residual ray 中文意思是什麼
residual ray
解釋
殘留光線-
The dissertation firstly discusses the reflectance of euv and soft x - ray in " multilayer system based on classical electrodynamics and optical characteristics of materials. the nns surface roughness in different spatial frequency range is carefully studied since scattering can seriously reduce the reflectance in euv and soft x - ray wavelength region. we discuss representative model of residual stress in
首先從材料在極紫外、軟x射線波段的光學特性出發，討論了極紫外、軟x射線在理想和非理想多層膜系中的反射特性；研究了影響極紫外、軟x射線多層膜反射率的表面粗糙度的空間頻率范圍；重點探討了多層膜殘余應力的典型模型、應力形成機制以及薄膜的形成過程。 -
In the process of sputtering, it is important to characterize the thickness and residual stress of plct films. in experiment. through the technology of x - ray
基於掠入射x射線衍射（ gixrd ）的殘余應力測量表明，射頻磁控濺射plct薄膜中為壓應力。 -
The surface morphologies of thin films were observed by using scan electron microscope ( sem ) and atomic force microscope ( afm ). based on grazing incidence x - ray diffraction ( gixrd ) equipment, we find that residual stress exist in magnetron sputtering plct film, in addition, the ferroelectric properties of plct thin films were measured by radiant premier lc type multifunctional ferroelectric properties test system
利用廣角x射線衍射技術對不同濺射工藝下plct薄膜的相結構進行了研究;採用掃描電子顯微鏡（ sem ）和原子力顯微鏡（ afm ）分別觀察了薄膜的表面形貌;利用掠入射x射線衍射（ gixrd ）測量了薄膜的殘余應力。 -
Standard test method for verifying the alignment of x - ray diffraction instrumentation for residual stress measurement
殘余應力測量用x射線衍射儀校準檢定的測試方法 -
The phase structure of different cu - fe thin films were studied by using grazing incidence x - ray analysis ( gixa ). the texture and residual stress of different cu - fe thin films were measured by scan of x - ray diffraction ( xrd ) and 2 scan with different. the thicknesses of different thin films were characterized by means of small angle x - ray scattering ( saxs ) technique. by using atomic force microscope ( afm ) measured surface roughness of thin films. the component of different thin film was characterized by energy disperse spectrum ( eds ) and x - ray fluorescence ( xrf ). the magnetic properties of cu - fe thin films were measured by means of vibrating sample magnetometer ( vsm ). in addition, the giant magnetoresistance ( gmr ) effects of different films were also measured. the original resistance of the film fabricated by a direction - current magnetron sputtering system is directly affected by bias voltage
利用掠入射x射線分析（ gixa ）技術對不同cu - fe薄膜的相結構進行了研究;利用xrd掃描及不同角度的2掃描對薄膜進行了結晶織構及殘余應力分析;運用小角x射線散射（ saxs ）技術測量了薄膜的厚度;採用原子力顯微鏡（ afm ）觀察了薄膜的表面形貌;運用能量損失譜（ eds ）及x射線熒光光譜（ xrf ）對薄膜進行了成分標定;使用振動樣品磁強計測量了不同cu - fe過飽和固溶體薄膜的磁性能;最後利用自製的磁阻性能測試設備測量了真空磁場熱處理前後不同薄膜的巨磁阻值。 -
Test method for determining the effective elastic parameter for x - ray diffraction measurements of residual stress
X -射線衍射量測定剩餘應力的方法 -
Residual stress measurement by x - ray
X射線應力測定方法 -
Characters of the pyrolysis chars and residual carbons such as reactivity, turbostratic carbon structure and specific surface area have been examined by thermal gravimetric analysis, powder x - ray diffraction and mercury intrusion methods respectively. catalytic effect of minerals has been identified
高溫下不同煤質焦碳結構趨於一致和礦物質催化作用的失去在一定程度上證明了假定活化能不隨煤質變化的煤焦燃燒反應動力學通用規律的合理性。 -
Main content of the thesis are also given in the introduction. the thesis presented three different of the residual stress based on x - ray diffraction - - two - exposure method, sin2, high - resolution reciprocal space mapping, which are applied to investigate the residual stress state of pt / ti bottom electrode stack, polycrystalline pzt ferroelectric thin films and epitaxial laalo3 / batio3 ferroelectric
基於此，提出了本文的選題依據，即研究鐵電薄膜中的殘余應力是基於「鐵電薄膜的重要應用背景和殘余應力對鐵電薄膜性能的可能影響以及目前鐵電薄膜中殘余應力研究的不足」 。 -
Method for verifying the alignment of x - ray diffraction instrumentation for residual stress measurement
測量剩餘應力用的x射線衍射儀驗證方法
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