ultra x-ray 中文意思是什麼
ultra x-ray
解釋
宇宙射線-
Contribute a little to either ultra-violet astronomy or x-ray astronomy.
所以氣球攜帶的儀器對紫外線天文學或Ｘ射線天文學的貢獻是不大的。 -
With the very low water to cement ratio, rpc has ultra - high strength high ductility and low permeability. in this paper, the compressive strength of rpc can reach to a high point with the number approximately 135mpa. as illustrated from the study results, we can approve some fundamental conclusions : there are big effects on rpc with deferent kinds and properties of raw materials and deferent curing conditions ; stress - strain curve shows the process of destroy with rpc samples ; x - ray diffraction analysis indicates that heat treatment at temperatures 90 accelerate the hydration of rpc sharply, therefore, mechanical and microstructural properties of rpc are highly dependent on heat treatment ; it is believed that rpc materials have excellent resistance to chloride permeability ; during the heat treatment, the shrinkage of rpc developed quickly because of chemical reactions ; the rpc with slag mostly has the advantage of rpc without slag about resistance to solutions corrosion
研究結果表明：通過對rpc各組分摻量變化的研究，可以找到rpc的最優配合比；試件成型后的熱養護制度對rpc的性能影響巨大； rpc的抗壓應力?應變曲線可以反映出試件受破壞時微裂紋的擴展情況，剛纖維的摻入可以大幅改善rpc的韌性； rpc在成型后存在較大的收縮，而其中的化學收縮要遠遠大於乾燥收縮； rpc具有很強的抗氯離子滲透性能，漿體的密實度很高；通過x射線衍射實驗，可以發現rpc的膠凝體中ch晶體已經幾乎不存在，膠凝體主要由c - s - h凝膠和未水化水泥顆粒組成；在抗溶液侵蝕的實驗中，摻礦渣rpc的抗溶液侵蝕性能在絕大多數情況下要好於不摻礦渣試件，酸、堿溶液和浙江工業大學碩士學位論文摘要一些鹽溶液都會對rpc的結構產生侵蝕作用，但是機理各有不同。 -
With the furthermore development of ultra thin film technology, soft x - ray multilayer mirrors was applied in many fields, such as astronomy, microscope technology, euv lithogrphy, x - ray laser, icf diagnosis and so on
隨著軟x射線超薄膜制備技術的不斷發展，軟x射線多層膜反射鏡已在多個領域中投入研究與應用，如天文學、生物醫學顯微鏡、極紫外投影光刻技術、 x射線激光、高溫等離子體診斷等等。 -
In this paper, transparent conducting zno thin films doped with al have been prepared by sol ? gel method, which were characterized by x - ray diffraction, atomic force microscopy and ultra - violet spectrometer
因此， zno : al薄膜逐漸成為ito薄膜的最佳替代材料，被廣泛的應用於光電顯示、太陽能電池和熱鏡等領域中。 -
In succession, tini thin film is deposited on single - crystal silicon substrate using optimized parameters utilizing sputtering, and its transformation temperature ( a * ) is 72 ? indicated by dsc curve after being annealed in an ultra - high vacuum ( uhv ) chamber. in addition, the composition of the silicon - based tini film was analyzed by an energy dispersive x - ray spectroscopy ( eds ), and the ti content in the film is approximately 51at %
按照改進的工藝參數，在單晶硅襯底上濺射-淀積了tini薄膜，並進行了超高真空退火， dsc法測得其馬氏體逆相變峰值溫度為72 ，利用能譜分析（ eds ）技術測得其ti含量約為51at ，通過對非晶tini薄膜與單晶硅襯底之間的界面進行eds及x射線衍射（ xrd ）分析，發現在用大功率（ 2000w ）直流磁控濺射法制備tini薄膜過程中，存在ti 、 ni與si的雙向擴散，發生了界面反應，並有三元化合物ni _ 3ti _ 2si生成。
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