電子曝光 的英文怎麼說
中文拼音 [diànzipùguāng]
電子曝光
英文
electronic exposure- 電 : Ⅰ名詞1 (有電荷存在和電荷變化的現象) electricity 2 (電報) telegram; cable Ⅱ動詞1 (觸電) give...
- 子 : 子Ⅰ名詞1 (兒子) son 2 (人的通稱) person 3 (古代特指有學問的男人) ancient title of respect f...
- 曝 : 動詞[書面語] (曬) expose to the sun
- 光 : Ⅰ名詞1 (照耀在物體上、使人能看見物體的一種物質) light; ray 2 (景物) scenery 3 (光彩; 榮譽) ...
- 電子 : [物理學] [電學] electron
- 曝光 : exposure
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Different from the inflexible electronic news clipping workshop, the xinmo provides both the general clippings and the original clippings ( tear sheets ) and they help you to monitor your firm and your competitors ' exposure rate in the domestic media, thus effectively and accurately adjust your public relations and advertising strategy
有別于機械化的電子剪報模式,本公司備有一般及原稿剪存服務,有利您仔細無遺地密切監察貴公司與對手在國內媒介的曝光率,從而有效並準確調整公關廣告策略。General specification of electron beam exposure system
電子束曝光機通用技術條件Unfortunately, shuek s cell number is similar to one of them. she becomes the " telephone 601 ", and receives dozens calls everyday. to escape from the annoyance, she decides to change her cell number, but a guy called man rings to her and changes her decision
600明星電話曝光后,易淑的號碼成了「第601個電話」 ,一下子收到無數騷擾電話,就在好不勝其煩要換電話的時候,接到了一個男生曉文打來的電話。Electron beam exposure apparatus
電子束曝光機In this article we briefly introduce the e - beam lithography techniques, and we describe our experiences in the modification of an sem into an e - beam writer
以電子顯微鏡改裝成的簡易電子束曝光機在性能上雖比不上設計精良的專業化電子束曝光機,但在很多情況下可以符合研發工作的要求,可說是經濟實用的方案。A whole scheme of a new kind of digital pattern generator of the e - beam lithography system is given, including system function, hardware and software design
本論文介紹了掃描電子束曝光機圖形發生器的總體方案、系統設計、硬體實現和軟體編程等,提出了一套完整的圖形發生器硬體方案,並完成了圖形發生器介面的設計。Konica minolta s dry micro - toning system, optical technology and electronic automatic exposure control system combine to ensure superior image quality print after print
結合柯尼卡美能達的乾性微細碳粉系統、光學技術以及電子自動曝光控制系統,即使經過重復列印的影像亦具有相當高的質素。Variable shaped electron beam exposure system
可變電子束曝光裝置This thesis work has researched the fabrication technics of photonic crystal defect waveguide with air - bridge structure and collecting waveguide ; suggested using uv - lithography and wet etching to fabricate traditional waveguide, after that, using eb - lithography and dry etching to fabricate photonic crystal holes, so can reduce the fabrication cost by a big range ; designed the moulding board, which can fabricate the air - bridge structure and is convenient for recognizing position in eb - lithography ; the structure consisted of traditional waveguides and etching grooves are fabricated on soi successfully, then an successful eb - lithography is realized on the structure, the defect waveguide collected with the traditional waveguide quite well ; used the etching grooves to do the sacrificial layer etching experiment, which grounded etching sacrificial layer by photonic crystal holes in next step
提出採用紫外光刻工藝製作傳統波導結構之後,通過電子束曝光和干法刻蝕製作光子晶體小孔的工藝方案,大幅度減低了製作成本;設計出可形成空氣橋結構、並且適用於電子束曝光位置識別的光刻模板,在soi材料上成功製作出帶有空氣橋刻蝕預留槽以及接續光波導的結構,在該結構上成功實現了光子晶體帶隙波導的電子束曝光,帶隙波導與接續光波導位置接續良好;最後利用預留槽進行了刻蝕犧牲層的實驗,為下一步利用光子晶體小孔刻蝕犧牲層形成空氣橋結構打下了基礎。On this condition, based on the experimental results gotten by the microwave absorption dielectric - spectrum measure technique, the photographic process at room temperature in agcl cubic microcrystals doped with k4fe ( cn ) 6 is simulated. through the optimization of simulating parameters, not only the cross - section and trap depth of the shallow electron trap induced by the dopant, but also the optimal doping amount is obtained
在此基礎上,以微波吸收介電譜檢測技術的實驗結果為依據,對摻有k _ 4fe ( cn ) _ 6的agcl立方體微晶在室溫下的曝光過程進行了模擬,通過調節模擬參數,不但計算出由摻雜劑引入的淺電子陷阱的俘獲截面和陷阱深度,而且得到了這種摻雜乳劑的最佳摻雜濃度。Photography - electronic flash equipment - automatic control of exposure
攝影.電子閃光設備.曝光的自動控制Exposure mode : ee
曝光模式:電子曝光Us federal emergency management agency director michael brown, in a recently revealed email to a colleague on the morning of hurricane katrina
美國聯邦緊急措施署署長邁克爾?布朗在一封最近剛被曝光、于「卡特里娜」颶風來襲當天早晨發給一位同事的電子郵件中這樣寫道。Not only products and service on windows, cooling and conditioning, but also fujitsu, electronic or units stand as brand names of impromat klima spol. s r. o. beyond that one can receive all desired factual information - among other things also on output, air, system and multi - by email or fax ( + 420 ) 577218476 from the enterprise
是一家誠信的、高效能的生產商和服務商,該公司提供新型的、專門的產品,例如車身結構,裝備,曝光裝置,富士通,國際商用電腦公司,修理處,賣、出售,西門子公司。Although a simply constructed scanning - electron - microscope ( sem ) - based e - beam writer can not be on a par with the commercially available multi - million - dollar e - beam writers, it offers a cost - effective solution for the research and development laboratories
在新元件研發過程中,往往希望能在短時間內不需光罩就可以作成奈米結構,電子束曝光技術提供了一套很適合這目的的解決方案。Electron - beam photo - resist exposure
光致抗蝕劑的電子束曝光This paper introduced the develop level of electron beam lithography in the world and the techniques used in pattern generators
論文首先簡要介紹了國內外電子束曝光技術的發展水平和圖形發生器的工作原理。分享友人