蝕刻特點 的英文怎麼說

中文拼音 [shíkètèdiǎn]
蝕刻特點 英文
etched features
  • 蝕 : Ⅰ動詞1. （損失; 虧耗） lose 2. （腐蝕） erode; corrode Ⅱ名詞（天體現象） eclipse
  • 特 : Ⅰ形容詞（特殊; 超出一般） particular; special; exceptional; unusual Ⅱ副詞1 （特別） especially; v...
  • 點 : Ⅰ名詞1 （液體的小滴） drop （of liquid） 2 （細小的痕跡） spot; dot; speck 3 （漢字的筆畫「、」）...
  • 蝕刻 : [電學] [冶金學] etch; etching
  • 特點 : characteristic; distinguishing feature; peculiarity; trait
  1. Nuclear particle track - etched anti - counterfeit marking is a new weapon against fake products. the mark is manufactured by intricate high technology in state - controlled sensitive nuclear facilities which ensures that the mark can not be copied. the pattern of the mark is characterized by its permeability, and can be distinguished from fakes by using a transparent liquid ( e. g. water ), colored pen or chemical reagent. the technique has passed the official health safety examination and poses no danger of nuclear irradiation

    用核粒子照射塑料薄膜形成徑跡，再經化學試劑蝕刻和成像技術，得到由微米級微孔組成的圖案.這種圖案具有物質透過特性.用這種方法生產的核徑跡防偽標志，具備核尖端技術不易擴散，製作設備不易得到，產品用其他方法難以偽造，防偽識別簡單、快速、可靠等特點.此種標志已經通過放射性安全檢測，可以用於各種商品（包括食品）的包裝
  2. According to need of the high efficient character of laser resistor trimming machine, the theory of high efficiency is studied, and the implementation steps are given

    根據激光調阻機生產高效性的特點，研究了高速刻蝕電阻的原理及實現步驟。
  3. From the simulation of peb process, we prove that peb could reduce standing wave effects and improve resist development profile. after analyzing the effects of standing wave effects on resist profiles, we bring forward a certain thickness and these effects could be ignored when resist is beyond that value. finally, the characters of thick resist profile are analyzed, and experiment results are also given

    同時，在論文中還深入討論了抗蝕劑折射率變化對光場計算帶來的誤差；模擬了后烘過程對駐波效應的改善作用，論證了採用適當的后烘工藝改善抗蝕劑光刻質量的作用；分析了駐波效應對厚層抗蝕劑顯影輪廓的影響，提出了一個可以忽略駐波效應影響的抗蝕劑厚度條件值；最後還模擬和分析了厚層抗蝕劑顯影輪廓特點並給出了實驗結果。
  4. Through the analysis, it is shown that : 1, while fabricating the grating, the principle of selecting the parameters is : the period should be as large as possible, the etching depth should be small and filling factor should approach to 0. 25. 2, if selecting the parameter combine the selecting principle and the requirement of concrete application, the space of selecting the parameter should be larger than before. 3, while the period to. 4a, the surface profile has no effect on the reflectivity

    通過分析發現： 1 、在製作有一定特性的光柵時，光柵參數的選擇原則為：周期的取值應盡量的大，刻蝕深度的取值應盡量的小，占空比的取值應盡量靠近f = 0 . 25 ； 2 、以參數的選擇原則結合製作的具體應用要求宋選擇光柵的參數，則各個參數的優化空間更大； 3 、當光柵的周期t 0 . 4時，表面面形對反射率沒有影響； 4 、運用臨界周期點隨折射率的變化規律，可以避免由於選擇光柵周期過大而出現一級衍射，從而導致製作失敗。
  5. Topics on computer interface control technologies are discussed in detail, together with hardware design on control circuit, interpolation algorithm, and control software. all of our efforts are concentrated in one purpose - to establish a cnc system suitable for excimer laser micro fabrication. based on computer local bus tech.,

    本文針對由反應式步進電機驅動的微加工工作臺控制和準分子激光器外觸發控制特點，就計算機介面控制技術、硬體控制電路設計、插補演算法求解、控制軟體實現以及準分子激光微刻蝕加工過程進行了較詳細的討論。
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