etching paper 中文意思是什麼

etching paper 解釋
雕刻用
  • etching : n. 1. 蝕刻法；蝕刻（銅）版畫；蝕鏤術。2. 蝕刻畫，蝕刻版，蝕刻版印刷品。
  • paper : n 1 紙；裱墻紙。2 報紙，報。3 收據；債券；證券；票據；匯票；鈔票（＝paper money）。4 〈pl 〉身份...
  1. In this paper, the flow pattern defects ( fpds ) were revealed by secco etchant and their shape, distribution on wafer and tip structure were studied in details by optical microscope and atomic force microscope ( afm ). the relationship between etching time and the tip structure of fpds was also discussed. furthermore, by studying the effect of rapid thermal annealing ( rta ) on the density of fpds in ar, the annihilation mechanism of fpds was discussed in this paper

    本文將cz硅單晶片在secco腐蝕液中擇優腐蝕后，用光學顯微鏡和原子力顯微鏡對流動圖形缺陷（ flowpatterndefects ， fpds ）在矽片中的形態、分佈及其端部的微觀結構進行了仔細地觀察和研究，並討論了腐蝕時間對fpds缺陷端部結構的影響；本文還通過研究ar氣氛下快速退火（ rapidthermalannealing ， rta ）對fpds缺陷密度的影響，初步探討了fpds的消除機理。
  2. The composition and characteristic of liquid photo imageable etching resist ink is introduced briefly, and the perfect blueprint is also described in this paper

    綜述了液態光致抗蝕油墨的組成、特性及其誘人的發展前景。
  3. In this paper, the dislocation in 50mm cz sapphire crystal had been observed by chemical etching with metallograph and sem

    本文用化學腐蝕法對cz法生長的50mm藍寶石單晶中的位錯和缺陷進行了分析研究，並採用金相顯微鏡和sem對其進行了顯微觀察和分析。
  4. This paper mainly aims at the strategic demands for large - aperture lightweight mirror proposed by high - tech development. its main research contents are : select material blank for lightweight mirror according to physical and chemical properties of optical glass ; analyze and calculate the deformation quantity of the mirror with finite element method ; design and optimize mirror body structure of 400 lightweight plane mirror and 450 lightweight spherical mirror, analyze glass cutting principle, design specisl - use grinding wheel structure, select reasonable technological parameters to implement the processing of weight reduction holes on 400 plane mirror ; analyze etching mechanism of hydrofluoric acid, look for the technological parameters such as the optimal acid concentration and etching time etc. ; eliminate the stress of weight reduction holes and micro - cracks on 400 lightweight plane mirror ; discuss the processing principle and

    本論文的研究主要是瞄準國家高技術對大口徑輕型鏡的戰略需求而開展的。主要研究內容是：根據光學玻璃的物理與化學性能，選擇輕型鏡坯材料；用有限元法對鏡子的變形進行分析、計算，找出變形規律，優化設計400mm輕型平面鏡、 450mm輕型球面鏡鏡體結構；分析玻璃切削原理，設計專用磨輪結構，選擇合理工藝技術參數，完成400mm平面鏡輕量化減重孔的加工；分析氫氟酸腐蝕光學玻璃機理，尋找最佳酸濃度、腐蝕作用時間等工藝參數，實現400mm平面鏡減重孔應力與微裂紋的消除；討論分離器加工原理和工藝技術特點，完成400mm平面輕型鏡面形加工。
  5. Abstract : in this paper, the design of the sense organ of the silicon miniature inertial meter is presented. the approving structure of the sense organ is fulfilled by the fabrication techniques of laser processing and chemical etching, laser fibre optic vibration is used to test the vibration characteristic of the suspensi on beams

    文摘:設計了硅微型慣性加速度計的敏感頭並應用激光加工和化學蝕刻相結合的工藝方法製造得到了滿意的結構，應用激光光纖測振儀檢測了懸臂梁振動特性。
  6. In this paper, the design of the sense organ of the silicon miniature inertial meter is presented. the approving structure of the sense organ is fulfilled by the fabrication techniques of laser processing and chemical etching, laser fibre optic vibration is used to test the vibration characteristic of the suspensi on beams

    設計了硅微型慣性加速度計的敏感頭並應用激光加工和化學蝕刻相結合的工藝方法製造得到了滿意的結構，應用激光光纖測振儀檢測了懸臂梁振動特性。
  7. As the isotropic etching being related to the resistivity of the si material and combining the practical need of the solar cell production, the paper emphasis on the etching of the multicrystal si with resistivity of about 1. cm. the results : ( 1 ) reflectance characteristics the appropriate etching solutions has led to a reduction of the total integrated reflectance to 5. 7 %, which is quite comparable with conventionally pretextured si surface covered by a double layer arc

    由於以hf + hno _ 3 + h _ 2o為溶液各向同性腐蝕與矽片的摻雜濃度有關，結合生產太陽電池的實際需要，本文重點研究了電阻率1 . cm左右的多晶硅的腐蝕情況，結果如下： （ 1 ）反射特性在適當的hf + hno _ 3 + h _ 2o溶液中制備的多晶硅電池的絨面，其反射率降到了5 . 7 。
  8. This paper studies the application of inductively coupled plasma ( icp ) technology to the etching compound semiconductor insb - in film. by means of single probe and double probe, the ion density and electron temperature of chamber ( 30mm and 50mm in height respectively ) under varied process condition were diagnosed. the spatial distribution of the axial position of the two parameters and the varied curve that the two parameters varies with the power and air pressure are obtained

