等離子蝕刻機 的英文怎麼說
中文拼音 [děnglízishíkèjī]
等離子蝕刻機
英文
plasma chromatography- 等 : Ⅰ量詞1 (等級) class; grade; rank 2 (種; 類) kind; sort; type Ⅱ形容詞(程度或數量上相同) equa...
- 離 : Ⅰ動詞1 (離開) leave; part from; be away from; separate 2 (背離) go against 3 (缺少) dispens...
- 子 : 子Ⅰ名詞1 (兒子) son 2 (人的通稱) person 3 (古代特指有學問的男人) ancient title of respect f...
- 蝕 : Ⅰ動詞1. (損失; 虧耗) lose 2. (腐蝕) erode; corrode Ⅱ名詞(天體現象) eclipse
- 機 : machineengine
- 離子 : [物理學] ion
- 蝕刻 : [電學] [冶金學] etch; etching
-
Hardware and software design for the inductively coupled plasma etching machine " s system are also presented
介紹了plc控制等離子體刻蝕機的硬體系統和軟體系統的設計。The theory of ion - beam etching and ion sources are reviewed. the classification of ion - beam etching are introduced. according to the mechanism that ion sputtering leads to faceting, trenching, reflection and redeposition, some relative solutions are put forward
綜合敘述了離子束刻蝕技術和離子源的工作原理,簡單介紹了離子束刻蝕的分類,闡述了離子束刻蝕的物理濺射效應導致的刻面,開槽,再沉積等現象的產生機理及解決辦法,分析了kaufman離子源進行ribe的可行性及出現的問題。Rf plasma system 9200 is a barrel - type batch stripping system with optional high temperature capabilities for photoresist removal, nitride etch, and other cleaning applications in semiconductor and mems fabs
射頻等離子體9200是桶式爐脫模體,擁有可控制的高溫系統可去除光阻材料、氮化物蝕刻和半導體與微型機電系統等方面的清洗功能
分享友人