蝕刻試驗 的英文怎麼說

中文拼音 [shíshìyàn]
蝕刻試驗 英文
etch test
  • : Ⅰ動詞1. (損失; 虧耗) lose 2. (腐蝕) erode; corrode Ⅱ名詞(天體現象) eclipse
  • : 名詞(古代占卜用的器具) astrolabe
  • : 動詞1. (察看; 查考) examine; check; test 2. (產生預期的效果) prove effective; produce the expected result
  • 蝕刻 : [電學] [冶金學] etch; etching
  • 試驗 : trial; experiment; test
  1. Standard test method for scaling resistance of concrete surfaces exposed to deicing chemicals

    暴露于防凍化學藥品的混凝土表面抗性的標準方法
  2. The processes include the deposition of the waveguide film, the design and fabrication of the mask pattern, the lithography, the metal coating with a magnetic sputtering, the lift - off process for the metal mask, the dry deep etching by icp, the slicing of the wafer, the polishing of the cutting edge, the fiber - to - waveguide alignment and at last, the performance testing. some edg chip samples are fabricated

    對設計好的集成波導器件,本論文設計並了器件的製作的全部工藝,包括波導薄膜的沉積,掩模的設計製作,光,濺射金屬薄膜,剝離法製作金屬掩模,干法深,矽片切割,端面磨拋,波導對準和性能測
  3. With metal fatigue in material mechanics, this paper deduces the limestone fatigue curve of longmen grottoes by means of marble s one within the error permission. by the experiment elects the crucial factors of current vibration environment in longmen grottoes, the author contrasts the result of the experiment with its fatigue curve referred above and analyses the fatigue effect of longmen grottoes. finally, it is pointed out that after longmen grottoes have being suffered weathering and water - erosion more than 1500 years, the vibration environment is becoming an crucial factor leads to fatigue effect, especially in those weak surface carvings just like the crossings of several rifts, serious weathering places, etc

    借鑒材料力學中金屬疲勞破壞的研究手段,在誤差允許范圍內用大理巖疲勞曲線推導出門石窟石灰巖疲勞曲線。通過對石窟實際振動環境中典型要素的抽取和振動,將結果與疲勞曲線進行對比,分析了門石窟的疲勞破壞效應。文章指出,在經歷了1500多年的風化和流水溶后,振動環境已成為導致門石窟某些薄弱點如多條裂隙交叉點嚴重風化酥解的壁面雕品等產生疲勞破壞的重要誘發因素。
  4. In order to make integration of theory with practice, a lot of experiments have been done. mask - making technology, photoetching and wet - etching processes have been optimized. the author also presents the application and commercial value of silicon v - groove arrays

    在實踐上,對製作工藝積極探索,提出新的制備硅掩蔽膜的工藝方案,對影響光質量的因素深入分析,摸索出適用於v型槽的各向異性濕法腐的腐液配方,獨立優化設計了製作硅v型槽的相關工藝,製作出高質量的硅v型槽。
  5. Standard methods of analysis of sulfochromate etch solution used in surface preparation of aluminum

    鋁表面準備用硫代鉻酸鹽溶液分析的標準方法
  6. Testing of materials for semiconductor technology - determination of etch rates of etching mixtures - part 3 : aluminium, gravimetric method

    半導體技術.混合劑浸率測定.第3部分:鋁.測
  7. Based on this simulation method, the following novel designs are developed : 1, the two - stigma design, which can reduce the aberrations and improve the imaging of the grating ; 2, the flat - field design, which can omit the output waveguides and make an edg easier tc fabricate ; 3, the passband flattening design, which can relax the requirements on wavelength control for lasers and filters in a wdm system ; 4, the reduced back - reflection design, which guarantees very little reflection light back into the input channel and improves the feature of the return loss

    本論文以用於光通信中的平面集成衍射光柵為研究對象,具體的分析了的它的工作原理和設計思想,並給出了設計中的經和方法。器件設計后需要進行性能計算和模擬以減小復雜的集成光器件製作,本論文描述了計算衍射光柵比較準確的模擬方法,其結果能夠很好的接近實際情況。基於這樣的模擬計算方法,本論文提出了改進衍射光柵設計的幾種方法: 1
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