plasma resonance 中文意思是什麼
plasma resonance
解釋
等離子體共振-
We infered that this new absorption band was associated with the effect of charge - transfer transition between adsorbates and colloidal silver particles, not the effect of the surface plasma resonance due to the silver particles aggregation which was usually attributed to in previous research work
我們將其歸因於與納米銀顆粒表面間的電荷轉移效應（ ct ） ，而非通常所認為的因銀膠凝聚而產生的表面等離子體共振吸收效應。 -
Nitridation of large silicon surfaces at low temperatures by electron cyclotron resonance plasma
等離子體對硅表面的低溫大面積氮化 -
To overcome the bottle - neck, electron cyclotron resonance - plasma enhanced metalorganic chemical vapor deposition was developed
為了解決這一問題，電子迴旋共振ecr等離子體增強有機金屬氣相沉積（ ecr - pemocvd ）應運而生。 -
Microwave electron cyclotron resonance ( mwecr ) cvd is a newly developed technique for plasma processing and materials fabrication, such as plasma etching and films deposition
本論文介紹了我們對ecr等離子體cvd系統的測試、 bn薄膜的制備和薄膜光學特性研究。 -
Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching ( ecr - rie ) equipment to improve its property of weave
摘要採用微波電子迴旋共振等離子體反應離子刻蝕（ ecr - rie ）裝置對氂牛毛纖維進行表面改性，從而改善氂牛毛的可紡性。 -
The absorption characteristics was that the surface plasma absorption peak appeared around 570 nm shifted to a short wavelength and strengthened as the cu composition increased. but the maximal shift range of the absorption - edge preponderated over 500 nm, and leaded that the dipolar plasma resonance absorption peak were covered up and gradually disappeared in the absorption spectrum. we theoretically explained the mechanism of the modulating action
實驗觀察到cu表面等離子體共振吸收峰位在570lun附近的吸收邊頻移量超過了500nln .理論分析表明，吸收峰位的移動主要源於偶極共振，而峰形的寬化主要由納米粒子的表面效應和量子尺寸效應引起 -
The study indicates that self - assembly monolayer membrane of au nanoparticle distributes as sub - monolayer. after au nanoparticles are assembled in multilayer, surface plasma resonance absorption peak got a red shift because of the polarizing effect of the surrounding media and the coupling effect of surface plasma waves between the next au nanoparticles
研究表明au納米粒子的自組裝單層薄膜呈亞單層分佈， au納米粒子組裝到多層復合薄膜中后，由於周圍介質的極化作用以及相鄰au納米粒子間的表面等離子體波的耦合作用，表面等離子共振吸收峰出現紅移和展寬。 -
In this thesis, we have mainly studied the characteristics of chf3, c6h6 and cf4 electron cyclotron resonance ( ecr ) plasma using langmuir probe and optical emission spectroscopy ( oes ). the relative concentration of different radicals in chf3 plasma and the effect of chf3 / c6h6 ratio on bond configuration of a - c : f films were discussed. it was showed that h, f, c2 were the main radicals among radicals of h, f, c2, ch and f2 in chf3 ecr plasma
重點研究了chf _ 3 、 cf _ 4和chf _ 3 c _ 6h _ 6放電等離子體中基團的分佈；分析了不同基團的相對密度隨宏觀放電條件（微波輸入功率、放電氣壓、源氣體流量比）的變化規律；探討了等離子體中各種基團的生成途徑；在不同源氣體流量比的條件下沉積了a - c ： f薄膜並通過傅立葉變化紅外吸收光譜（ ftir ）的測量得到了薄膜中鍵結構的信息；分析了a - c ： f薄膜的沉積速率及其鍵結構與等離子體空間基團分佈狀態之間的關聯。 -
Excited with 228nm, the emission bands centered at about 365nm and 460nm originate from the electron transitions of 1d2 - 1s0 and 3d - 1s0 in ag + respectively, and the emission band at 400nm results from the surface plasma resonance of the silver nanoparticles, which aggregated near the surface of the films
在228nm光激發下，復合膜中ag ~ +的電子的~ 1d _ 2 ~ 1s _ 0躍遷和~ 3d ~ 1s _ 0躍遷分別在365和460nm附近發光，聚集在復合膜表面的納米銀粒子的表面等離激元共振導致了400nm附近的發光。 -
The experimental results are helpful to understand the acceleration mechanisms of the hot electron emission in the interaction of the us - ui laser pulse with plasma. an anisotropy energy distribution of the hot electrons emiaon has been observed for the first time in the experiments. the energy spectrum of hot electrons resulted from the resonance absorption at the direction of target normal is a maxwellian - like distribution
E11分佈，擬合的超熱電子有效溫度約200kev左右，超熱電子的最大能量約zmev ，加速電子的主導機制是共振吸收機制;反射方向超熱電子的能譜在低能段出現一個局部的平臺（ pla1leau ） ，呈現出非類maxwen分佈，這是幾種加熱機制共同作用的結果，其中佔主導地位的是反射激光加速機制。 -
