薄膜緻密化 的英文怎麼說

中文拼音 [bómózhìmìhuà]
薄膜緻密化 英文
thin film densification
  • 薄 : 名詞[方言] （浮萍） duckweed
  • 膜 : 名詞1. [生物學] （像薄皮的組織） membrane 2. （像膜的薄皮） film; thin coating
  • 密 : Ⅰ名詞1 （秘密） secret 2 [紡織] （密度） density 3 （姓氏） a surname Ⅱ形容詞1 （距離近; 空隙小）...
  • 薄膜 : thin film; film; diaphragm
  1. When compared with pvd, cvd, fad film is dense, flat and lubricous because of 100 ionization rate of sediment after magnetic filtering without any large granule. moreover, it has good corrosion resistance and is not easy to be removed

    與pvd cvd技術比較，由於磁過濾后沉積粒子的離化率為100 ，並且沒有大顆粒， fad形成的薄膜非常緻密和平整光滑，抗腐蝕性能好，且與機體的結合良好不易脫落。
  2. According to the feature that deformation resulted from water absorption and mildew appear mainly on the rabbet surface of ccf, this paper adopts rsst to spray a special waterproof sealant on rabbet surface of ccf, so that the sealant can get into fiberboard to certain extent by means of capillarity and penetration, blockage the holes between fibers and capillary, cut up passage of water and change the properties of soakage and sorption to water in capillarity and fiber. at the same time, solidified sealant can form a compact waterproof pellicle on rabbet surface so as to prevent water and humidity from fiber ' s expansion and mildewing

    針對吸水變形、霉變主要發生在地板企口表面的特徵，採用企口表面全封閉法，在復合強化地板企口表面噴塗特殊的防水封閉劑，使其依靠毛細管作用及滲透作用進入板內一定深度，堵塞木纖維之間的空隙及毛細孔通道，截斷水分傳遞的渠道，並改變毛細孔壁及纖維的表面性質以不利於水的浸潤與吸附，同時其固化后能在企口表面形成一層緻密的憎水薄膜，防止水分、濕氣從企口侵入板內引起木纖維膨脹變形、發霉等現象。
  3. The chemical compositions of sei films formed on the interfaces of a3000 samples in different electrolytes during the first charging process are mainly li2co3 and lioco2r, but their textures are different. the sei films formed in ec - based electrolytes are thin and compact, which can prevent the solvated lithium ions from cointercalating between two graphene layers of the graphite crystallites effectively, therefore samples a3000 have small irreversible capacities and good compatibilities with this kinds of electrolytes. however, the sei films formed in pc - based electrolytes are thick but defective, which could not effectively prevent solvated lithium ions from intercalation, therefore sample a3000 shows large irreversible capacities in pc - based electrolytes and bad compatibilities with this kind of electrolytes

    A _ （ 3000 ）試樣在六種不同的電解液中，首次充電過程中所形成的sei膜，其化學組分均為碳酸鋰和烷基碳酸鋰，但在ec基電解液中形成的sei膜薄而緻密，可以有效地阻止溶劑化鋰離子插入石墨層間，不可逆容量少，表現出與a _ （ 3000 ）試樣有良好的相容性；在pc基電解液中形成的sei膜厚，且有缺陷，不能有效地阻止溶劑化鋰離子嵌入試樣中石墨微晶的層間，不可逆容量大，與a _ （ 3000 ）試樣的相容性極差。
  4. The results indicate that ( a ) before heat treatment, with the increasing of substrate temperatures, content of lower valency ( tij + ) decreases, the stoichiometric proportion of o / ti in all samples is about 2 ; the films have amorphous incompact columnar fiber structure, and with the increasing of substrate temperature, the size of columnar fiber increases ; the films have good hyalescence in visible range and great absorbability at the wavelength of 350nm ; optical constants of the films are calculated from the transmittance spectrums in visible range by mathematical analysis of the orders of interference, the results show that the refractive ind

    研究結果表明， （ a ）熱處理前，隨著基片溫度的增加，薄膜中的低價氧化鈦含量逐漸減少，化學計量比趨于o ti = 2 ；薄膜具有非晶態不緻密的柱狀纖維結構，柱狀纖維的尺寸隨基片溫度的升高而增加;薄膜在可見光范圍內透明，在波長為35onzn時嚴重吸收，利用干涉級次法分析了薄膜的光學常數，結果表明，薄膜的折射率隨基片溫度的升高而增加，根據計算結果得到了tioz薄膜在不同基片溫度下的折射率色散曲線。
  5. Sem results imply that the surface of thin films deposited by chemical bath method is correlate to the reaction conditions. surface of sns thin films deposited by chemical bath method are coarse than thin films deposited by chemical bath with ultrasonication method and successive ionic layer adsorption and reaction method

