顯微光刻術 的英文怎麼說
中文拼音 [xiǎnwéiguāngkèshù]
顯微光刻術
英文
microphotolithography-
Heidelberg instruments mikrotechnik gmbh offers you pertinent information by telephone for the ranges micro technology, laser lithography and lithography in addition to semiconductor technology. contact heidelberg instruments mikrotechnik gmbh
Heidelberg instruments mikrotechnik gmbh是一家誠信的、高效能的生產商和服務商，該公司提供新型的、專門的產品，例如顯微鏡檢查技術、顯微鏡標本製作技術，激光平版印刷、激光光刻技術，平版印刷、蝕刻技術、光刻技術，半導體技術。With the furthermore development of ultra thin film technology, soft x - ray multilayer mirrors was applied in many fields, such as astronomy, microscope technology, euv lithogrphy, x - ray laser, icf diagnosis and so on
隨著軟x射線超薄膜制備技術的不斷發展，軟x射線多層膜反射鏡已在多個領域中投入研究與應用，如天文學、生物醫學顯微鏡、極紫外投影光刻技術、 x射線激光、高溫等離子體診斷等等。It has broad application prospect in the following fields such as microelectronics, photoelectronic devices, large screen flat panel display, field emitter array, acoustic surface wave device, photon crystal, light waveguide array, holographic honeycomb lens and micro - optical element array, micro - structure manufacture, fabrication of large area grating and grid of high resolution, photoresist performance testing, profile measurement and metrology, etc. the paper only involves the primary research of interferometric lithography
在微電子、光電子器件、大屏幕平板顯示器、場發射器陣列、表面聲波器件、光子晶體、光波導陣列、全息透鏡和微光學元件陣列、微結構製造，高分辨、大面積光柵和網格製造，在抗蝕劑性能測試、面形測量和計量等領域，干涉光刻技術都具有廣闊的應用前景。Interferometirc lithographic technology incorporates laser, interference optics, diffraction optics and optical lithography and it is a frontier research subject in microfabrication technology and microelectronic field sponserd by national natural science foundation of china. the research for this technology in theory, simulation and experiments has important scientific meanings and broad application prospect for promoting lithographic limit, developing nanometer electronic and photoelectron devices, novel large screen panel display and novel lithographic equipment of our country
干涉光刻技術集激光、干涉和衍射光學及光學光刻於一體，是國家自然科學基金資助的微細加工技術和微電子領域的前沿研究課題，對其進行理論、模擬和實驗研究，對推進光學光刻極限，發展我國納米微電子和光電子器件、新型大屏幕平板顯示器和新型光刻機具有重要的科學意義和廣闊的應用前景。分享友人