濺射系統 的英文怎麼說
中文拼音 [jiànshèxìtǒng]
濺射系統
英文
sputtering system-
Research of unbalanced magnetron sputtering system
非平衡磁控濺射系統的研究Zno thin films were deposited on silicon ( si ) and glass substrate by reactive radio frequency sputtering ( rf ) technique with zinc target in the mixed gas of ar ando2, and used zno buffer improving the quality of zno thin film. the effects of parameters on the thickness, composition, texture, morphology, optical properties and electrical properties of zno thin films had been systematically investigated by means of xrd, xps, sem, afm, pl and hall test system
採用x射線衍射（ xrd ） 、 x射線光電子能譜（ xps ） 、掃描電子顯微鏡（ sem ） 、原子力顯微鏡（ afm ） ，光致發光譜（ pl ）和霍爾效應測試技術系統研究了濺射工藝和退火工藝對zno薄膜的厚度、成分、織構、表面形貌、光學性能和電學性能的影響規律。Boron nitride ( bn ) thin films were deposited on si substrates using the conventional radio - frequency ( rf ) sputtering system, with hexagonal boron nitride ( hbn ) target and working gas of argon ( or mixture of nitrogen and argon )
使用射頻濺射（ rf ）系統，靶材為燒結的六角氮化硼（ hbn ） ，工作氣體為氬氣（或氬氣和氮氣的混合氣） ，在硅襯底上沉積氮化硼薄膜。The testing technique and system of the newly developed, miniaturized sputtering ion pump with low pumping speed has been developed in accordance with the standards formulated by machine industry
摘要本文介紹了小抽速微型濺射離子泵的性能測試系統和參考機械行業標準確定的測試方法，探討了測量結果誤差來源。In this paper, fluorocarbon films are deposited on polyetylene terephalate ( pet ) substrate by radio frequency magnetron sputtering polytetrefluoroethylene ( ptfe ) targets to examine the effect of discharge condition on the properties and mechanism of deposited films. the effect of the power, pressure and treating time on morphology is observed by means of scanning electron microscopy ( sem ) and atom force microscopy ( afm ). it is found that the fluorocarbon film particles distribute more uniform and join tightly with increasing power, the surfaces of films become closer and denser as pressure increases
利用掃描電鏡（ sem ）和原子力顯微鏡（ afm ）研究了成膜機理以及cf膜的表面形貌，觀察了不同功率、壓力和時間下對氟碳膜表面形貌的影響，系統研究了氟碳膜表面結構隨功率和壓力的變化規律，發現功率提高使得氟碳膜顆粒分佈均勻，結合更加緊密，而提高壓力，氟碳膜的顆粒更加密集，並且濺射條件不同，粒子的形態、粒子間構成的介觀結構也不相同。A control system for the thickness of ion beam sputter ( ibs ) coating is introduced in this paper. the basic principle of ibs coating machine is discussed. this paper also gives the scheme of hardware and sofeware
本文介紹了離子束濺射鍍膜機膜厚控制的一種實用的系統，文中論述了離子束濺射鍍膜機的工作原理及鍍膜厚度控制系統的硬、軟體的實現方案。In the paper, the two - step approach, in which the deposition procedure was divided into two sections by decrease the substrate temperature or the bias voltage, was used in order to synthesize c - bn film by the conventional js - 450a rf system. the influence of process parameters for nucleation and growth of depositing c - bn was studied separately
本論文使用傳統的js - 450a射頻濺射系統利用兩步法（降溫降偏壓法）沉積立方氮化硼薄膜，分別研究了各工藝參數對立方氮化硼成核和生長的影響。Combined with special wettability properties, a - c films may have greater potential applications. in present thesis, a series of a - c films were prepared by magnetron sputtering technique on substrates as si ( 100 ) and glass, and the deposited processes were controlled to adjust the morphology of the surfaces of a - c films. to further obtain the desired wettability, surface chemistry compound of the lotus - like surfaces were plasma modified by optimized processes
本文採用磁控濺射系統在普通玻璃和單晶硅上獲得了具有不同表面形貌特徵的非晶碳薄膜，此外利用等離子體表面處理系統，通過改進工藝方法，優化工藝條件，對非晶碳薄膜表面化學組成進行調控，獲得了潤濕性能從超親水到超疏水范圍變化的表面。The c - bn thin films were deposited on si substrates using the conventional radio - frequency ( rf ) sputtering system. the c - bn / si thin film heterojunctions have been fabricated with doping into n - type ( p - type ) semiconductor by implanting s ( be ) ions into them. i - v curves of bn / si heterojunctions were obtained by the high resistance meter, c - v curves of bn / si heterojunctions were obtained by the c - v meter
使用rf射頻濺射系統，在si襯底上沉積氮化硼薄膜，用離子注入的方法在制備好的bn薄膜中分別注入s和be ，成功的制備了bn / sin - p和bn / sip - p薄膜異質結，用高阻儀測得bn薄膜表面電阻率和bn / si薄膜異質結的i - v曲線，用c - v儀測得bn / si薄膜異質結的c - v曲線。It is concluded that for cvd method the cubic phase content and adhesion are highly effected by the crystal lattice mismatch between c - bn and substrate materials, however, for sputter method the crystal lattice mismatch between c - bn and substrate materials affects the quality of c - bn thin films very little. 5 n - type doping of bn thin films and preparing of bn ( n - type ) / si ( p - type ) heterojunctions adding s into the mixture of argon and nitrogen used as working gas, we sputtered 1ibn target to deposit bn thin films so as to study the n - type doping of bn thin films, and bn ( n - type ) / si ( p - type ) heterojunctions were prepared
5實現了氮化硼薄膜的n型摻雜，成功制備出bn型）乃…型）異質結並且首次系統研究了其卜v和cv特性我們用射頻濺射法濺射六角氨化硼靶，在工作氣體氮和氮中混入s ，沉積氮化硼薄膜，以研究氮化硼薄膜的n型摻雜，並得到bnh型）侶i …型）異質結。The morphology of the sputter - deposited films were observed by scanning electron microscopy ( sem ) and atom force microscopy ( afm ). the effect of the power, discharged pressure, sputtering time and the ratio of ar / o2 on morphology has been studied
利用掃描電鏡（ sem ）結合原子力顯微鏡（ afm ）研究了的濺射膜的表面形貌及成膜機理，並系統研究了各工藝條件（放電功率、工作壓力、濺射處理時間、氧氬比等）對表面形貌的影響。In this study, on the base of the present status and future development of semiconductor materials for solar cells, we have carried out the work to compose film structures of si - based materials by theoretical analysis and experimental methods, which have potential application in modules of solar cells. the processing, features of microstructure and optical properties of the designed si - based thin films have been studied in detail by employing methods of xrd, sem, afm, tem, raman, ftir, uv - vis, pl, and ellipsometry spectroscopy ( se )
本文在全面總結目前太陽電池材料的研究現狀和其未來發展趨勢的基礎上，系統地從理論和實驗兩方面對應用在太陽電池板上的si基薄膜材料的結構進行了設計，用超高真空磁控濺射儀研究了其制備工藝，用了xrd 、 sem 、 afm 、 tem 、 raman 、 ftir 、 uv - vis 、 pl和橢圓偏光儀（ se ）等分析手段研究了薄膜的相結構、微觀組織特徵和其所具有的光性能。分享友人