等離子加工 的英文怎麼說
中文拼音 [děnglízijiāgōng]
等離子加工
英文
plasma machining- 等 : Ⅰ量詞1 (等級) class; grade; rank 2 (種; 類) kind; sort; type Ⅱ形容詞(程度或數量上相同) equa...
- 離 : Ⅰ動詞1 (離開) leave; part from; be away from; separate 2 (背離) go against 3 (缺少) dispens...
- 子 : 子Ⅰ名詞1 (兒子) son 2 (人的通稱) person 3 (古代特指有學問的男人) ancient title of respect f...
- 工 : Ⅰ名詞1 (工人和工人階級) worker; workman; the working class 2 (工作; 生產勞動) work; labour 3 ...
- 離子 : [物理學] ion
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In order to increase productivity, for big size tank welding, saf propose plasma plus tig double torch solutions, welding speed is 30 % to 50 % higher than single plasma torch welding
為增加焊接生產的效率,對于大尺寸工件的環縫何縱縫焊接, saf採用等離子tig雙槍焊接工藝,焊接速度比單等離子增加30至50 。According to the characteristic of cnc plasma cutting machine it could improve the process quality of cutting piece in effect for choosing proper technics, for example, cutting section point, aspect, sequence, speed etal during the period of processing, and elaborating towards the distortion control of single side piece, slightness piece, profiled piece and particularity piece at the same time
根據數控等離子切割機的特點,在加工過程中正確選擇切割的起點、切割方向、切割順序、切割速度等工藝,可以有效提高切割件的加工質量,同時對單邊工件、細長件、異型件以及特殊件的變形控制進行了詳細地闡述。Pulse electric current heat treatment ( pecht ) developed by sodick, ltd., of japan, is a recently developed material processing method which consists of spark plasma sintering and welding, plasma activated sintering and welding, big pulse electric current ( bpec ) diffusion welding etc. the following are basic merits of pecht : rapid heating and cooling ; short sintering or welding time ; lowering sintering or welding temperature
脈沖電流熱加工( pulseelectriccurrentheattreatment ,比如燒結,焊接等)是九十年代發展起來的一種材料快速制備新技術,它包括放電等離子燒結與焊接、等離子活化燒結與焊接、脈沖大電流擴散焊接等。它具有升溫、降溫速度快、能在較低的溫度下燒結或焊接以及時間短的特點。This paper mainly aims at the strategic demands for large - aperture lightweight mirror proposed by high - tech development. its main research contents are : select material blank for lightweight mirror according to physical and chemical properties of optical glass ; analyze and calculate the deformation quantity of the mirror with finite element method ; design and optimize mirror body structure of 400 lightweight plane mirror and 450 lightweight spherical mirror, analyze glass cutting principle, design specisl - use grinding wheel structure, select reasonable technological parameters to implement the processing of weight reduction holes on 400 plane mirror ; analyze etching mechanism of hydrofluoric acid, look for the technological parameters such as the optimal acid concentration and etching time etc. ; eliminate the stress of weight reduction holes and micro - cracks on 400 lightweight plane mirror ; discuss the processing principle and
本論文的研究主要是瞄準國家高技術對大口徑輕型鏡的戰略需求而開展的。主要研究內容是:根據光學玻璃的物理與化學性能,選擇輕型鏡坯材料;用有限元法對鏡子的變形進行分析、計算,找出變形規律,優化設計400mm輕型平面鏡、 450mm輕型球面鏡鏡體結構;分析玻璃切削原理,設計專用磨輪結構,選擇合理工藝技術參數,完成400mm平面鏡輕量化減重孔的加工;分析氫氟酸腐蝕光學玻璃機理,尋找最佳酸濃度、腐蝕作用時間等工藝參數,實現400mm平面鏡減重孔應力與微裂紋的消除;討論分離器加工原理和工藝技術特點,完成400mm平面輕型鏡面形加工。Baseing on the request of low coercivity and high squareness in application, we had confirmed the main formulation of the lizn ferrite ; during the study of the conventional ceramic process, with the main formula foundation, we mainly studied the influence of ti4 +, co3 + on lowering coercivity and bi2o3, v2o5 on lowering sinter temperature. the results showed bi2o3 good characteristic on lowering sinter temperature and the sample which mixed with 1 % bi2o3 could reduce 40 % coercivity through slowing heating rate and extending the holding time
在氧化物陶瓷工藝技術研究中,按實際應用中低矯頑力、高矩形比的要求,確定了lizn鐵氧體的主配方,在主配方基礎上進行了ti4 + 、 co3 +等離子對降低矯頑力的研究以及添加bi2o3 、 v2o5助熔劑對降低燒結溫度的研究,發現bi2o3具有優良的降低燒結溫度的特性,在添加bi2o3樣品燒結過程中,降低升溫速率,延長保溫時間可以降低40 %左右的矯頑力。Apply research of the arc plasma heating cutting with cutting metal materials
