electron beam efficiency 中文意思是什麼
electron beam efficiency
解釋
電子束效率- electron : n. 【物理學】電子。 the electron beam 電子束。 the electron theory 電子（學）說。
- beam : n 1 梁，棟梁，桁條；（船的）橫梁。2 船幅；（動物、人的）體幅。3 （秤）桿，杠桿，（織機的）卷軸，...
- efficiency : n. 1. 功效。2. 效率；效能；實力，能力。3. 【物理學】性能。
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Electron gun is the foremost parts of twt, it can produce electron beam with a certain shape and current, in order to guarantee the reliability and security of work, it ’ s design have to meet to the requirement not only of electric parameter, but also all kinds of subsidiary characteristics such as filament pyrogenation efficiency, warm up time, shape size, pole space capacitance and the ability to be able to bear the press and all kinds of rigorous run conditions such as high temperature, high humidity, low air pressure, strong vibration and great strike
由於行波管的大功率和高頻率等特性，目前還沒有任何其他的器件可以代替。行波管是應用高頻電磁場與電子注進行互作用的機理進行工作的，而電子槍是行波管中產生電子注並使它成型的基本部件，電子槍的結構設計決定了槍體自身必須具有良好的抗振可靠性，否則結構發生共振或振動位移過量，就會導致行波管的失效。因此對行波管電子槍的研究具有非常重要的意義。 -
The influences of electron beam and rf system parameters, magnetic field on output power, efficiency, bandwidth and gain are discussed
研究了電子注參量、高頻輸入功率及頻率、外部磁場等對互作用效率、輸出功率及頻帶的影響。 -
And the simulation on the nonlinear beam - wave interaction of two - cavity gyroklystron is made. the influences of the drift length and beam voltage and current and the velocity ratio of the electron beam and et al. on efficiency and gain are analyzed in detail
並對34ghz兩腔迴旋速調管的注?波互摘要作用進行了大量的數值模擬研究，分析了漂移區長度、電壓、電流、速度lhq值、磁場k ， ； 、注入波功率等多種因素對互作用電子效率及增益的影響。 -
By studying and using conventional 1c process in combination with electron beam lithography ( ebl ), reactive ion etching ( rie ) and lift - off process, several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires, si quantum dots, double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes
研究利用常規的硅集成電路工藝技術結合電子束光刻，反應離子刻蝕和剝離等技術制備半導體和金屬納米結構，很好地解決了普通光刻與電子束光刻的匹配問題，提高了加工效率，經過多次的工藝實驗，摸索出一套制備納米結構的工藝方法，首次用電子束光刻，反應離子刻蝕和剝離等技術制備出了多種納米結構（硅量子線、量子點，雙量子點和三叉指狀的金屬柵結構） 。 -
In twt, rf field extracts energy from the electron beam. the electron beam must interact with the traveling wave field at the approximate speed, so that the electronic efficiency is much lower
在行波管中，電子交給高頻場動能，而電子注與行波場的相互作用又要求維持同步條件，因而電子的效率比較低。 -
At the end of the thesis, the basic physical characteristics of axially - emitted and radially - emitted electron beam are summed up, and the design methods of sws ( slow wave structure ) for high - efficiency beam - wave interaction according to the motion characteristics of e - beam are brought forward, these helpful discussions for design of microwave source are going to be validated by pic method
最後，本文在總結電子軸向、徑向和角向運動基本規律的基礎上，從電子運動的角度提出了高效率束波相互作用慢波結構的設計思路，為微波源的設計提供了一些有益的參考。
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