蝕刻圖形 的英文怎麼說

中文拼音 [shíkètúxíng]
蝕刻圖形 英文
etch figure
  • 蝕 : Ⅰ動詞1. （損失; 虧耗） lose 2. （腐蝕） erode; corrode Ⅱ名詞（天體現象） eclipse
  • 圖 : Ⅰ名詞1 （繪畫表現出的形象; 圖畫） picture; chart; drawing; map 2 （計劃） plan; scheme; attempt 3...
  • 蝕刻 : [電學] [冶金學] etch; etching
  1. Metal & flexible stencil was etched by two positive graphics through two sides and the erodent was done in the direction of horizontal and perpendicularity

    金屬模板和柔性金屬模板是使用兩個陽性圖形通過從兩面的化學研磨來蝕刻的。在這個過程中，蝕刻不僅按設計的垂直方向進行，同時在橫向進行。
  2. The resolution of an etching process is a measure of the fidelity of pattern transfer.

    刻蝕工藝的解析度是圖形轉移保真度的量度。
  3. Electron-beam lithography with a novel multilevel resist structure defines the pattern.

    採用新型的多層抗蝕劑結構的電子束光刻來形成圖形。
  4. The design of manganin film and copper film were etched by the first time

    首次採用以半導體光刻的方法來刻蝕錳銅敏感薄膜和銅電極薄膜的圖形。
  5. When the two layers of sio2 with different refractive index are finished, the designed mask pattern is printed on the film by photolithography. after that, icp is performed for dry etching, then, the waveguide structures are obtained. at present, the rudimental graph of edg has been obtained

    兩層不同折射率的sio _ 2薄膜制備好之後，經過光刻、等離子體刻蝕（ icp ）的工藝步驟之後，形成了波導結構，初步製作出了器件的圖形。
  6. Theoretical and experimental research of minimum incidence angle of prism

    離子束刻蝕入射角對圖形側壁陡度影響的研究
  7. P - type silicon crystal plates have been adopted in the text, which are formed mask sio2 by heat - oxygenation. and figures are diverted by normal light etching technology

    本文採用p型單晶矽片，由熱氧化形成sio _ 2掩膜層，標準光刻工藝進行圖形轉移，用koh溶液濕法刻蝕製作倒四棱錐腐蝕坑列陣。
  8. The principle, theory, realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask - hologram mask - resist have been deeply investigated. an experimental system with total inner reflection wavefront conjugation holographic lithography using right angle prism and refractive index matching liquid is designed and built, and the experimental research is carried out

    對全息光刻的原理、理論、實現方法及傳統光掩模?全息掩模?抗蝕劑圖形傳遞機理進行了深入的研究，設計和建立了採用直角棱鏡和折射率匹配液的全內反射波前共軛全息光刻實驗系統，進行了實驗研究。
  9. Compared with the conventional chemical etching, laser assisted wet chemical etching can eliminate the effect of crystal orientation efficiently and fabricate more diversified etched pattern ; compared with the laser assisted gas chemical etching, the required condition for laser wet etching can be realized more easily and the operation can be simplified ; compared with the ion etching, it has advantages of no ion damage to substrate, avoiding over - etching and cost - effective

    半導體的激光誘導液相腐蝕與普通化學腐蝕相比，可以有效地消除晶體取向影響，製作出更加多樣化的腐蝕圖形;與激光誘導氣相腐蝕相比，其工藝條件更加容易實現，操作更加簡單;與干法離子刻蝕相比，對基片無離子損傷，過度腐蝕容易控制，成本低。
  10. Nuclear particle track - etched anti - counterfeit marking is a new weapon against fake products. the mark is manufactured by intricate high technology in state - controlled sensitive nuclear facilities which ensures that the mark can not be copied. the pattern of the mark is characterized by its permeability, and can be distinguished from fakes by using a transparent liquid ( e. g. water ), colored pen or chemical reagent. the technique has passed the official health safety examination and poses no danger of nuclear irradiation

    用核粒子照射塑料薄膜形成徑跡，再經化學試劑蝕刻和成像技術，得到由微米級微孔組成的圖案.這種圖案具有物質透過特性.用這種方法生產的核徑跡防偽標志，具備核尖端技術不易擴散，製作設備不易得到，產品用其他方法難以偽造，防偽識別簡單、快速、可靠等特點.此種標志已經通過放射性安全檢測，可以用於各種商品（包括食品）的包裝
  11. The reciprocal space map of x - ray difll - action for quantum - wires is simulated successfully. abundant structural intbrmation such as array period, geometric shape, etching depth and strain state, etc. for quantum wires are obtained

    模擬了量于線x射線衍射的二三維圖，得到更為豐富的樣品結構信息，例如周期，形狀，刻蝕深度，應變等。
  12. Despite erosion and man - made destruction, the 492 caves are well preserved, with frescoes covering an area of 45, 000 square metres, more than 2, 000 colored sculptured figures and five wooden eaves overhanging the caves

    盡管腐蝕和人為的破壞， 492個洞穴還完好保存，連同著45 ， 000平方公里的壁畫， 2000多個彩色雕刻圖形，五個木製屋檐懸于洞穴之上。
  13. At present, there are some techniques by which could construct nano - patterns such as lithographical technique, self - assembly technique and langmuir - blodgett ( lb ) technique, etc. using lb technique can realize controlled arrangement of molecules on nano - scale

    目前對于納米有序體系的構築有很多種技術，如刻蝕、自組裝、 lb技術組裝等等。利用lb技術的組裝可以實現在納米尺度上分子的可控排布，形成特殊的納米圖案。
  14. On the base of these analyses, optimization design and arts design are performed and the layouts of masks are plotted. the theory model of this kind of acceleration sensor is founded to guide the fabrication

    在此基礎上進行了結構優化設計和工藝設計，研究了錐尖成形工藝和「多掩膜無掩膜」腐蝕工藝，根據工藝流程繪制出光刻掩膜版圖，為該傳感器的研製奠定了一定的基礎。
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