襯底偏置 的英文怎麼說

中文拼音 [chèndepiānzhì]
襯底偏置 英文
substrate bias
  • : Ⅰ動詞1 (在裏面托上一層) line; place sth underneath 2 (陪襯; 襯托) set off Ⅱ名詞(襯在裏面的附...
  • : 底助詞(用在定語后, 表示定語和中心詞之間是領屬關系, 現在多寫作「的」)
  • : Ⅰ形容詞1 (不正; 歪斜) inclined to one side; slanting; leaning 2 (只側重一面) partial; prejudi...
  • : 動詞1. (擱; 放) place; put; lay 2. (設立; 布置) set up; establish; arrange; fix up 3. (購置) buy; purchase
  1. The low insertion loss is achieved by optimizing the transistor widths and bias voltages, by minimizing the substrate resistances, and by dc biasing the transmit and receive nodes, which decreases the capacitances while increasing the p1db

    通過優化mosfet的柵寬及電壓可以降低插入損耗。在版圖設計中通過增加接觸降低電阻,從而減小插入損耗。另外,為接收和發送端提供直流可以降低p1db 。
  2. By increasing the h2 dilution ratio, it is found that atomic hydrogen can selectively etch amorphous phase and stabilize crystalline phase. from the study on the distance from substrate to catalyzer, choosing a proper distance can ensure the gas fully decomposed, while a relatively low substrate temperature can cause the nanocrystalline particles to lose mobility and keep their sizes. the pre - carbonization process can enhance the nucleation density and make the growth of high quality nanocrystalline p - sic films much easier

    實驗結果表明:隨著工作氣壓的減小,薄膜的晶粒尺寸有所減小;通過提高氫氣稀釋度,利用原子氫在成膜過程中起的刻蝕作用,可以穩定結晶相併去除雜相;選擇適當的熱絲距離能保證反應氣體充分分解,又使具有較高的過冷度,是形成納米薄膜的重要條件;採用分步碳化法可以提高形核密度,有利於獲得高質量的納米- sic薄膜;施加負壓可以明顯提高表面的基團的活性,因負壓產生的離子轟擊還能造成高的表面缺陷密度,形成更多的形核位
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