

    摘要採用射頻磁控濺射技術在改性氟塑料表面沉積鋁層，制備了金屬氟化高聚物復合薄膜。
  12. The realization of the algorithm drives the research of micro - electron structure. 2. the la2o3 thin film is prepared by rf technology, the film is analyzed by arxps, the thickness is calculated by quantitative analysis software, the thickness of sio2 thin film between la2o3 and si is 0. 6nm

    利用射頻濺射鍍膜技術在si片上制備了la _ 2o _ 3膜，通過變角xps分析和多層結構的定量計算，測得la _ 2o _ 3與si襯底之間的sio _ 2層厚度為0 . 6nm 。
  13. Our experiments emphasized the correlation between micro structures and some properties of the coatings and tried to obtain the protective coatings with the comprehensively good properties, in which auger electron spectroscopy ( aes ), scanning electron microscope ( sem ), and x - ray diffraction ( xrd ) were employed to investigate the composition, microstructure and crystal phase of the coatings respectively, and the properties test was primarily considered with the wear resistance and corrosion resistance of the coatings

    本論文主要採用pvd技術中的磁控濺射鍍膜（ ms或rms ）及部分用等離子噴塗（ ps ）和熱氧化（ to ）表面處理技術研究了鈾的具有代表性的三種防腐保護鍍層，即單質al 、氧化物al _ 2o _ 3和合金al - zn鍍層。實驗力圖在制備技術、工藝參數及鍍層的微結構和性能之間找到一些內在的聯系，探索綜合性能較好的防腐蝕鍍層。
  14. In order to increase the thickness and improve the quality of sputtered films, low deposition rate and 30nm ta buffer layer on substrate have been adopted. as a result, 3 u m single films and 2. 6 u m / 2. 6 u m 72. 6 u m sandwiched films have been successfully prepared

    通過降低濺射速率和在基底上沉積30nm的tabuffer （緩沖層） ，解決了難以濺射生長厚膜的問題，成功制備了厚度3 m的單層膜和每層厚度2 . 6 m的三明治膜。
  15. It ' s the first time to deposit copper film on surface of al mmcs by magnetron sputtering, and embed al mmcs into the sputtering region of al target

    本文首次提出使用磁控濺射法制備瞬間液相連接的中間層。一種是直接沉積法，另一種是濺射去除氧化膜再沉積法。
  16. Keywords : gims, ion source, anode layer, sputtering, tin, ion plating ， medium frequency, pulsed dc

    中文關鍵詞：氣離濺射、離子源、陽極層流、濺射、氮化鈦、離子鍍膜、中頻、脈沖直流。
  17. 2 ) sbd was made using zno thin film as the active layer, which is a first time attempt. - 2 - a ) first time, high c - axial orientation zno thin film was deposited on al membrane supported on si substrate

    A ）利用磁控濺射技術，首次在si襯底上，以金屬al做過渡層制備具有高c軸取向的zno晶體薄膜。
  18. The high - performance heat - reflective coated glass is also called sunlight control coated glass it is made by coating a number of metal or metal compaound films onto the high - quality float glass or other base glass with the vacuum magnetic control sputtering method, which can effectively control the reflection, transmission and absorption of solar energy, that is to say, this glass allows sufficient natural light to come in for daylighting, and can also reflect major part of sunlight irradiation to reduce the collection of indoor heat and lower down the expenses for ventilation and air conditioning ; furthermore, the transmission, reflection ratio and reflection color are ready for the selection by the users

    高性能熱所射鍍膜玻璃也稱為陽光控制鍍膜玻璃，是在優質浮法玻璃或其他基片上用真空磁控濺射的方法鍍多層金屬或金屬化合物薄膜而成，可有效控制玻璃對太陽能的反射、透過和吸收，也就是說允許足夠的自然光進入室內用於採光，還能把大部分太陽光輻射熱反射掉，減少室內熱量的積聚，降低通風及空調的費用，而且可以根據客戶的需求，靈活選擇透過率，反射率及反射顏色。
  19. According to the designing results, we selected super - polished fuszed quartz as substrates and applied magnetic control technique to deposit thin films

    根據多層膜的設計結果，我們採用磁控濺射技術進行了多層膜的沉積。
  20. And the transition layer ti between tio2 and tin can improve the transmittance of tio2 / tin. in triple layers the exterior tio2 can increase the transmittance of tio2 / tin / tio2, so do the transition layer ti film between tio2 and tin. after treated at 300 c tio2 / tin / tio2 has no difference with non - heat - treated triple layers, and when treated at 400 c the transmittance of the films increase and the curve shift to the red

    結果顯示，在tio _ 2 tin多層膜中， tin濺射沉積時間較短時，薄膜在紫外?可見光范圍內呈現出較高的透過率；隨著tin薄膜濺射時間的增長，透過率武漢理工大學碩士學位論文逐漸降低;在tio :與tin之間鍍制一層ti膜過渡層可以提高雙層薄膜ti02ztin的可見光透過率。
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