等離子弧加熱切削在金屬切削加工中的應用研究The work part of the micro - ppt is less than 200g, and less than 5mm in diameter. high isp and high efficiency are acquired because of the efficient coaxial discharge characteristic and higher discharge voltage than the standard ppt
該推進器的基本原理是通過真空中對工質的高壓放電使工質電離為等離子體,等離子體在電磁場的作用下加速排出形成推力。Furthermore, the growth and the study of self - organized quantum dots structures become more and more important recently, and the application of self - organization technique become wider and wider in this thesis, we address the theory of film growth and the growth technique firstly more, the ways and characteristics of surface detection are prescribed we mainly report the growth process, results and discuss of self - organized quantum dots structures in the a12o3 substrates by s - k mode using ecr - mocvd, in the espd - u device the growth art of ain epilayer which is the preliminary foundation of self - organized gan / ain quantum dots structures, including the substrate cleaning, nitridation, the growth of buffer and the growth of gan and ain epilayer, is discussed we deliberately compare the test result of rheed xrd and afm and achieved the optimalized condition of ain at last we have successfully realized the growth of ain which is much smooth and better crystal quality moreover, we grow the self - organized gan / ain quantum dots structure in s - k mode because the limits of the heater temperature, we can not grow the atom - smooth epilayer of ain until now so we could not grow better quantum dots which have small diameter and big density but the self - organized quantum dots structures with better quality will be realized successfully if the substrate temperature is increased the thesis study belong to my tutor subject of national nature science foundation ( 69976008 )
本論文主要論述了在espd - u裝置上,採用電子迴旋共振等離子體增強mocvd ( ecr - pamocvd )方法,在藍寶石襯底上通過s - k模式自組裝生長gan aln量子點結構的生長工藝、結果及討論。而重點分析了自組裝生長量子點之前的aln外延層生長工藝,包括襯底清洗、氮化、緩沖層的生長和gan 、 aln外延層的生長;通過高能電子衍射、 x射線衍射和原子力顯微鏡測試,並且對這些測試結果進行了詳細的比較研究,得出了較優化的工藝條件,生長出了晶質較好、表面較平整的aln外延層;進而採用s - k模式自組裝生長了gan aln量子點結構。由於實驗裝置加熱爐溫度的限制,我們沒有能夠生長出原子級平滑的aln外延層表面,因而沒能夠生長出密度比較大和直徑比較小的量子點。The numerical results of the dispersion relation show some nonlinear effects : for a fixed geometry of a waveguid, beam parameters and plasma density, the increment of the modulation parameter may lead to a slight increment of the operating frequency, however, as the modulation parameter increases further, saturation may occur and the dispersion relations are hard to be separated, it is due to the overmodulation of the microwave power, this phenomenon itself belongs to the nonlinear effects
對於一定的波導、電子注參量和等離子體密度值,等離子體調制系數的增加,使工作頻率略微升高。但是,隨著等離子體調制系數的進一步增加,色散曲線變得彼此之間不可分辨,可以認為是等離子體的過調制導致了柵的飽和。這一現象是非線性的,可見,等離子體柵和調制場中文摘要是非線性關系,等離子體柵是非線性j 。High speed water jet special machining utilizes the beam of water with very high dynamic energy to cut materials, therefore it actually belongs to the machining tool of high energy beam
摘要高速水射流特種加工是利用具有很高動能的高速(超音速)水射流束來沖蝕材料,從而實現材料切削,屬于高能束加工范疇,是一種可與激光、等離子體、電子束加工方法媲美的新型切割加工工具。Using the microwave selective heating property for materials, by setup equivalent equation, and first time inducing the electromagnetic field perturbation theory to the design of heating materials for substrate in mpcvd, three temperature distribution modes were established, including temperature distribution comprehensive mode of inhomogeneous plasma, temperature distribution composite mode of composite substrate materials, temperature distribution perturbation mode of composite materials, which ii provided an whole new technology route to the design of substrate heating system in mpcvd and guided the preparation of heating materials for substrate. and then the heating materials for substrate were designed and optimized to obtain large area homogeneous temperature distribution even larger than substrate holder ' s diameter. as an important part, this thesis researched the nucleation and growth of diamond films in mpcvd, systematically researched the effects of substrate pretreatment, methane concentration, deposition pressure and substrate temperature etc experimental technologic parameters on diamond films " quality on ( 100 ) single crystal silicon substrate in the process of mpcvd, characterized the films qualities in laser raman spectra ( raman ), x - ray diffraction ( xrd ), scanning electron microscopy ( sem ), infrared transmission spectra ( ir ), atomic force microscopy ( afm ), determined the optimum parameters for mpcvd high quality diamond in the mpcvd - 4 mode system