    利用單探針和雙探針診斷30mm高反應室和50mm高反應室在各種工藝條件下的離子密度和電子溫度，得到這兩個參數在反應室軸向位置的空間分佈、隨功率和氣壓的變化曲線、頂蓋接地和反應室體積對它們的影響，結果表明離子密度為10 ~ 8 10 ~ （ 10 ） cm ~ （ - 3 ） ，電子溫度在4 10ev之間；當頂蓋接地時，該處的等離子體密度明顯大於不接地；在同樣條件下， 50mm高反應室內的離子密度明顯大於30mm高反應室。
  9. Meanwhile, the paper gives a detailed discussion on the coupling principles and also the fabricating processes of these three traditional fiber couplers. the hf etching method to fabricate the coupler is studied

    同時，本文還具體介紹了上述三種傳統的光纖耦合器製作方法，即熔融拉錐法、氫氟酸腐蝕法和邊研磨法製作光纖耦合器的原理以及製作工藝。
  10. Meanwhile, the paper also discusses some methods to improve the polishing processes, i. e. using the liquid - drop method to monitor the remaining width of the cladding in time. finally, the feasibility of the three kinds of coupling method ? fbt, hf acid etching and the side - polishing are discussed and compared

    最後，對熔融拉錐法、氫氟酸腐蝕法和邊研磨法三種方法的可行性進行了分析與比較，得出一套比較適用於光纖竊聽的設計方案。
  11. A large number of attempt and painstaking experiment have been done in this paper according to existing project. we also do lots of chemical and electrochemical etching research in material of lab6, and find out three kind of methods to produce the field emitting cold cathode including reactive ion etching ( rie ) with oxygen, wet process etching and electrochemical etching. through produce some field emitting cold cathode single tip including lab6 field emitting cold cathode, molybdenum field emitting cold cathode, tungsten field emitting cold cathode, tungsten rhenium field emitting cold cathode, molybdenum covered with lab6 film field emitting cold cathode

    而且，目前可借鑒的參考文獻較少，圍繞著前人做過的方案，本文做了大量工作，在已有文獻介紹的基礎上，結合原有的理論和實踐基礎，摸索出了包括高溫氧作用反應離子（ rie ）刻蝕法、濕法腐蝕法和電化學腐蝕法在內的三種制備工藝，運用電化學腐蝕工藝成功制備了單尖的六硼化鑭場發射冷陰極尖錐、鉬場發射冷陰極尖錐、鎢場發射冷陰極尖錐、鎢錸合金場發射冷陰極尖錐以及有六硼化鑭薄膜覆蓋的鉬場發射冷陰極尖錐。
  12. This paper discusses the surface etching of polyester thread through application of plasma and alkali deweighting to enhance the size adhesion to polyester thread and improve the abrasion - resistance of the sized polyester thread

    摘要探索了應用堿減量、低溫等離子體處理方法對滌綸股線表面進行刻蝕處理，以改善上漿前滌綸表面界面，增強漿液對滌綸股線的黏附性，提高上漿后滌綸股線的耐磨性的研究。
  13. We give some useful analyses and the computer simulations for the ion etching process. compared with the atomic force microscope ( afm ) scanning photograph of the etching surface, the theoretical results prove that these simulation analyses assure the precision required by this problem, so these mathematical models are reasonable and correct. the analysis method in this paper is useful to analyze etching process, and it can also afford some valuable reference to etching technology

    在本論文我們主要利用這個數學模型，對使用離子束刻蝕製作單臺階光柵的臺階與溝槽部分的表面面形隨時間的演變過程分別進行了計算機模擬分析，並通過把理論結果與在實驗中得到的刻蝕表面在原子力顯微鏡（ afm ）下拍攝的照片進行比較，結果說明這種模擬分析能夠保證對該問題分析所要求的精度，從而也證明了理論模型的合理性和正確性。
  14. Generally, the etching rate for different local surface is dependent of the local slope of the surface. in this paper, we call this < wp = 6 > phenomena quasi - direction effect. to reduce the difficulty, we use a mathematical model for the surface shape analysis in this paper

    為了減小分析的難度，本論文採用了一個有效的數學模型，分析了在刻蝕工藝中基底自身面形輪廓的曲線形狀對基底局部區域的刻蝕速率產生的影響，我們稱這種影響為準單向刻蝕效應，並通過對數學模型的理論分析和計算機模擬得出受此影響而產生的面形形狀，並將結果與實驗進行對比。
  15. In this paper, the development of micro - system is explained. the present research of binary optics and the main methods for shaping are described and some kinds of the methods of etching are compared

    本文闡述了微系統的發展過程，敘述了二元光學的研究現狀和二元光學的成型過程，比較了幾種不同的刻蝕過程方法。
  16. Based on silicon - piezoresistive method, the paper first gives the theory of array silicon piezoresistive pressure, acceleration sensor, and the design of its incorporated chip, microstructure and out - circuit. several key techniques of making array silicon piezoresistive pressure, acceleration sensor such as 1c technic, mems ( silicon - silicon direct bonding, anodic bonding, anisotropic etching ) is also studied. minuteness engine machining, anode bonding etc. in the paper there are three ways which are examine - form, curve simulanting, to carry out sensors non - linear self - emendating ; adopt the several curves approaching and curve simulating to achieve the aims of sensor error self compensation, fusion technology etc. therefore, it providing referenced values of ways and directions for sensor system directing on

    論文首先以硅壓阻效應原理為基礎，討論了陣列式硅壓力、加速度傳感器的設計原理，並對陣列式硅壓力、加速度傳感器中集成敏感晶元（壓力、加速度） 、總體結構和壓力陣列的信號處理電路進行了設計，在陣列式硅壓力、加速度傳感器的研製中，還研究了半導體平面工藝、大規模集成電路技術、微機械加工技術（硅硅鍵合、靜電封接、各向異性腐蝕）等關鍵技術的應用。
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