Therefore, the diagnostics of electrical and optical characteristic of plasma form the basic respects of plasma diagnostics. the author reports in detail in the dissertation the experimental investigation on the phenomena of some common discharge systems at typical operation status such as dc glow ; rf ( radio frequency ) glow and microwave ecr ( electron cyclotron resonance ) discharge
創新之處： （ 1 ）提出了雙原子分子轉動分辨發射光譜的擬合方法，並利用擬合方法進行了氮氣直流輝光放電產生的第一負帶轉動分辨光譜和磁控濺射沉積cnx膜過程中cn基團的振動帶的轉動線型擬合，獲得了相應的轉動溫度。 -
Locus of reflectivity in complex coordinates during surface plasma resonance
光激發表面等離子體波反射系數在復平面的軌跡 -
The fourier transform infrared ( ftir ) spectrum is an effective technology for studying the hydrogen content ( ch ) and the silicon - hydrogen bonding configuration ( si - hn ) of hudrogenated amorphous silicon ( a - si : h ) films. in the paper, ch and si - hn of a - si : h films, fabricated at different ratio of h2 / sih4 by microwave electron cyclotron resonance plasma chemical vapor ( wmecr cvd ) method, have been obtained by analyzing their ftir spectra that are treated by baseline fitting and gaussian function fitting. the effects of ratio of h2 / sih4 on ch and si - hn are studied
Fourier紅外透射（ ftir ）譜是研究氫化非晶硅（ a - si : h ）薄膜中氫含量（ c _ h ）及硅-氫鍵合模式（ si - h _ n ）最有效的手段，對于微波等離子體化學氣相沉積（ mwecrcvd ）方法在不同h _ 2 sih _ 4稀釋比下制備出的氫化非晶硅薄膜，我們通過紅外透射光譜的基線擬合、高斯擬合分析，得出了薄膜中的氫含量，硅氫鍵合方式及其組分，並分析了這些參數隨h _ 2 sih _ 4稀釋比變化的規律。 -
The gas sources that we used are trimethylgallium ( tmg ) and 99. 9999 % purity nitrogen, which were fed into reaction chamber and resonance cavity respectively. the highly dense ecr plasma up to 1011cm - 3 was created in the resonance cavity and introduced to the next reaction chamber by the force of divergent magnetic field. consequently, gan thin film was grew on the substrate sapphire ( 0001 ) placed in the downstream
實驗採用有機金屬三甲基鎵氣源（ tmg ）和99 . 9999純度的氮氣，在ecr - pecvd150裝置共振腔內電子迴旋共振吸收微波能量產生的高密度ecr等離子體在磁場梯度和等離子體密度梯度的作用下向下級反應室擴散，在放置於下游區樣品臺上的- al _ 2o _ 3襯底表面附近發生物理化學反應沉積成gan薄膜。 -
Determination of carrier concentration in gallium arsenide by the plasma resonance minimum
砷化鎵中載流子濃度等離子共振測量方法 -
The infrared results showed that the ir characteristic value l080cm - lof cubic crystal sio, and the absorption peak 460cm - l of mgf, caused by the interaction between f - - mg ' + - p elastic vibration and photon radiation, appeared in the ir spectra. ellipsometric analysis showed that the typical absorption peaks 58lnm, 589nm and 606nm, resulting from the surface plasma resonance of cu panicles and reflecting the absorption on composite film system, appeared in the extinction coefficient k curves of cu ( voll5 % ) mgf, cu ( vol20 % ) mgf, and cu ( vol30 % ) mgf, cermet films, respectively. with the component of cu increasing, the peak site presented red shift, which was in accordance to the results of ultraviolet - visible spectra
橢偏測試分析表明： cu （ vol15 ） mgf _ 2 、 cu （ vol20 ） mgf _ 2和cu （ vol30 ） mgf _ 2樣品的消光系數k曲線中出現了反映復合金屬陶瓷體系吸收的由cu金屬顆粒表面等離子體共振引起的吸收峰，峰位分別為581nm 、 589nm和606nm ，呈現紅移，這些與紫外-可見光譜測試結果相一致；此外， cu - mgf _ 2復合納米金屬陶瓷薄膜光學常數的實驗值與考慮尺寸效應修正過的mg理論值總體上符合得很好。 -
As the position, intensity and width of the plasma resonance absorption peak are concerned, we find that maxwell - garnett and ping sheng theories are applicable for the cermet films with low metal volume fraction, while bruggeman theory fits better than maxwell - garnett theory for au - mgf2 films with high metal volume fraction
就金屬顆粒表面等離子共振引起的吸收峰的峰位、強度和峰形而言，對低金屬組分的納米金屬陶瓷薄膜光學常數的計算， maxwell - garnett和pingsheng要比bruggeman理論結果好。 -
On the other hand, the microscopic principle of surface plasma resonance is explicated. the device, parameters, factors and the concrete applications of the prism spws are studied
其次討論了棱鏡表面等離子體波傳感器的設計、參數、影響其特性的因素以及棱鏡表面等離子體波傳感器的具體應用。
分享友人