    Sem結果顯示用常規化學浴方法所制備的薄膜樣品的表面形貌與反應條件有關，而用超聲波輔助化學浴和連續離子反應法制備的薄膜樣品的表面較之常規化學浴方法所得到的薄膜樣品表面晶粒細小均勻，緻密平整。
  6. The growth of epitaixal films with desired crystalline orientation and smooth surface plays a key role in these applications

    因此，制備單晶、表面平整、緻密的外延薄膜是實現氧化鋯薄膜應用的關鍵。
  7. The one deposited at 300 substrate temperature owns denser crystallites. during the annealing process, with the increasing of annealing temperature, the crystallites become bigger, and crystalline phase begins to transfer. when the annealing temperature gets to 800, tio2 transfers to rutile structure completely

    （ 2 ）常溫下制備的tio _ 2薄膜是無定型的， 300濺射薄膜表面有緻密的晶粒，熱處理溫度升高，晶粒變大，晶相開始轉化， 800退火tio _ 2完全轉化為金紅石結構。
  8. On the basis of study on structure and mass transfer, ideal model of membrane structure was built up, in which skin layer should be as thin as possible ensure resisting water to pass though membrane ; finger pore should be as long as possible in the membrane ; proper pore size ; loose sponge tissue

    首先對利用相轉化法制備的微孔膜形態結構進行研究，確定傳導阻力較小的理想結構模型，緻密層在能阻止微孔被浸潤的情況下盡可能薄；指狀孔在膜厚方向所佔比例盡可能大；孔徑大小適宜；海綿狀組織結構疏鬆。
  9. Having been treated at variable temperature in atmosphere, we can get the conclusions : ( 1 ) treated at 300, there are little diffusion coefficients between cu and cr ; ( 2 ) treated over 500, cr and cu diffuse into each other evidently. cu film oxidizes and there are cracks in cr film

    得到以下結論：在300oc處理溫度下， cr 、 cu之間的相互擴散小， cr膜緻密， cu膜沒有顯著的氧化，能夠滿足薄膜導帶的要求；但是升高溫度至500oc以上， cr 、 cu膜之間的擴散加劇， cr膜表面出現裂紋， cu膜被氧化。
  10. Prepared technical parameters were optimized by l9 ( 34 ) experiment analysis. a unique method for cleaning and drying of substrate - cleaning used by scour, drying used by infrared light was fished out by large numbers of experiment. chemical mechnism of zno thin film prepared by sol - gel technique was discussed by dta for the first time. by the measurements of sem, xrd and uvs, the thin film was analysed. the result proved that the thin film with strongly preferred orientation of c - axis perpendicular to the substrate surface which surface was homogenous, dense and crackfree was the crystalline phase of hexagonal wurtzite. the thin film was composed of plentiful asteroidal crystal which crystal dimension approximately 10 30nm. the average transmittance of thin film in visible region was above 90 %. the results of measurements else also proved that the thickness of single dip - coating was 75 240nm, this films resistivity was found to be 3. 105 102 3. 96 105 ? cm. the thickness and resistivity of thin film influenced by dope - content, withdrawal speed, pre - heat - treatment, anealing were reseached respectively

    利用xrd 、 sem以及uvs光譜儀等分析方法對薄膜進行了研究，結果顯示，所制備的薄膜為六方纖鋅礦型結構，具有高c軸擇優取向性；表面均勻、緻密，薄膜材料由許多星狀晶粒組成，晶粒尺寸大約為10 - 30nm左右；薄膜可見光透過率平均可達90 % ；對薄膜厚度以及電學性能進行了測定后發現：單次鍍膜厚度約為75 - 240nm ， al ~ （ 3 + ）離子摻雜型氧化鋅薄膜的電阻率在3 . 015 102 - 3 . 96 103 ? cm范圍內；分別研究了摻雜濃度、提拉速度、預燒溫度、退火溫度等工藝參數對薄膜厚度和電阻率的影響。
  11. The resulted films were densely packed uniform amorphous films with substantial overlap between adjacent si02 layers, and can serve the function as antireflection coatings. colloidal ti02 particles of 3 ~ 4nm in diameter were prepared using tetra - h - butyl titauate as precursor, and composite multilayer films of pss / tio2 were electrostatically self - assembled

    二氧化硅膠體與聚合物pdda的自組裝多層復合薄膜為均勻、緻密的非晶態膜，復合薄膜內存在層間穿插的現象，薄膜表現出均質單層光學塗層的特性並具有增透作用。
  12. The results show that the organic residual has been decomposed completely and the crack - free films can be obtained after heat - treated higher 450

    結果表明， 450處理后，復合體系內的有機殘留物氧化完畢，形成的薄膜表面緻密。
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