該系統可通過沉積參數的精確控制,以控制沉積過程,減少金剛石膜生長過程中的缺陷,並採用光纖光譜儀檢測分析等離子體的可見光光譜以監測微波等離體化學氣相沉積過程;利用微波對材料的選擇加熱特性,通過構造等效方程,並首次將電磁場攝動理論引入到mpcvd的基片加熱材料的設計中,建立了非均勻等離子體溫度場綜合模型、復合介質基片材料的復合溫度場模型及復合介質材料溫度場攝動模型,為mpcvd的基片加熱系統設計提供了一條全新的技術路線以指導基片加熱材料的制備,並對基片加熱材料進行了設計和優選,以獲取大面積均勻的溫度場區,甚至獲得大於基片臺尺寸的均勻溫度區;作為研究重點之一,開展了微波等離體化學氣相沉積金剛石的成核與生長研究,系統地研究了在( 100 )單晶硅基片上mpcvd沉積金剛石膜的實驗過程中,基片預處理、甲烷濃度、沉積氣壓、基體溫度等不同實驗工藝參數對金剛石薄膜質量的影響,分別用raman光譜、 x射線衍射( xrd ) 、掃描電鏡( sem ) 、紅外透射光譜( ir ) 、原子力顯微鏡( afm )對薄膜進行了表徵,確立了該系統上mpcvd金剛石膜的最佳的實驗工藝參數。Research into ceramic cutting with hydro - magnetically confined plasma arc
水磁綜合約束等離子弧加工陶瓷方法研究Extreme ultraviolet lithography is being developed as one of the most important candidates to fabricate a sub - o. lum - pattern. in recent years, several key technologies have been developed rapidly such as laser producing plasma source, extreme ultraviolet multilayer, optical fabrication and metrology, projection - camara alignment, low - defect mask and control technology of stage
極紫外投影光刻( extremeultravioletlithography簡稱euvl )最有可能成為下一世紀生產線寬小於0 . 1 m集成電路的技術,近年來在激光等離子體光源、極紫外多層膜、光學加工和檢測、光學精密裝調、低缺陷掩模、光刻膠技術以及高穩定工作臺系統控制等關鍵技術方面得到了飛速發展。In year 2005, our new main plant was built in jiading district, shanghai. hugong valve factory has also recently employed 556 people, including 158 technical engineers and 3 senior engineers. we also have more than 10 workshops for precise casting, hot forging and stamping, welding, heat treatment, finishing, machining and assembly
下設精密鑄造熱鍛壓焊接熱處理精加工裝配等十多個車間擁有數控加工中心等離子焊接機全自動氣體保護焊半自動真空熔焊機超頻真空熱處理車球專用數控車床高效加工專機理化和探傷設備等各類加工檢測設備300多臺套。The aim of this paper is to search for a new type periodic slow - wave structure with filling periodically magnetized plasma, and following works are done : 1. firstly, the investigation of wave propagation characteristic in magnetized plasma with periodically changing density is done. by numerical calculation, analyze the effect of additional magnetic field and plasma density changing on the propagation characteristic
本文的目的是探索一種周期磁化等離子體慢波結構,並做了如下的工作: 1 .對電磁波在密度周期變化磁化等離子體中的傳輸特性進行了研究,通過數值計算分析了不同外加磁場以及不同等離子體密度情況下波的傳播特性。Latest progress in plasma microfabrication technology
等離子體微細加工技術的新進展Plasma etching has been widely used in the etching process of si devices. now the study is focused on the microfabrication of compound semiconductor
等離子體干法刻蝕在硅器件的微細加工中已經得到廣泛應用,目前研究的焦點集中在化合物半導體。Plasma assisted controlled thinning method
等離子輔助控制薄膜化加工法The interactions between dust particles and plasmas have attracted much attention in the recent years since dust contamination is recognized as a serious problem in plasma processing of integrated circuits
近年來,特別是在人們認識到塵埃粒子是影響半導體集成電路加工質量的關鍵問題后,塵埃粒子與等離子體的相互作用備受關注。The content of this dissertation is about the modification of coatings by laser cladding nano - material on plasma - spraying coatings. introducing rapid prototyping into nano material processing, experimental researches on the selective sintering of nano material are carried out systematically, the main work accomplished and conclusions gotten in this dissertation are presented as follows : 1 under the aiding of plasma spraying, reasonable coating material systems are designed to fabricate alumina, nicral / a12o3, nicral / a12o3 + 13 % wt. tio2, nicral / wc - co coating
本文主要是在等離子噴塗的基礎上,利用激光熔覆納米陶瓷材料對等離子塗層進行改性處理,從而制備納米復合塗層;同時將激光快速成型應用於納米材料加工中,主要完成如下內容: ( 1 )設計合理的等離子塗層結構,制備了al _ 2o _ 3 , nicral al _ 2o _ 3 , nicral al _ 2o _ 3 13 wttio _ 2 , nicral wc - co四種塗層。分享友人